Ni‐Catalyzed Growth of Silica Nanowires From Amorphous Silicon Films and Growth Mechanism

The fabrication of amorphous silica nanowires (NWs) using an amorphous silicon (a‐Si) film grown by plasma‐enhanced chemical vapor deposition is demonstrated. Fabrication is achieved by conventional high‐temperature annealing of an a‐Si layer coated with a thin Ni film. Annealing of the Ni (≈20 nm)/...

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Veröffentlicht in:	Physica status solidi. A, Applications and materials science Applications and materials science, 2017-12, Vol.214 (12), p.n/a
1. Verfasser:	Yoon, Jong‐Hwan
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous silicon Annealing Chemical vapor deposition Nanowires Ni‐catalyzed growth Photovoltaic cells Plasma enhanced chemical vapor deposition silica nanowire Silicon dioxide Silicon films Silicon wafers solid–liquid–solid mechanism
Online-Zugang:	Volltext
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