Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations

To solve the defect problem during the exposure process of EUV lithography (EUVL), an EUV pellicle is suggested as a solution. Even though use of an EUV pellicle is considered an essential solution for defect control during the exposure process, it is not ready for application in real commercial pro...

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Veröffentlicht in:	Microelectronic engineering 2017-06, Vol.177, p.35-40
Hauptverfasser:	Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-Keun
Format:	Artikel
Sprache:	eng
Schlagworte:	CD uniformity Coherence Deformation Deformation mechanisms EUV lithography EUV pellicle Illumination Lithography Luminance distribution Offset printing Patterning Pellicle Pellicle deformation Transmission non-uniformity
Online-Zugang:	Volltext
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