Kinetic theory of stochastically heated RF capacitive discharges
Stochastic sheath heating is the dominant heating mechanism at low pressures for radio frequency (RF) capacitive discharges. It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations....
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| Veröffentlicht in: | IEEE Transactions on Plasma Science 1998-02, Vol.26 (1), p.59-68 |
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| container_end_page | 68 |
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| container_title | IEEE Transactions on Plasma Science |
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| creator | Zuoding Wang Lichtenberg, A.J. Cohen, R.H. |
| description | Stochastic sheath heating is the dominant heating mechanism at low pressures for radio frequency (RF) capacitive discharges. It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to obtain a space- and time-averaged kinetic equation. We assume that electrons with the x component kinetic energy lower than a certain threshold /spl Phi/ are prevented from interacting with the sheath heating fields. With these approximations and either a knowledge of the central density or an ansatz on /spl Phi/, we obtain a self-consistent solution for the quasiequilibrium discharge parameters valid for low pressures in argon. The results are compared to those found in experiments, yielding reasonable agreement. |
| doi_str_mv | 10.1109/27.659533 |
| format | Article |
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It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to obtain a space- and time-averaged kinetic equation. We assume that electrons with the x component kinetic energy lower than a certain threshold /spl Phi/ are prevented from interacting with the sheath heating fields. With these approximations and either a knowledge of the central density or an ansatz on /spl Phi/, we obtain a self-consistent solution for the quasiequilibrium discharge parameters valid for low pressures in argon. The results are compared to those found in experiments, yielding reasonable agreement.</description><identifier>ISSN: 0093-3813</identifier><identifier>EISSN: 1939-9375</identifier><identifier>DOI: 10.1109/27.659533</identifier><identifier>CODEN: ITPSBD</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Argon ; Electric discharges ; Electrons ; Exact sciences and technology ; Heating ; HIGH-FREQUENCY DISCHARGES ; Kinetic energy ; KINETIC EQUATIONS ; Kinetic theory ; Kinetics ; Maxwell equations ; Numerical simulation ; PHYSICS ; Physics of gases, plasmas and electric discharges ; Physics of plasmas and electric discharges ; PLASMA HEATING ; Plasma kinetic equations ; Plasma properties ; PLASMA SHEATH ; Probability distribution ; Radio frequency ; SELF-CONSISTENT FIELD ; Stochastic models ; STOCHASTIC PROCESSES</subject><ispartof>IEEE Transactions on Plasma Science, 1998-02, Vol.26 (1), p.59-68</ispartof><rights>1998 INIST-CNRS</rights><rights>Copyright Institute of Electrical and Electronics Engineers, Inc. (IEEE) Feb 1998</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c385t-c36ad454296ab13f63f44fc297385125683dd433810a201e5c91f2cc3c4f2feb3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/659533$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,796,885,27924,27925,54758</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/659533$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=2202202$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/616155$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Zuoding Wang</creatorcontrib><creatorcontrib>Lichtenberg, A.J.</creatorcontrib><creatorcontrib>Cohen, R.H.</creatorcontrib><title>Kinetic theory of stochastically heated RF capacitive discharges</title><title>IEEE Transactions on Plasma Science</title><addtitle>TPS</addtitle><description>Stochastic sheath heating is the dominant heating mechanism at low pressures for radio frequency (RF) capacitive discharges. It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to obtain a space- and time-averaged kinetic equation. We assume that electrons with the x component kinetic energy lower than a certain threshold /spl Phi/ are prevented from interacting with the sheath heating fields. With these approximations and either a knowledge of the central density or an ansatz on /spl Phi/, we obtain a self-consistent solution for the quasiequilibrium discharge parameters valid for low pressures in argon. The results are compared to those found in experiments, yielding reasonable agreement.</description><subject>Argon</subject><subject>Electric discharges</subject><subject>Electrons</subject><subject>Exact sciences and technology</subject><subject>Heating</subject><subject>HIGH-FREQUENCY DISCHARGES</subject><subject>Kinetic energy</subject><subject>KINETIC EQUATIONS</subject><subject>Kinetic theory</subject><subject>Kinetics</subject><subject>Maxwell equations</subject><subject>Numerical simulation</subject><subject>PHYSICS</subject><subject>Physics of gases, plasmas and electric discharges</subject><subject>Physics of plasmas and electric discharges</subject><subject>PLASMA HEATING</subject><subject>Plasma kinetic equations</subject><subject>Plasma properties</subject><subject>PLASMA SHEATH</subject><subject>Probability distribution</subject><subject>Radio frequency</subject><subject>SELF-CONSISTENT FIELD</subject><subject>Stochastic models</subject><subject>STOCHASTIC PROCESSES</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1998</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkM9LwzAYhoMoOKcHr56qiOChMz-atLkpw6k4EETPIUu_2I6umUkm7L83o8ODEBL4vicvDy9C5wRPCMHyjpYTwSVn7ACNiGQyl6zkh2iEsWQ5qwg7RichLDEmBcd0hO5f2x5ia7LYgPPbzNksRGcaHdJQd902a0BHqLP3WWb0Wps2tj-Q1W1IjP-CcIqOrO4CnO3fMfqcPX5Mn_P529PL9GGeG1bxmG6h64IXVAq9IMwKZovCGirLtCaUi4rVdcGSIdYUE-BGEkuNYaaw1MKCjdHlkOuSmQrJA0xjXN-DiUoQQThPzM3ArL373kCIapU8oet0D24TFK0YFZKXCbz6By7dxvfJXxHJiahksYNuB8h4F4IHq9a-XWm_VQSrXdmKlmooO7HX-0AdUm3W69604e8DpXh3EnYxYC0A_G33Gb9MHIQc</recordid><startdate>19980201</startdate><enddate>19980201</enddate><creator>Zuoding Wang</creator><creator>Lichtenberg, A.J.</creator><creator>Cohen, R.H.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>19980201</creationdate><title>Kinetic theory of stochastically heated RF capacitive discharges</title><author>Zuoding Wang ; Lichtenberg, A.J. ; Cohen, R.H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c385t-c36ad454296ab13f63f44fc297385125683dd433810a201e5c91f2cc3c4f2feb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1998</creationdate><topic>Argon</topic><topic>Electric discharges</topic><topic>Electrons</topic><topic>Exact sciences and technology</topic><topic>Heating</topic><topic>HIGH-FREQUENCY DISCHARGES</topic><topic>Kinetic energy</topic><topic>KINETIC EQUATIONS</topic><topic>Kinetic theory</topic><topic>Kinetics</topic><topic>Maxwell equations</topic><topic>Numerical simulation</topic><topic>PHYSICS</topic><topic>Physics of gases, plasmas and electric discharges</topic><topic>Physics of plasmas and electric discharges</topic><topic>PLASMA HEATING</topic><topic>Plasma kinetic equations</topic><topic>Plasma properties</topic><topic>PLASMA SHEATH</topic><topic>Probability distribution</topic><topic>Radio frequency</topic><topic>SELF-CONSISTENT FIELD</topic><topic>Stochastic models</topic><topic>STOCHASTIC PROCESSES</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zuoding Wang</creatorcontrib><creatorcontrib>Lichtenberg, A.J.</creatorcontrib><creatorcontrib>Cohen, R.H.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>IEEE Transactions on Plasma Science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zuoding Wang</au><au>Lichtenberg, A.J.</au><au>Cohen, R.H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Kinetic theory of stochastically heated RF capacitive discharges</atitle><jtitle>IEEE Transactions on Plasma Science</jtitle><stitle>TPS</stitle><date>1998-02-01</date><risdate>1998</risdate><volume>26</volume><issue>1</issue><spage>59</spage><epage>68</epage><pages>59-68</pages><issn>0093-3813</issn><eissn>1939-9375</eissn><coden>ITPSBD</coden><abstract>Stochastic sheath heating is the dominant heating mechanism at low pressures for radio frequency (RF) capacitive discharges. It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to obtain a space- and time-averaged kinetic equation. We assume that electrons with the x component kinetic energy lower than a certain threshold /spl Phi/ are prevented from interacting with the sheath heating fields. With these approximations and either a knowledge of the central density or an ansatz on /spl Phi/, we obtain a self-consistent solution for the quasiequilibrium discharge parameters valid for low pressures in argon. The results are compared to those found in experiments, yielding reasonable agreement.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/27.659533</doi><tpages>10</tpages></addata></record> |
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| issn | 0093-3813 1939-9375 |
| language | eng |
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| subjects | Argon Electric discharges Electrons Exact sciences and technology Heating HIGH-FREQUENCY DISCHARGES Kinetic energy KINETIC EQUATIONS Kinetic theory Kinetics Maxwell equations Numerical simulation PHYSICS Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges PLASMA HEATING Plasma kinetic equations Plasma properties PLASMA SHEATH Probability distribution Radio frequency SELF-CONSISTENT FIELD Stochastic models STOCHASTIC PROCESSES |
| title | Kinetic theory of stochastically heated RF capacitive discharges |
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