A comparison of pulsed and continuous ultraviolet light sources for the decontamination of surfaces

The experimental results on the development of a decontamination process that uses ultraviolet light and chemical photosensitizer for disinfecting surfaces and solutions are reported. Reduction in the microbial viability as a function of applied UV fluence is presented for the inactivation of Bacill...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on plasma science 2000-10, Vol.28 (5), p.1581-1587
Hauptverfasser: McDonald, K.F., Curry, R.D., Clevenger, T.E., Unklesbay, K., Eisenstark, A., Golden, J., Morgan, R.D.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 1587
container_issue 5
container_start_page 1581
container_title IEEE transactions on plasma science
container_volume 28
creator McDonald, K.F.
Curry, R.D.
Clevenger, T.E.
Unklesbay, K.
Eisenstark, A.
Golden, J.
Morgan, R.D.
description The experimental results on the development of a decontamination process that uses ultraviolet light and chemical photosensitizer for disinfecting surfaces and solutions are reported. Reduction in the microbial viability as a function of applied UV fluence is presented for the inactivation of Bacillus subtilis spores. Results obtained with aqueous solutions and with surfaces indicate that pulsed UV light is more effective than continuous UV light. Nearly three orders of magnitude of enhanced inactivation have been achieved with the photosensitized UV process on surfaces.
doi_str_mv 10.1109/27.901237
format Article
fullrecord <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_journals_195166831</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>901237</ieee_id><sourcerecordid>28184318</sourcerecordid><originalsourceid>FETCH-LOGICAL-c335t-85946d73220137bae5990711e83c6f8a8708fb4d29fa610d0d1083331d6773383</originalsourceid><addsrcrecordid>eNqN0b9LxDAUB_AgCp6ng6tTcBAcer7X1zbJeIi_4MBF55JrUy9H25xJK_jfm6OHg5PTG74fvvDlMXaJsEAEdZeKhQJMSRyxGSpSiSKRH7MZgKKEJNIpOwthC4BZDumMVUteuW6nvQ2u567hu7ENpua6r2PQD7Yf3Rj42A5ef1nXmoG39mMz8OBGX5nAG-f5sDG8NnuuO9vrwU5VYfSNjuacnTQ6tl4c7py9Pz683T8nq9enl_vlKqmI8iGRucqKWlCaApJYa5MrBQLRSKqKRmopQDbrrE5VowuEGmoESURYF0IQSZqzm6l3593naMJQdjZUpm11b-KIMpUoM8J_QJFmAFJFeP0HbuPsPo4oUeVYFJIwotsJVd6F4E1T7rzttP8uEcr9U2JfOT0l2qvJWmPMrzuEPzcxhgk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>195166831</pqid></control><display><type>article</type><title>A comparison of pulsed and continuous ultraviolet light sources for the decontamination of surfaces</title><source>IEEE Electronic Library (IEL)</source><creator>McDonald, K.F. ; Curry, R.D. ; Clevenger, T.E. ; Unklesbay, K. ; Eisenstark, A. ; Golden, J. ; Morgan, R.D.</creator><creatorcontrib>McDonald, K.F. ; Curry, R.D. ; Clevenger, T.E. ; Unklesbay, K. ; Eisenstark, A. ; Golden, J. ; Morgan, R.D.</creatorcontrib><description>The experimental results on the development of a decontamination process that uses ultraviolet light and chemical photosensitizer for disinfecting surfaces and solutions are reported. Reduction in the microbial viability as a function of applied UV fluence is presented for the inactivation of Bacillus subtilis spores. Results obtained with aqueous solutions and with surfaces indicate that pulsed UV light is more effective than continuous UV light. Nearly three orders of magnitude of enhanced inactivation have been achieved with the photosensitized UV process on surfaces.</description><identifier>ISSN: 0093-3813</identifier><identifier>EISSN: 1939-9375</identifier><identifier>DOI: 10.1109/27.901237</identifier><identifier>CODEN: ITPSBD</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Bacteria ; Chemical processes ; Contamination ; Decontamination ; Earth ; Fungi ; Light sources ; Microorganisms ; Missiles ; Physics ; Spraying ; Surface cleaning ; Ultraviolet radiation</subject><ispartof>IEEE transactions on plasma science, 2000-10, Vol.28 (5), p.1581-1587</ispartof><rights>Copyright Institute of Electrical and Electronics Engineers, Inc. (IEEE) Oct 2000</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c335t-85946d73220137bae5990711e83c6f8a8708fb4d29fa610d0d1083331d6773383</citedby><cites>FETCH-LOGICAL-c335t-85946d73220137bae5990711e83c6f8a8708fb4d29fa610d0d1083331d6773383</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/901237$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/901237$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>McDonald, K.F.</creatorcontrib><creatorcontrib>Curry, R.D.</creatorcontrib><creatorcontrib>Clevenger, T.E.</creatorcontrib><creatorcontrib>Unklesbay, K.</creatorcontrib><creatorcontrib>Eisenstark, A.</creatorcontrib><creatorcontrib>Golden, J.</creatorcontrib><creatorcontrib>Morgan, R.D.</creatorcontrib><title>A comparison of pulsed and continuous ultraviolet light sources for the decontamination of surfaces</title><title>IEEE transactions on plasma science</title><addtitle>TPS</addtitle><description>The experimental results on the development of a decontamination process that uses ultraviolet light and chemical photosensitizer for disinfecting surfaces and solutions are reported. Reduction in the microbial viability as a function of applied UV fluence is presented for the inactivation of Bacillus subtilis spores. Results obtained with aqueous solutions and with surfaces indicate that pulsed UV light is more effective than continuous UV light. Nearly three orders of magnitude of enhanced inactivation have been achieved with the photosensitized UV process on surfaces.</description><subject>Bacteria</subject><subject>Chemical processes</subject><subject>Contamination</subject><subject>Decontamination</subject><subject>Earth</subject><subject>Fungi</subject><subject>Light sources</subject><subject>Microorganisms</subject><subject>Missiles</subject><subject>Physics</subject><subject>Spraying</subject><subject>Surface cleaning</subject><subject>Ultraviolet radiation</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqN0b9LxDAUB_AgCp6ng6tTcBAcer7X1zbJeIi_4MBF55JrUy9H25xJK_jfm6OHg5PTG74fvvDlMXaJsEAEdZeKhQJMSRyxGSpSiSKRH7MZgKKEJNIpOwthC4BZDumMVUteuW6nvQ2u567hu7ENpua6r2PQD7Yf3Rj42A5ef1nXmoG39mMz8OBGX5nAG-f5sDG8NnuuO9vrwU5VYfSNjuacnTQ6tl4c7py9Pz683T8nq9enl_vlKqmI8iGRucqKWlCaApJYa5MrBQLRSKqKRmopQDbrrE5VowuEGmoESURYF0IQSZqzm6l3593naMJQdjZUpm11b-KIMpUoM8J_QJFmAFJFeP0HbuPsPo4oUeVYFJIwotsJVd6F4E1T7rzttP8uEcr9U2JfOT0l2qvJWmPMrzuEPzcxhgk</recordid><startdate>200010</startdate><enddate>200010</enddate><creator>McDonald, K.F.</creator><creator>Curry, R.D.</creator><creator>Clevenger, T.E.</creator><creator>Unklesbay, K.</creator><creator>Eisenstark, A.</creator><creator>Golden, J.</creator><creator>Morgan, R.D.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>H8D</scope></search><sort><creationdate>200010</creationdate><title>A comparison of pulsed and continuous ultraviolet light sources for the decontamination of surfaces</title><author>McDonald, K.F. ; Curry, R.D. ; Clevenger, T.E. ; Unklesbay, K. ; Eisenstark, A. ; Golden, J. ; Morgan, R.D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c335t-85946d73220137bae5990711e83c6f8a8708fb4d29fa610d0d1083331d6773383</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><topic>Bacteria</topic><topic>Chemical processes</topic><topic>Contamination</topic><topic>Decontamination</topic><topic>Earth</topic><topic>Fungi</topic><topic>Light sources</topic><topic>Microorganisms</topic><topic>Missiles</topic><topic>Physics</topic><topic>Spraying</topic><topic>Surface cleaning</topic><topic>Ultraviolet radiation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>McDonald, K.F.</creatorcontrib><creatorcontrib>Curry, R.D.</creatorcontrib><creatorcontrib>Clevenger, T.E.</creatorcontrib><creatorcontrib>Unklesbay, K.</creatorcontrib><creatorcontrib>Eisenstark, A.</creatorcontrib><creatorcontrib>Golden, J.</creatorcontrib><creatorcontrib>Morgan, R.D.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Aerospace Database</collection><jtitle>IEEE transactions on plasma science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>McDonald, K.F.</au><au>Curry, R.D.</au><au>Clevenger, T.E.</au><au>Unklesbay, K.</au><au>Eisenstark, A.</au><au>Golden, J.</au><au>Morgan, R.D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A comparison of pulsed and continuous ultraviolet light sources for the decontamination of surfaces</atitle><jtitle>IEEE transactions on plasma science</jtitle><stitle>TPS</stitle><date>2000-10</date><risdate>2000</risdate><volume>28</volume><issue>5</issue><spage>1581</spage><epage>1587</epage><pages>1581-1587</pages><issn>0093-3813</issn><eissn>1939-9375</eissn><coden>ITPSBD</coden><abstract>The experimental results on the development of a decontamination process that uses ultraviolet light and chemical photosensitizer for disinfecting surfaces and solutions are reported. Reduction in the microbial viability as a function of applied UV fluence is presented for the inactivation of Bacillus subtilis spores. Results obtained with aqueous solutions and with surfaces indicate that pulsed UV light is more effective than continuous UV light. Nearly three orders of magnitude of enhanced inactivation have been achieved with the photosensitized UV process on surfaces.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/27.901237</doi><tpages>7</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 0093-3813
ispartof IEEE transactions on plasma science, 2000-10, Vol.28 (5), p.1581-1587
issn 0093-3813
1939-9375
language eng
recordid cdi_proquest_journals_195166831
source IEEE Electronic Library (IEL)
subjects Bacteria
Chemical processes
Contamination
Decontamination
Earth
Fungi
Light sources
Microorganisms
Missiles
Physics
Spraying
Surface cleaning
Ultraviolet radiation
title A comparison of pulsed and continuous ultraviolet light sources for the decontamination of surfaces
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-06T23%3A44%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20comparison%20of%20pulsed%20and%20continuous%20ultraviolet%20light%20sources%20for%20the%20decontamination%20of%20surfaces&rft.jtitle=IEEE%20transactions%20on%20plasma%20science&rft.au=McDonald,%20K.F.&rft.date=2000-10&rft.volume=28&rft.issue=5&rft.spage=1581&rft.epage=1587&rft.pages=1581-1587&rft.issn=0093-3813&rft.eissn=1939-9375&rft.coden=ITPSBD&rft_id=info:doi/10.1109/27.901237&rft_dat=%3Cproquest_RIE%3E28184318%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=195166831&rft_id=info:pmid/&rft_ieee_id=901237&rfr_iscdi=true