Comparative study on plasmonic properties of a Ni film and 2D Ni nanodot array fabricated on an ITO substrate

[Display omitted] •Two-dimensional Ni NDAs with diameters of 45nm and 90nm were formed on ITO substrates using anodic aluminum oxide masks.•The extinction spectrum of 50nm thick Ni film exhibited a broad dip at 437nm.•The LSPR of the Ni NDA with a 45nm diameter shows a broad peak at approximately 40...

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Veröffentlicht in:	Materials letters 2017-10, Vol.204, p.49-52
Hauptverfasser:	Jung, Mi, Choi, Young-Wan
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Aluminum oxide Anodic aluminum oxide mask Indium tin oxides Localized surface plasmon resonance Materials science Ni nanodot array Ni thin film Nickel Surface plasmon resonance Thickness Thin films Transition metals
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