Ceramic coating deposition by electron beam evaporation
We describe a new method for the deposition of protective ceramic-based coatings. The novelty of the method lies in the unique interaction of the electron beam with a dielectric target, in which ions in the beam-produced plasma neutralize the target surface charge build-up. This effect is brought ab...
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Veröffentlicht in: | Surface & coatings technology 2017-09, Vol.325, p.1-6 |
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creator | Oks, E.M. Tyunkov, A.V. Yushkov, Yu.G. Zolotukhin, D.B. |
description | We describe a new method for the deposition of protective ceramic-based coatings. The novelty of the method lies in the unique interaction of the electron beam with a dielectric target, in which ions in the beam-produced plasma neutralize the target surface charge build-up. This effect is brought about by the use of our novel forevacuum-pressure, plasma-cathode electron beam source, which can produce energetic, focused electron beams, with associated beam-produced plasmas, in the previously inaccessible pressure range of 1–100Pa. The work described here demonstrates the evaporation of aluminum oxide ceramic by electron beam bombardment and the subsequent deposition of an alumina coating. A significant increase in the microhardness of the ceramic-coated Ti substrate and a uniform depth-distribution of the elemental composition has been determined. The approach described here opens up new opportunities for the deposition of coatings in various fields of industry.
•A method for deposition of ceramic coating by e-beam evaporation of ceramic using fore-vacuum electron source is shown.•We employed this method for deposition of alumina-oxide coating on titan sample.•Surface hardness of Ti sample is increased in 3 times after deposition of coating with a uniform elemental composition.•Composition of beam plasma with gas and evaporated particle ions was investigated using modified analyzer RGA-100. |
doi_str_mv | 10.1016/j.surfcoat.2017.06.042 |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1959193409</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S025789721730645X</els_id><sourcerecordid>1959193409</sourcerecordid><originalsourceid>FETCH-LOGICAL-c340t-128c8b012cb09f9fe44ebc760fec1948f999366f43a946e9ce43eec395aab51b3</originalsourceid><addsrcrecordid>eNqFkE9LxDAQxYMouK5-BSl4bk2aNOnclMV_sOBFzyHNTiRlt6lJd2G_vSmrZ08zMO-94f0IuWW0YpTJ-75K--hsMFNVU6YqKisq6jOyYK2CknOhzsmC1o0qW1D1JblKqac0K0EsiFphNDtvi9nvh69ig2NIfvJhKLpjgVu0U5x3NLsCD2YM0czHa3LhzDbhze9cks_np4_Va7l-f3lbPa5LywWdSla3tu0oq21HwYFDIbCzSlKHloFoHQBwKZ3gBoREsCg4ouXQGNM1rONLcnfKHWP43mOadB_2ccgvNYMGGOQ3kFXypLIxpBTR6TH6nYlHzaieIele_0HSMyRNpc6QsvHhZMTc4eAx6mQ9DhY3PubmehP8fxE_uFhz8Q</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1959193409</pqid></control><display><type>article</type><title>Ceramic coating deposition by electron beam evaporation</title><source>Elsevier ScienceDirect Journals</source><creator>Oks, E.M. ; Tyunkov, A.V. ; Yushkov, Yu.G. ; Zolotukhin, D.B.</creator><creatorcontrib>Oks, E.M. ; Tyunkov, A.V. ; Yushkov, Yu.G. ; Zolotukhin, D.B.</creatorcontrib><description>We describe a new method for the deposition of protective ceramic-based coatings. The novelty of the method lies in the unique interaction of the electron beam with a dielectric target, in which ions in the beam-produced plasma neutralize the target surface charge build-up. This effect is brought about by the use of our novel forevacuum-pressure, plasma-cathode electron beam source, which can produce energetic, focused electron beams, with associated beam-produced plasmas, in the previously inaccessible pressure range of 1–100Pa. The work described here demonstrates the evaporation of aluminum oxide ceramic by electron beam bombardment and the subsequent deposition of an alumina coating. A significant increase in the microhardness of the ceramic-coated Ti substrate and a uniform depth-distribution of the elemental composition has been determined. The approach described here opens up new opportunities for the deposition of coatings in various fields of industry.
•A method for deposition of ceramic coating by e-beam evaporation of ceramic using fore-vacuum electron source is shown.•We employed this method for deposition of alumina-oxide coating on titan sample.•Surface hardness of Ti sample is increased in 3 times after deposition of coating with a uniform elemental composition.•Composition of beam plasma with gas and evaporated particle ions was investigated using modified analyzer RGA-100.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/j.surfcoat.2017.06.042</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Aluminum oxide ; Ceramic coatings ; Ceramic glazes ; Ceramics ; Deposition ; Electron beams ; Electron bombardment ; Electrons ; Evaporation ; Microhardness ; Plasmas ; Protective coatings ; Studies ; Surface charge</subject><ispartof>Surface & coatings technology, 2017-09, Vol.325, p.1-6</ispartof><rights>2017</rights><rights>Copyright Elsevier BV Sep 25, 2017</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c340t-128c8b012cb09f9fe44ebc760fec1948f999366f43a946e9ce43eec395aab51b3</citedby><cites>FETCH-LOGICAL-c340t-128c8b012cb09f9fe44ebc760fec1948f999366f43a946e9ce43eec395aab51b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S025789721730645X$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids></links><search><creatorcontrib>Oks, E.M.</creatorcontrib><creatorcontrib>Tyunkov, A.V.</creatorcontrib><creatorcontrib>Yushkov, Yu.G.</creatorcontrib><creatorcontrib>Zolotukhin, D.B.</creatorcontrib><title>Ceramic coating deposition by electron beam evaporation</title><title>Surface & coatings technology</title><description>We describe a new method for the deposition of protective ceramic-based coatings. The novelty of the method lies in the unique interaction of the electron beam with a dielectric target, in which ions in the beam-produced plasma neutralize the target surface charge build-up. This effect is brought about by the use of our novel forevacuum-pressure, plasma-cathode electron beam source, which can produce energetic, focused electron beams, with associated beam-produced plasmas, in the previously inaccessible pressure range of 1–100Pa. The work described here demonstrates the evaporation of aluminum oxide ceramic by electron beam bombardment and the subsequent deposition of an alumina coating. A significant increase in the microhardness of the ceramic-coated Ti substrate and a uniform depth-distribution of the elemental composition has been determined. The approach described here opens up new opportunities for the deposition of coatings in various fields of industry.
•A method for deposition of ceramic coating by e-beam evaporation of ceramic using fore-vacuum electron source is shown.•We employed this method for deposition of alumina-oxide coating on titan sample.•Surface hardness of Ti sample is increased in 3 times after deposition of coating with a uniform elemental composition.•Composition of beam plasma with gas and evaporated particle ions was investigated using modified analyzer RGA-100.</description><subject>Aluminum oxide</subject><subject>Ceramic coatings</subject><subject>Ceramic glazes</subject><subject>Ceramics</subject><subject>Deposition</subject><subject>Electron beams</subject><subject>Electron bombardment</subject><subject>Electrons</subject><subject>Evaporation</subject><subject>Microhardness</subject><subject>Plasmas</subject><subject>Protective coatings</subject><subject>Studies</subject><subject>Surface charge</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNqFkE9LxDAQxYMouK5-BSl4bk2aNOnclMV_sOBFzyHNTiRlt6lJd2G_vSmrZ08zMO-94f0IuWW0YpTJ-75K--hsMFNVU6YqKisq6jOyYK2CknOhzsmC1o0qW1D1JblKqac0K0EsiFphNDtvi9nvh69ig2NIfvJhKLpjgVu0U5x3NLsCD2YM0czHa3LhzDbhze9cks_np4_Va7l-f3lbPa5LywWdSla3tu0oq21HwYFDIbCzSlKHloFoHQBwKZ3gBoREsCg4ouXQGNM1rONLcnfKHWP43mOadB_2ccgvNYMGGOQ3kFXypLIxpBTR6TH6nYlHzaieIele_0HSMyRNpc6QsvHhZMTc4eAx6mQ9DhY3PubmehP8fxE_uFhz8Q</recordid><startdate>20170925</startdate><enddate>20170925</enddate><creator>Oks, E.M.</creator><creator>Tyunkov, A.V.</creator><creator>Yushkov, Yu.G.</creator><creator>Zolotukhin, D.B.</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20170925</creationdate><title>Ceramic coating deposition by electron beam evaporation</title><author>Oks, E.M. ; Tyunkov, A.V. ; Yushkov, Yu.G. ; Zolotukhin, D.B.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c340t-128c8b012cb09f9fe44ebc760fec1948f999366f43a946e9ce43eec395aab51b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Aluminum oxide</topic><topic>Ceramic coatings</topic><topic>Ceramic glazes</topic><topic>Ceramics</topic><topic>Deposition</topic><topic>Electron beams</topic><topic>Electron bombardment</topic><topic>Electrons</topic><topic>Evaporation</topic><topic>Microhardness</topic><topic>Plasmas</topic><topic>Protective coatings</topic><topic>Studies</topic><topic>Surface charge</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Oks, E.M.</creatorcontrib><creatorcontrib>Tyunkov, A.V.</creatorcontrib><creatorcontrib>Yushkov, Yu.G.</creatorcontrib><creatorcontrib>Zolotukhin, D.B.</creatorcontrib><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Oks, E.M.</au><au>Tyunkov, A.V.</au><au>Yushkov, Yu.G.</au><au>Zolotukhin, D.B.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Ceramic coating deposition by electron beam evaporation</atitle><jtitle>Surface & coatings technology</jtitle><date>2017-09-25</date><risdate>2017</risdate><volume>325</volume><spage>1</spage><epage>6</epage><pages>1-6</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><abstract>We describe a new method for the deposition of protective ceramic-based coatings. The novelty of the method lies in the unique interaction of the electron beam with a dielectric target, in which ions in the beam-produced plasma neutralize the target surface charge build-up. This effect is brought about by the use of our novel forevacuum-pressure, plasma-cathode electron beam source, which can produce energetic, focused electron beams, with associated beam-produced plasmas, in the previously inaccessible pressure range of 1–100Pa. The work described here demonstrates the evaporation of aluminum oxide ceramic by electron beam bombardment and the subsequent deposition of an alumina coating. A significant increase in the microhardness of the ceramic-coated Ti substrate and a uniform depth-distribution of the elemental composition has been determined. The approach described here opens up new opportunities for the deposition of coatings in various fields of industry.
•A method for deposition of ceramic coating by e-beam evaporation of ceramic using fore-vacuum electron source is shown.•We employed this method for deposition of alumina-oxide coating on titan sample.•Surface hardness of Ti sample is increased in 3 times after deposition of coating with a uniform elemental composition.•Composition of beam plasma with gas and evaporated particle ions was investigated using modified analyzer RGA-100.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2017.06.042</doi><tpages>6</tpages></addata></record> |
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subjects | Aluminum oxide Ceramic coatings Ceramic glazes Ceramics Deposition Electron beams Electron bombardment Electrons Evaporation Microhardness Plasmas Protective coatings Studies Surface charge |
title | Ceramic coating deposition by electron beam evaporation |
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