The erosion groove effects on RF planar magnetron sputtering

Magnetron sputtering erodes the target non-uniformly, leading to the formation of a circular deep trench called groove, which will have a direct effect on plasma and thin film deposition properties. These effects are highlighted by measurements of the electrical parameters and the deposition rate. M...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Surface & coatings technology 2017-01, Vol.309, p.573-578
Hauptverfasser:	Tadjine, Rabah, Alim, Mounes M., Kechouane, Mohamed
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Effects Equivalence Erosion Impedance Ion current density Magnetron sputtering Plasma Plasma diagnostic Plasma impedance Plasmas (physics) Pressure RF plasma discharge Target erosion Thin films
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!