Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl^sub 4^ reduction
Effect of the hydrogen radical on the reduction of a silicon tetrachloride (SiCl4) source was studied. The hydrogen radicals were generated using a tungsten (W) filament in a generation chamber, and were remotely supplied to another reaction chamber. The density of the hydrogen radical was estimated...
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| Veröffentlicht in: | Japanese Journal of Applied Physics 2018-05, Vol.57 (5), p.051301 |
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| container_issue | 5 |
| container_start_page | 051301 |
| container_title | Japanese Journal of Applied Physics |
| container_volume | 57 |
| creator | Dahmani, Fatima Zohra Okamoto, Yuji Tsutsumi, Daiki Ishigaki, Takamasa Koinuma, Hideomi Hamzaoui, Saad Flazi, Samir Sumiya, Masatomo |
| description | Effect of the hydrogen radical on the reduction of a silicon tetrachloride (SiCl4) source was studied. The hydrogen radicals were generated using a tungsten (W) filament in a generation chamber, and were remotely supplied to another reaction chamber. The density of the hydrogen radical was estimated from the optical transmittance of 600-nm-wavelength light through phosphate glass doped with tungsten oxide (WO3). Lifetime of the hydrogen radical seemed sufficiently long, and its density as supplied to the reaction chamber was estimated to be on the order of 1012 cm−3. Signal intensity of the peak corresponding to SiCl4 (m/z = 170) detected by quadrupole-mass measurement was confirmed to decrease owing to the reaction with the remotely-supplied hydrogen radical. This indicates the possibility that chemically-stable SiCl4, as one of the by-products of the Siemens process, can be reduced to produce silicon. |
| format | Article |
| fullrecord | <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_journals_2047238282</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2047238282</sourcerecordid><originalsourceid>FETCH-proquest_journals_20472382823</originalsourceid><addsrcrecordid>eNqNjckKwjAURYMoWId_eOC60KZxWjvgXtctsXnVSJrUDIX-vRH8AFePy7n3vBFJ8oJtU5Zt1mOSZBnNU7andEpmzr1i3KxZnpDhiNpJPwD2XAXupdFgGrDYGo9qSF3oOiVRwHMQ1jxQg-VC1lw56KwRoY6olxx80A_nI26k4i1qDy36pxHQGAtXeVClC3dgZTTH0ffNgkyaqMHl787J6ny6HS5p9L4DOl-9TLA6oopmbEuLHd3R4r_WB748UGo</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2047238282</pqid></control><display><type>article</type><title>Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl^sub 4^ reduction</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Dahmani, Fatima Zohra ; Okamoto, Yuji ; Tsutsumi, Daiki ; Ishigaki, Takamasa ; Koinuma, Hideomi ; Hamzaoui, Saad ; Flazi, Samir ; Sumiya, Masatomo</creator><creatorcontrib>Dahmani, Fatima Zohra ; Okamoto, Yuji ; Tsutsumi, Daiki ; Ishigaki, Takamasa ; Koinuma, Hideomi ; Hamzaoui, Saad ; Flazi, Samir ; Sumiya, Masatomo</creatorcontrib><description>Effect of the hydrogen radical on the reduction of a silicon tetrachloride (SiCl4) source was studied. The hydrogen radicals were generated using a tungsten (W) filament in a generation chamber, and were remotely supplied to another reaction chamber. The density of the hydrogen radical was estimated from the optical transmittance of 600-nm-wavelength light through phosphate glass doped with tungsten oxide (WO3). Lifetime of the hydrogen radical seemed sufficiently long, and its density as supplied to the reaction chamber was estimated to be on the order of 1012 cm−3. Signal intensity of the peak corresponding to SiCl4 (m/z = 170) detected by quadrupole-mass measurement was confirmed to decrease owing to the reaction with the remotely-supplied hydrogen radical. This indicates the possibility that chemically-stable SiCl4, as one of the by-products of the Siemens process, can be reduced to produce silicon.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><language>eng</language><publisher>Tokyo: Japanese Journal of Applied Physics</publisher><subject>Density ; Hydrogen ; Phosphate glass ; Quadrupoles ; Radicals ; Reduction ; Silicon tetrachloride ; Tungsten</subject><ispartof>Japanese Journal of Applied Physics, 2018-05, Vol.57 (5), p.051301</ispartof><rights>Copyright Japanese Journal of Applied Physics May 2018</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784</link.rule.ids></links><search><creatorcontrib>Dahmani, Fatima Zohra</creatorcontrib><creatorcontrib>Okamoto, Yuji</creatorcontrib><creatorcontrib>Tsutsumi, Daiki</creatorcontrib><creatorcontrib>Ishigaki, Takamasa</creatorcontrib><creatorcontrib>Koinuma, Hideomi</creatorcontrib><creatorcontrib>Hamzaoui, Saad</creatorcontrib><creatorcontrib>Flazi, Samir</creatorcontrib><creatorcontrib>Sumiya, Masatomo</creatorcontrib><title>Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl^sub 4^ reduction</title><title>Japanese Journal of Applied Physics</title><description>Effect of the hydrogen radical on the reduction of a silicon tetrachloride (SiCl4) source was studied. The hydrogen radicals were generated using a tungsten (W) filament in a generation chamber, and were remotely supplied to another reaction chamber. The density of the hydrogen radical was estimated from the optical transmittance of 600-nm-wavelength light through phosphate glass doped with tungsten oxide (WO3). Lifetime of the hydrogen radical seemed sufficiently long, and its density as supplied to the reaction chamber was estimated to be on the order of 1012 cm−3. Signal intensity of the peak corresponding to SiCl4 (m/z = 170) detected by quadrupole-mass measurement was confirmed to decrease owing to the reaction with the remotely-supplied hydrogen radical. This indicates the possibility that chemically-stable SiCl4, as one of the by-products of the Siemens process, can be reduced to produce silicon.</description><subject>Density</subject><subject>Hydrogen</subject><subject>Phosphate glass</subject><subject>Quadrupoles</subject><subject>Radicals</subject><subject>Reduction</subject><subject>Silicon tetrachloride</subject><subject>Tungsten</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNqNjckKwjAURYMoWId_eOC60KZxWjvgXtctsXnVSJrUDIX-vRH8AFePy7n3vBFJ8oJtU5Zt1mOSZBnNU7andEpmzr1i3KxZnpDhiNpJPwD2XAXupdFgGrDYGo9qSF3oOiVRwHMQ1jxQg-VC1lw56KwRoY6olxx80A_nI26k4i1qDy36pxHQGAtXeVClC3dgZTTH0ffNgkyaqMHl787J6ny6HS5p9L4DOl-9TLA6oopmbEuLHd3R4r_WB748UGo</recordid><startdate>20180501</startdate><enddate>20180501</enddate><creator>Dahmani, Fatima Zohra</creator><creator>Okamoto, Yuji</creator><creator>Tsutsumi, Daiki</creator><creator>Ishigaki, Takamasa</creator><creator>Koinuma, Hideomi</creator><creator>Hamzaoui, Saad</creator><creator>Flazi, Samir</creator><creator>Sumiya, Masatomo</creator><general>Japanese Journal of Applied Physics</general><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20180501</creationdate><title>Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl^sub 4^ reduction</title><author>Dahmani, Fatima Zohra ; Okamoto, Yuji ; Tsutsumi, Daiki ; Ishigaki, Takamasa ; Koinuma, Hideomi ; Hamzaoui, Saad ; Flazi, Samir ; Sumiya, Masatomo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-proquest_journals_20472382823</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Density</topic><topic>Hydrogen</topic><topic>Phosphate glass</topic><topic>Quadrupoles</topic><topic>Radicals</topic><topic>Reduction</topic><topic>Silicon tetrachloride</topic><topic>Tungsten</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Dahmani, Fatima Zohra</creatorcontrib><creatorcontrib>Okamoto, Yuji</creatorcontrib><creatorcontrib>Tsutsumi, Daiki</creatorcontrib><creatorcontrib>Ishigaki, Takamasa</creatorcontrib><creatorcontrib>Koinuma, Hideomi</creatorcontrib><creatorcontrib>Hamzaoui, Saad</creatorcontrib><creatorcontrib>Flazi, Samir</creatorcontrib><creatorcontrib>Sumiya, Masatomo</creatorcontrib><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Dahmani, Fatima Zohra</au><au>Okamoto, Yuji</au><au>Tsutsumi, Daiki</au><au>Ishigaki, Takamasa</au><au>Koinuma, Hideomi</au><au>Hamzaoui, Saad</au><au>Flazi, Samir</au><au>Sumiya, Masatomo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl^sub 4^ reduction</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>2018-05-01</date><risdate>2018</risdate><volume>57</volume><issue>5</issue><spage>051301</spage><pages>051301-</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><abstract>Effect of the hydrogen radical on the reduction of a silicon tetrachloride (SiCl4) source was studied. The hydrogen radicals were generated using a tungsten (W) filament in a generation chamber, and were remotely supplied to another reaction chamber. The density of the hydrogen radical was estimated from the optical transmittance of 600-nm-wavelength light through phosphate glass doped with tungsten oxide (WO3). Lifetime of the hydrogen radical seemed sufficiently long, and its density as supplied to the reaction chamber was estimated to be on the order of 1012 cm−3. Signal intensity of the peak corresponding to SiCl4 (m/z = 170) detected by quadrupole-mass measurement was confirmed to decrease owing to the reaction with the remotely-supplied hydrogen radical. This indicates the possibility that chemically-stable SiCl4, as one of the by-products of the Siemens process, can be reduced to produce silicon.</abstract><cop>Tokyo</cop><pub>Japanese Journal of Applied Physics</pub></addata></record> |
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| identifier | ISSN: 0021-4922 |
| ispartof | Japanese Journal of Applied Physics, 2018-05, Vol.57 (5), p.051301 |
| issn | 0021-4922 1347-4065 |
| language | eng |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Density Hydrogen Phosphate glass Quadrupoles Radicals Reduction Silicon tetrachloride Tungsten |
| title | Density evaluation of remotely-supplied hydrogen radicals produced via tungsten filament method for SiCl^sub 4^ reduction |
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