Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition

A comparative study of thin titanium oxynitride (TiOxNy) films prepared by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium (TDMAT) and N2 plasma as well as titanium(IV)isopropoxide and NH3 plasma is reported. The comparison is based on the combination of Ti2p core level...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Surface & coatings technology 2017-09, Vol.324, p.586-593
Hauptverfasser:	Kot, Małgorzata, Henkel, Karsten, Das, Chittaranjan, Brizzi, Simone, Kärkkänen, Irina, Schneidewind, Jessica, Naumann, Franziska, Gargouri, Hassan, Schmeißer, Dieter
Format:	Artikel
Sprache:	eng
Schlagworte:	ALD process parameters Atomic layer epitaxy Band gap Comparative studies Energy resolution In-gap defect states Leakage Leakage current Parameter modification Plasma enhanced atomic layer deposition (PEALD) Plasmas (physics) Process parameters Thin films Ti[sbnd]N contributions Titanium Titanium nitride Titanium oxynitride Valence band
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!