Tribological performance of a tungsten disulfide lubricant film prepared by atomic layer deposition using tungsten hexacarbonyl and hydrogen sulfide as precursors

The tribological properties of a tungsten disulfide solid lubricant film prepared by atomic layer deposition were investigated. The WS2 film was deposited using tungsten hexacarbonyl and hydrogen sulfide as precursors. The results showed that due to the incomplete reaction of tungsten hexacarbonyl,...

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Veröffentlicht in:	Tribology international 2017-10, Vol.114, p.478-484
Hauptverfasser:	Sun, Yongfeng, Chai, Zhimin, Lu, Xinchun, Lu, Jing
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic layer deposition Atomic layer epitaxy Friction Hydrogen sulfide Low friction Lubrication Planes Precursors Reorientation Silicon nitride Solid lubricants Tribology Tungsten disulfide Wear resistance
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