Electrochemical, Structural and Magnetic Analysis of Electrodeposited CoCu/Cu Multilayers: Influence of Cu Layer Deposition Potential
The electrochemical, structural and magnetic properties of CoCu/Cu multilayers electrodeposited at different cathode potentials were investigated from a single bath. The Cu layer deposition potentials were selected as - 0.3 , V - 0.4 V , and - 0.5 V with respect to saturated calomel electrode (SCE)...
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| Veröffentlicht in: | Journal of electronic materials 2018-03, Vol.47 (3), p.1896-1903 |
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| creator | Tekgül, Atakan Kockar, Hakan Kuru, Hilal Alper, Mürsel ÜnlÜ, C. Gökhan |
| description | The electrochemical, structural and magnetic properties of CoCu/Cu multilayers electrodeposited at different cathode potentials were investigated from a single bath. The Cu layer deposition potentials were selected as
-
0.3
,
V
-
0.4
V
, and
-
0.5
V
with respect to saturated calomel electrode (SCE) while the Co layer deposition potential was constant at
-
1.5
V
versus SCE. For the electrochemical analysis, the current-time transients were obtained. The amount of noble non-magnetic (Cu) metal materials decreased with the increase of deposition potentials due to anomalous codeposition. Further, current-time transient curves for the Co layer deposition and capacitance were calculated. In the structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The (111) peak shifts towards higher angle with the increase of the deposition potentials. Also, the lattice parameters of the multilayers decrease from 0.3669 nm to 0.3610 nm with the increase of the deposition potentials from
-
0.3
V
to
-
0.5
V
, which corresponds to the bulk values of Cu and Co, respectively. The electrochemical and structural results demonstrate that the amount of Co atoms increased and the Cu atoms decreased in the layers with the increase of deposition potentials due to anomalous codeposition. For magnetic measurements, the saturation magnetizations,
M
s
obtained from the magnetic curves of the multilayers were obtained as 212 kA/m, 276 kA/m, and 366 kA/m with
-
0.3
V
,
-
0.4
V
, and
-
0.5
V
versus SCE, respectively. It is seen that the
M
s
values increased with the increase of the deposition potentials confirming the increase of the Co atoms and decrease of the Cu amount. The results of electrochemical and structural analysis show that the deposition potentials of non-magnetic layers plays important role on the amount of magnetic and non-magnetic materials in the layers and thus on the magnetic properties of the multilayers. |
| doi_str_mv | 10.1007/s11664-017-5984-9 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1972873543</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1972873543</sourcerecordid><originalsourceid>FETCH-LOGICAL-c316t-a0c626cec85502686485ce539ee48254486acdc8fcec594927a2373ff6bed93e3</originalsourceid><addsrcrecordid>eNp1kMtOwzAQRS0EEqXwAewssSXUjmPHYVeF8pBagQRI7CzjTEoqNy62s-gH8N8kShdsWI00c8-V5iB0SckNJSSfBUqFyBJC84QXMkuKIzShPGMJleLjGE0IEzThKeOn6CyEDSGUU0kn6GdhwUTvzBdsG6PtNX6NvjOx89pi3VZ4pdctxMbgeavtPjQBuxofoAp2LjQRKly6spuVHV51NjZW78GHW_zU1raD1sCA9MflsMd3I9S4Fr-4CG1stD1HJ7W2AS4Oc4re7xdv5WOyfH54KufLxDAqYqKJEakwYCTnJBVSZJIb4KwAyGTKs0wKbSoj6z7Ci6xIc52ynNW1-ISqYMCm6Grs3Xn33UGIauM63z8WFC3yVOasV9an6Jgy3oXgoVY732y13ytK1GBbjbZVb1sNtlXRM-nIhD7brsH_af4X-gXUC4RG</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1972873543</pqid></control><display><type>article</type><title>Electrochemical, Structural and Magnetic Analysis of Electrodeposited CoCu/Cu Multilayers: Influence of Cu Layer Deposition Potential</title><source>SpringerLink Journals - AutoHoldings</source><creator>Tekgül, Atakan ; Kockar, Hakan ; Kuru, Hilal ; Alper, Mürsel ; ÜnlÜ, C. Gökhan</creator><creatorcontrib>Tekgül, Atakan ; Kockar, Hakan ; Kuru, Hilal ; Alper, Mürsel ; ÜnlÜ, C. Gökhan</creatorcontrib><description>The electrochemical, structural and magnetic properties of CoCu/Cu multilayers electrodeposited at different cathode potentials were investigated from a single bath. The Cu layer deposition potentials were selected as
-
0.3
,
V
-
0.4
V
, and
-
0.5
V
with respect to saturated calomel electrode (SCE) while the Co layer deposition potential was constant at
-
1.5
V
versus SCE. For the electrochemical analysis, the current-time transients were obtained. The amount of noble non-magnetic (Cu) metal materials decreased with the increase of deposition potentials due to anomalous codeposition. Further, current-time transient curves for the Co layer deposition and capacitance were calculated. In the structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The (111) peak shifts towards higher angle with the increase of the deposition potentials. Also, the lattice parameters of the multilayers decrease from 0.3669 nm to 0.3610 nm with the increase of the deposition potentials from
-
0.3
V
to
-
0.5
V
, which corresponds to the bulk values of Cu and Co, respectively. The electrochemical and structural results demonstrate that the amount of Co atoms increased and the Cu atoms decreased in the layers with the increase of deposition potentials due to anomalous codeposition. For magnetic measurements, the saturation magnetizations,
M
s
obtained from the magnetic curves of the multilayers were obtained as 212 kA/m, 276 kA/m, and 366 kA/m with
-
0.3
V
,
-
0.4
V
, and
-
0.5
V
versus SCE, respectively. It is seen that the
M
s
values increased with the increase of the deposition potentials confirming the increase of the Co atoms and decrease of the Cu amount. The results of electrochemical and structural analysis show that the deposition potentials of non-magnetic layers plays important role on the amount of magnetic and non-magnetic materials in the layers and thus on the magnetic properties of the multilayers.</description><identifier>ISSN: 0361-5235</identifier><identifier>EISSN: 1543-186X</identifier><identifier>DOI: 10.1007/s11664-017-5984-9</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Atomic structure ; Calomel electrode ; Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Codeposition ; Copper ; Electrochemical analysis ; Electronics and Microelectronics ; Instrumentation ; Lattice parameters ; Magnetic materials ; Magnetic measurement ; Magnetic properties ; Materials research ; Materials Science ; Multilayers ; Optical and Electronic Materials ; Solid State Physics ; Structural analysis</subject><ispartof>Journal of electronic materials, 2018-03, Vol.47 (3), p.1896-1903</ispartof><rights>The Minerals, Metals & Materials Society 2017</rights><rights>Journal of Electronic Materials is a copyright of Springer, (2017). All Rights Reserved.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-a0c626cec85502686485ce539ee48254486acdc8fcec594927a2373ff6bed93e3</citedby><cites>FETCH-LOGICAL-c316t-a0c626cec85502686485ce539ee48254486acdc8fcec594927a2373ff6bed93e3</cites><orcidid>0000-0001-6737-3838</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11664-017-5984-9$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11664-017-5984-9$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27923,27924,41487,42556,51318</link.rule.ids></links><search><creatorcontrib>Tekgül, Atakan</creatorcontrib><creatorcontrib>Kockar, Hakan</creatorcontrib><creatorcontrib>Kuru, Hilal</creatorcontrib><creatorcontrib>Alper, Mürsel</creatorcontrib><creatorcontrib>ÜnlÜ, C. Gökhan</creatorcontrib><title>Electrochemical, Structural and Magnetic Analysis of Electrodeposited CoCu/Cu Multilayers: Influence of Cu Layer Deposition Potential</title><title>Journal of electronic materials</title><addtitle>Journal of Elec Materi</addtitle><description>The electrochemical, structural and magnetic properties of CoCu/Cu multilayers electrodeposited at different cathode potentials were investigated from a single bath. The Cu layer deposition potentials were selected as
-
0.3
,
V
-
0.4
V
, and
-
0.5
V
with respect to saturated calomel electrode (SCE) while the Co layer deposition potential was constant at
-
1.5
V
versus SCE. For the electrochemical analysis, the current-time transients were obtained. The amount of noble non-magnetic (Cu) metal materials decreased with the increase of deposition potentials due to anomalous codeposition. Further, current-time transient curves for the Co layer deposition and capacitance were calculated. In the structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The (111) peak shifts towards higher angle with the increase of the deposition potentials. Also, the lattice parameters of the multilayers decrease from 0.3669 nm to 0.3610 nm with the increase of the deposition potentials from
-
0.3
V
to
-
0.5
V
, which corresponds to the bulk values of Cu and Co, respectively. The electrochemical and structural results demonstrate that the amount of Co atoms increased and the Cu atoms decreased in the layers with the increase of deposition potentials due to anomalous codeposition. For magnetic measurements, the saturation magnetizations,
M
s
obtained from the magnetic curves of the multilayers were obtained as 212 kA/m, 276 kA/m, and 366 kA/m with
-
0.3
V
,
-
0.4
V
, and
-
0.5
V
versus SCE, respectively. It is seen that the
M
s
values increased with the increase of the deposition potentials confirming the increase of the Co atoms and decrease of the Cu amount. The results of electrochemical and structural analysis show that the deposition potentials of non-magnetic layers plays important role on the amount of magnetic and non-magnetic materials in the layers and thus on the magnetic properties of the multilayers.</description><subject>Atomic structure</subject><subject>Calomel electrode</subject><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Codeposition</subject><subject>Copper</subject><subject>Electrochemical analysis</subject><subject>Electronics and Microelectronics</subject><subject>Instrumentation</subject><subject>Lattice parameters</subject><subject>Magnetic materials</subject><subject>Magnetic measurement</subject><subject>Magnetic properties</subject><subject>Materials research</subject><subject>Materials Science</subject><subject>Multilayers</subject><subject>Optical and Electronic Materials</subject><subject>Solid State Physics</subject><subject>Structural analysis</subject><issn>0361-5235</issn><issn>1543-186X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><sourceid>8G5</sourceid><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GNUQQ</sourceid><sourceid>GUQSH</sourceid><sourceid>M2O</sourceid><recordid>eNp1kMtOwzAQRS0EEqXwAewssSXUjmPHYVeF8pBagQRI7CzjTEoqNy62s-gH8N8kShdsWI00c8-V5iB0SckNJSSfBUqFyBJC84QXMkuKIzShPGMJleLjGE0IEzThKeOn6CyEDSGUU0kn6GdhwUTvzBdsG6PtNX6NvjOx89pi3VZ4pdctxMbgeavtPjQBuxofoAp2LjQRKly6spuVHV51NjZW78GHW_zU1raD1sCA9MflsMd3I9S4Fr-4CG1stD1HJ7W2AS4Oc4re7xdv5WOyfH54KufLxDAqYqKJEakwYCTnJBVSZJIb4KwAyGTKs0wKbSoj6z7Ci6xIc52ynNW1-ISqYMCm6Grs3Xn33UGIauM63z8WFC3yVOasV9an6Jgy3oXgoVY732y13ytK1GBbjbZVb1sNtlXRM-nIhD7brsH_af4X-gXUC4RG</recordid><startdate>20180301</startdate><enddate>20180301</enddate><creator>Tekgül, Atakan</creator><creator>Kockar, Hakan</creator><creator>Kuru, Hilal</creator><creator>Alper, Mürsel</creator><creator>ÜnlÜ, C. Gökhan</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7XB</scope><scope>88I</scope><scope>8AF</scope><scope>8AO</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8G5</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>GUQSH</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M2O</scope><scope>M2P</scope><scope>M7S</scope><scope>MBDVC</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>Q9U</scope><scope>S0X</scope><orcidid>https://orcid.org/0000-0001-6737-3838</orcidid></search><sort><creationdate>20180301</creationdate><title>Electrochemical, Structural and Magnetic Analysis of Electrodeposited CoCu/Cu Multilayers: Influence of Cu Layer Deposition Potential</title><author>Tekgül, Atakan ; Kockar, Hakan ; Kuru, Hilal ; Alper, Mürsel ; ÜnlÜ, C. Gökhan</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-a0c626cec85502686485ce539ee48254486acdc8fcec594927a2373ff6bed93e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Atomic structure</topic><topic>Calomel electrode</topic><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry and Materials Science</topic><topic>Codeposition</topic><topic>Copper</topic><topic>Electrochemical analysis</topic><topic>Electronics and Microelectronics</topic><topic>Instrumentation</topic><topic>Lattice parameters</topic><topic>Magnetic materials</topic><topic>Magnetic measurement</topic><topic>Magnetic properties</topic><topic>Materials research</topic><topic>Materials Science</topic><topic>Multilayers</topic><topic>Optical and Electronic Materials</topic><topic>Solid State Physics</topic><topic>Structural analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tekgül, Atakan</creatorcontrib><creatorcontrib>Kockar, Hakan</creatorcontrib><creatorcontrib>Kuru, Hilal</creatorcontrib><creatorcontrib>Alper, Mürsel</creatorcontrib><creatorcontrib>ÜnlÜ, C. Gökhan</creatorcontrib><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>Science Database (Alumni Edition)</collection><collection>STEM Database</collection><collection>ProQuest Pharma Collection</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>Research Library (Alumni Edition)</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>Advanced Technologies & Aerospace Collection</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ProQuest Central Student</collection><collection>Research Library Prep</collection><collection>SciTech Premium Collection</collection><collection>Materials Science Database</collection><collection>ProQuest Engineering Collection</collection><collection>Research Library</collection><collection>Science Database</collection><collection>Engineering Database</collection><collection>Research Library (Corporate)</collection><collection>Advanced Technologies & Aerospace Database</collection><collection>ProQuest Advanced Technologies & Aerospace Collection</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><collection>ProQuest Central Basic</collection><collection>SIRS Editorial</collection><jtitle>Journal of electronic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tekgül, Atakan</au><au>Kockar, Hakan</au><au>Kuru, Hilal</au><au>Alper, Mürsel</au><au>ÜnlÜ, C. Gökhan</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrochemical, Structural and Magnetic Analysis of Electrodeposited CoCu/Cu Multilayers: Influence of Cu Layer Deposition Potential</atitle><jtitle>Journal of electronic materials</jtitle><stitle>Journal of Elec Materi</stitle><date>2018-03-01</date><risdate>2018</risdate><volume>47</volume><issue>3</issue><spage>1896</spage><epage>1903</epage><pages>1896-1903</pages><issn>0361-5235</issn><eissn>1543-186X</eissn><abstract>The electrochemical, structural and magnetic properties of CoCu/Cu multilayers electrodeposited at different cathode potentials were investigated from a single bath. The Cu layer deposition potentials were selected as
-
0.3
,
V
-
0.4
V
, and
-
0.5
V
with respect to saturated calomel electrode (SCE) while the Co layer deposition potential was constant at
-
1.5
V
versus SCE. For the electrochemical analysis, the current-time transients were obtained. The amount of noble non-magnetic (Cu) metal materials decreased with the increase of deposition potentials due to anomalous codeposition. Further, current-time transient curves for the Co layer deposition and capacitance were calculated. In the structural analysis, the multilayers were found to be polycrystalline with both Co and Cu layers adopting the face-centered cubic structure. The (111) peak shifts towards higher angle with the increase of the deposition potentials. Also, the lattice parameters of the multilayers decrease from 0.3669 nm to 0.3610 nm with the increase of the deposition potentials from
-
0.3
V
to
-
0.5
V
, which corresponds to the bulk values of Cu and Co, respectively. The electrochemical and structural results demonstrate that the amount of Co atoms increased and the Cu atoms decreased in the layers with the increase of deposition potentials due to anomalous codeposition. For magnetic measurements, the saturation magnetizations,
M
s
obtained from the magnetic curves of the multilayers were obtained as 212 kA/m, 276 kA/m, and 366 kA/m with
-
0.3
V
,
-
0.4
V
, and
-
0.5
V
versus SCE, respectively. It is seen that the
M
s
values increased with the increase of the deposition potentials confirming the increase of the Co atoms and decrease of the Cu amount. The results of electrochemical and structural analysis show that the deposition potentials of non-magnetic layers plays important role on the amount of magnetic and non-magnetic materials in the layers and thus on the magnetic properties of the multilayers.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11664-017-5984-9</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0001-6737-3838</orcidid></addata></record> |
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| ispartof | Journal of electronic materials, 2018-03, Vol.47 (3), p.1896-1903 |
| issn | 0361-5235 1543-186X |
| language | eng |
| recordid | cdi_proquest_journals_1972873543 |
| source | SpringerLink Journals - AutoHoldings |
| subjects | Atomic structure Calomel electrode Characterization and Evaluation of Materials Chemistry and Materials Science Codeposition Copper Electrochemical analysis Electronics and Microelectronics Instrumentation Lattice parameters Magnetic materials Magnetic measurement Magnetic properties Materials research Materials Science Multilayers Optical and Electronic Materials Solid State Physics Structural analysis |
| title | Electrochemical, Structural and Magnetic Analysis of Electrodeposited CoCu/Cu Multilayers: Influence of Cu Layer Deposition Potential |
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