Enhanced Optical Absorption of Ti Thin Film: Coupled Effect of Deposition and Post-deposition Temperatures
In the present work, structural, morphological and optical properties of nanostructured titanium (Ti) thin films have been studied. The Ti thin films were fabricated on glass substrate by direct current (DC) magnetron sputtering at varying deposition and post-deposition temperatures ( T DA ) ranging...
Gespeichert in:
| Veröffentlicht in: | JOM (1989) 2017-11, Vol.69 (11), p.2383-2389 |
|---|---|
| Hauptverfasser: | , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 2389 |
|---|---|
| container_issue | 11 |
| container_start_page | 2383 |
| container_title | JOM (1989) |
| container_volume | 69 |
| creator | Jaiswal, Jyoti Mourya, Satyendra Malik, Gaurav Chauhan, Samta Daipuriya, Ritu Singh, Manpreet Chandra, Ramesh |
| description | In the present work, structural, morphological and optical properties of nanostructured titanium (Ti) thin films have been studied. The Ti thin films were fabricated on glass substrate by direct current (DC) magnetron sputtering at varying deposition and post-deposition temperatures (
T
DA
) ranging from 373 K to 773 K. The microstructure and morphology of the Ti thin films were found to be highly dependent on
T
DA
. The root mean square surface roughness (
δ
rms
) was found to increase with
T
DA
up to 673 K and then decreased at 773 K. The absorption (
A
) of Ti films has shown a similar trend as roughness with
T
DA
; however, the reflection (
R
) has shown an opposite trend. Maximum
A
~99–86% and minimum
R
~1–14% were observed in the spectral range of 300–1100 nm for the sample fabricated at
T
DA
= 673 K, which exhibited the highest
δ
rms
~193 nm. Due to its excellent absorption, this film may be a potential candidate for photonic applications such as a super-absorber. |
| doi_str_mv | 10.1007/s11837-017-2546-9 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1952354228</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1952354228</sourcerecordid><originalsourceid>FETCH-LOGICAL-c316t-2fd15e80046e6299a22edf23955e62cd739adbf537ec3404e80aff23e37758823</originalsourceid><addsrcrecordid>eNp1kDtPwzAUhS0EEuXxA9gsMRv8jG22qrSAVKkMYbbcxKap0jjYycC_xyVIsDDd13fOlQ4ANwTfEYzlfSJEMYkwkYgKXiB9AmZEcIaIEuQ095hLxBVT5-AipT3OGq7JDOyX3c52lavhph-ayrZwvk0h5j50MHhYNrDcNR1cNe3hAS7C2LeZXXrvquF4f3R9SM03bbsavoY0oPp3V7pD76IdxujSFTjztk3u-qdegrfVslw8o_Xm6WUxX6OKkWJA1NdEOIUxL1xBtbaUutpTpoXIc1VLpm299YJJVzGOeUatz3fHpBRKUXYJbiffPoaP0aXB7MMYu_zSEC0oE5xSlSkyUVUMKUXnTR-bg42fhmBzjNRMkZocqTlGanTW0EmTMtu9u_jH-V_RF-aEeRs</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1952354228</pqid></control><display><type>article</type><title>Enhanced Optical Absorption of Ti Thin Film: Coupled Effect of Deposition and Post-deposition Temperatures</title><source>SpringerLink Journals</source><creator>Jaiswal, Jyoti ; Mourya, Satyendra ; Malik, Gaurav ; Chauhan, Samta ; Daipuriya, Ritu ; Singh, Manpreet ; Chandra, Ramesh</creator><creatorcontrib>Jaiswal, Jyoti ; Mourya, Satyendra ; Malik, Gaurav ; Chauhan, Samta ; Daipuriya, Ritu ; Singh, Manpreet ; Chandra, Ramesh</creatorcontrib><description>In the present work, structural, morphological and optical properties of nanostructured titanium (Ti) thin films have been studied. The Ti thin films were fabricated on glass substrate by direct current (DC) magnetron sputtering at varying deposition and post-deposition temperatures (
T
DA
) ranging from 373 K to 773 K. The microstructure and morphology of the Ti thin films were found to be highly dependent on
T
DA
. The root mean square surface roughness (
δ
rms
) was found to increase with
T
DA
up to 673 K and then decreased at 773 K. The absorption (
A
) of Ti films has shown a similar trend as roughness with
T
DA
; however, the reflection (
R
) has shown an opposite trend. Maximum
A
~99–86% and minimum
R
~1–14% were observed in the spectral range of 300–1100 nm for the sample fabricated at
T
DA
= 673 K, which exhibited the highest
δ
rms
~193 nm. Due to its excellent absorption, this film may be a potential candidate for photonic applications such as a super-absorber.</description><identifier>ISSN: 1047-4838</identifier><identifier>EISSN: 1543-1851</identifier><identifier>DOI: 10.1007/s11837-017-2546-9</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Absorption ; Chemistry/Food Science ; Deposition ; Direct current ; Earth Sciences ; Engineering ; Environment ; Glass substrates ; Grain boundaries ; Grain growth ; Grain size ; Lasers ; Magnetron sputtering ; Materials science ; Microelectromechanical systems ; Microscopy ; Morphology ; Optical properties ; Photonics ; Physics ; Residual stress ; Spectrum analysis ; Surface roughness ; Temperature ; Thin films ; Titanium</subject><ispartof>JOM (1989), 2017-11, Vol.69 (11), p.2383-2389</ispartof><rights>The Minerals, Metals & Materials Society 2017</rights><rights>Copyright Springer Science & Business Media Nov 2017</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-2fd15e80046e6299a22edf23955e62cd739adbf537ec3404e80aff23e37758823</citedby><cites>FETCH-LOGICAL-c316t-2fd15e80046e6299a22edf23955e62cd739adbf537ec3404e80aff23e37758823</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11837-017-2546-9$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11837-017-2546-9$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Jaiswal, Jyoti</creatorcontrib><creatorcontrib>Mourya, Satyendra</creatorcontrib><creatorcontrib>Malik, Gaurav</creatorcontrib><creatorcontrib>Chauhan, Samta</creatorcontrib><creatorcontrib>Daipuriya, Ritu</creatorcontrib><creatorcontrib>Singh, Manpreet</creatorcontrib><creatorcontrib>Chandra, Ramesh</creatorcontrib><title>Enhanced Optical Absorption of Ti Thin Film: Coupled Effect of Deposition and Post-deposition Temperatures</title><title>JOM (1989)</title><addtitle>JOM</addtitle><description>In the present work, structural, morphological and optical properties of nanostructured titanium (Ti) thin films have been studied. The Ti thin films were fabricated on glass substrate by direct current (DC) magnetron sputtering at varying deposition and post-deposition temperatures (
T
DA
) ranging from 373 K to 773 K. The microstructure and morphology of the Ti thin films were found to be highly dependent on
T
DA
. The root mean square surface roughness (
δ
rms
) was found to increase with
T
DA
up to 673 K and then decreased at 773 K. The absorption (
A
) of Ti films has shown a similar trend as roughness with
T
DA
; however, the reflection (
R
) has shown an opposite trend. Maximum
A
~99–86% and minimum
R
~1–14% were observed in the spectral range of 300–1100 nm for the sample fabricated at
T
DA
= 673 K, which exhibited the highest
δ
rms
~193 nm. Due to its excellent absorption, this film may be a potential candidate for photonic applications such as a super-absorber.</description><subject>Absorption</subject><subject>Chemistry/Food Science</subject><subject>Deposition</subject><subject>Direct current</subject><subject>Earth Sciences</subject><subject>Engineering</subject><subject>Environment</subject><subject>Glass substrates</subject><subject>Grain boundaries</subject><subject>Grain growth</subject><subject>Grain size</subject><subject>Lasers</subject><subject>Magnetron sputtering</subject><subject>Materials science</subject><subject>Microelectromechanical systems</subject><subject>Microscopy</subject><subject>Morphology</subject><subject>Optical properties</subject><subject>Photonics</subject><subject>Physics</subject><subject>Residual stress</subject><subject>Spectrum analysis</subject><subject>Surface roughness</subject><subject>Temperature</subject><subject>Thin films</subject><subject>Titanium</subject><issn>1047-4838</issn><issn>1543-1851</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GNUQQ</sourceid><recordid>eNp1kDtPwzAUhS0EEuXxA9gsMRv8jG22qrSAVKkMYbbcxKap0jjYycC_xyVIsDDd13fOlQ4ANwTfEYzlfSJEMYkwkYgKXiB9AmZEcIaIEuQ095hLxBVT5-AipT3OGq7JDOyX3c52lavhph-ayrZwvk0h5j50MHhYNrDcNR1cNe3hAS7C2LeZXXrvquF4f3R9SM03bbsavoY0oPp3V7pD76IdxujSFTjztk3u-qdegrfVslw8o_Xm6WUxX6OKkWJA1NdEOIUxL1xBtbaUutpTpoXIc1VLpm299YJJVzGOeUatz3fHpBRKUXYJbiffPoaP0aXB7MMYu_zSEC0oE5xSlSkyUVUMKUXnTR-bg42fhmBzjNRMkZocqTlGanTW0EmTMtu9u_jH-V_RF-aEeRs</recordid><startdate>20171101</startdate><enddate>20171101</enddate><creator>Jaiswal, Jyoti</creator><creator>Mourya, Satyendra</creator><creator>Malik, Gaurav</creator><creator>Chauhan, Samta</creator><creator>Daipuriya, Ritu</creator><creator>Singh, Manpreet</creator><creator>Chandra, Ramesh</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>4T-</scope><scope>4U-</scope><scope>7SR</scope><scope>7TA</scope><scope>7WY</scope><scope>7XB</scope><scope>883</scope><scope>88I</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8FL</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BEZIV</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>FRNLG</scope><scope>GNUQQ</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>K60</scope><scope>K6~</scope><scope>KB.</scope><scope>L.-</scope><scope>M0F</scope><scope>M2P</scope><scope>PDBOC</scope><scope>PQBIZ</scope><scope>PQBZA</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>Q9U</scope><scope>S0X</scope></search><sort><creationdate>20171101</creationdate><title>Enhanced Optical Absorption of Ti Thin Film: Coupled Effect of Deposition and Post-deposition Temperatures</title><author>Jaiswal, Jyoti ; Mourya, Satyendra ; Malik, Gaurav ; Chauhan, Samta ; Daipuriya, Ritu ; Singh, Manpreet ; Chandra, Ramesh</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-2fd15e80046e6299a22edf23955e62cd739adbf537ec3404e80aff23e37758823</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Absorption</topic><topic>Chemistry/Food Science</topic><topic>Deposition</topic><topic>Direct current</topic><topic>Earth Sciences</topic><topic>Engineering</topic><topic>Environment</topic><topic>Glass substrates</topic><topic>Grain boundaries</topic><topic>Grain growth</topic><topic>Grain size</topic><topic>Lasers</topic><topic>Magnetron sputtering</topic><topic>Materials science</topic><topic>Microelectromechanical systems</topic><topic>Microscopy</topic><topic>Morphology</topic><topic>Optical properties</topic><topic>Photonics</topic><topic>Physics</topic><topic>Residual stress</topic><topic>Spectrum analysis</topic><topic>Surface roughness</topic><topic>Temperature</topic><topic>Thin films</topic><topic>Titanium</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jaiswal, Jyoti</creatorcontrib><creatorcontrib>Mourya, Satyendra</creatorcontrib><creatorcontrib>Malik, Gaurav</creatorcontrib><creatorcontrib>Chauhan, Samta</creatorcontrib><creatorcontrib>Daipuriya, Ritu</creatorcontrib><creatorcontrib>Singh, Manpreet</creatorcontrib><creatorcontrib>Chandra, Ramesh</creatorcontrib><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>Docstoc</collection><collection>University Readers</collection><collection>Engineered Materials Abstracts</collection><collection>Materials Business File</collection><collection>Access via ABI/INFORM (ProQuest)</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>ABI/INFORM Trade & Industry (Alumni Edition)</collection><collection>Science Database (Alumni Edition)</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>ABI/INFORM Collection (Alumni Edition)</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Business Premium Collection</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>Business Premium Collection (Alumni)</collection><collection>ProQuest Central Student</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>ProQuest Business Collection (Alumni Edition)</collection><collection>ProQuest Business Collection</collection><collection>Materials Science Database</collection><collection>ABI/INFORM Professional Advanced</collection><collection>ABI/INFORM Trade & Industry</collection><collection>Science Database</collection><collection>Materials Science Collection</collection><collection>ProQuest One Business</collection><collection>ProQuest One Business (Alumni)</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central Basic</collection><collection>SIRS Editorial</collection><jtitle>JOM (1989)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Jaiswal, Jyoti</au><au>Mourya, Satyendra</au><au>Malik, Gaurav</au><au>Chauhan, Samta</au><au>Daipuriya, Ritu</au><au>Singh, Manpreet</au><au>Chandra, Ramesh</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhanced Optical Absorption of Ti Thin Film: Coupled Effect of Deposition and Post-deposition Temperatures</atitle><jtitle>JOM (1989)</jtitle><stitle>JOM</stitle><date>2017-11-01</date><risdate>2017</risdate><volume>69</volume><issue>11</issue><spage>2383</spage><epage>2389</epage><pages>2383-2389</pages><issn>1047-4838</issn><eissn>1543-1851</eissn><abstract>In the present work, structural, morphological and optical properties of nanostructured titanium (Ti) thin films have been studied. The Ti thin films were fabricated on glass substrate by direct current (DC) magnetron sputtering at varying deposition and post-deposition temperatures (
T
DA
) ranging from 373 K to 773 K. The microstructure and morphology of the Ti thin films were found to be highly dependent on
T
DA
. The root mean square surface roughness (
δ
rms
) was found to increase with
T
DA
up to 673 K and then decreased at 773 K. The absorption (
A
) of Ti films has shown a similar trend as roughness with
T
DA
; however, the reflection (
R
) has shown an opposite trend. Maximum
A
~99–86% and minimum
R
~1–14% were observed in the spectral range of 300–1100 nm for the sample fabricated at
T
DA
= 673 K, which exhibited the highest
δ
rms
~193 nm. Due to its excellent absorption, this film may be a potential candidate for photonic applications such as a super-absorber.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11837-017-2546-9</doi><tpages>7</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1047-4838 |
| ispartof | JOM (1989), 2017-11, Vol.69 (11), p.2383-2389 |
| issn | 1047-4838 1543-1851 |
| language | eng |
| recordid | cdi_proquest_journals_1952354228 |
| source | SpringerLink Journals |
| subjects | Absorption Chemistry/Food Science Deposition Direct current Earth Sciences Engineering Environment Glass substrates Grain boundaries Grain growth Grain size Lasers Magnetron sputtering Materials science Microelectromechanical systems Microscopy Morphology Optical properties Photonics Physics Residual stress Spectrum analysis Surface roughness Temperature Thin films Titanium |
| title | Enhanced Optical Absorption of Ti Thin Film: Coupled Effect of Deposition and Post-deposition Temperatures |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T02%3A29%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Enhanced%20Optical%20Absorption%20of%20Ti%20Thin%20Film:%20Coupled%20Effect%20of%20Deposition%20and%20Post-deposition%20Temperatures&rft.jtitle=JOM%20(1989)&rft.au=Jaiswal,%20Jyoti&rft.date=2017-11-01&rft.volume=69&rft.issue=11&rft.spage=2383&rft.epage=2389&rft.pages=2383-2389&rft.issn=1047-4838&rft.eissn=1543-1851&rft_id=info:doi/10.1007/s11837-017-2546-9&rft_dat=%3Cproquest_cross%3E1952354228%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1952354228&rft_id=info:pmid/&rfr_iscdi=true |