Extending microwave plasma assisted CVD SCD growth to pressures of 400 Torr

The fundamental operational behavior of a microwave cavity plasma reactor was studied for pressures between 120 and 400 Torr, i.e. the plasma dimensions, the absorbed power density and the operational field map were measured and the reactor growth performance was evaluated by growing single crystall...

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Veröffentlicht in:Diamond and related materials 2017-10, Vol.79, p.150-163
Hauptverfasser: Muehle, M., Asmussen, J., Becker, M.F., Schuelke, T.
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Sprache:eng
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