Relative sputtering rates of oxides and fluorides of aluminum and yttrium

In order to understand the erosion behavior of oxide ceramics during their exposure to fluorocarbon plasma, the thin films of AlF3, YF3, Al2O3, Y2O3 and SiO2 were deposited on silicon and then their surfaces were irradiated with Ar ions of different kinetic energies. When we measured the relative sp...

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