Enhancement of printing overlay accuracy by reducing the effects of mark deformations
The roll-based high-speed printing process has the two major advantages of high productivity and a simple process over the conventional electronic device manufacturing process. There have been several attempts to commercially apply the roll-based high-speed printing process to various electronic dev...
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Veröffentlicht in: | Microelectronic engineering 2017-08, Vol.180, p.8-14 |
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creator | Lee, Eonseok Choi, Young-Man Lee, Seung-Hyun Kwon, Sin Lee, Taik-Min Kang, Dongwoo |
description | The roll-based high-speed printing process has the two major advantages of high productivity and a simple process over the conventional electronic device manufacturing process. There have been several attempts to commercially apply the roll-based high-speed printing process to various electronic devices. While such attempts have sought to improve the performance of electronic devices, these devices require multi-layered structures to be printed with high overlay accuracy between each layer. Printed patterns always appear to be deformed compared to the designs on the master plate because the printing process is solution based. Given variations in ink transfer volume, the accuracy of the overlay measurement can be degraded by mark deformations. This means that these deformations caused by the printing mechanism should be taken into account. In this paper, we provide the details from a simulation study and experiment carried out using gravure offset printing to investigate the effects of mark deformations on overlay measurement accuracy. We analyzed and optimized the pattern registration algorithms and the type of overlay marks in order to improve the measurement accuracy of the positions of the printed patterns. As a result, the repeatability measuring the positions of the printed patterns can be reduced to 1.0μm and 2.0μm in the CD and MD directions in the gravure offset printing process, respectively.
[Display omitted]
•Printed shape changes of patterns are defined as “mark deformations.”•It is confirmed that the mark deformations affect measuring the printing positions.•Measurement methods are discussed to reduce the effects of mark deformations.•Combining grating marks with the area-based image registration is recommended.•Measurement repeatability can be reduced effectively using the recommended method. |
doi_str_mv | 10.1016/j.mee.2017.05.046 |
format | Article |
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[Display omitted]
•Printed shape changes of patterns are defined as “mark deformations.”•It is confirmed that the mark deformations affect measuring the printing positions.•Measurement methods are discussed to reduce the effects of mark deformations.•Combining grating marks with the area-based image registration is recommended.•Measurement repeatability can be reduced effectively using the recommended method.</description><identifier>ISSN: 0167-9317</identifier><identifier>EISSN: 1873-5568</identifier><identifier>DOI: 10.1016/j.mee.2017.05.046</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Computer simulation ; Deformation effects ; Deformation mechanisms ; Electronic devices ; Electronics ; Experiments ; Gravure ; High speed ; Mark deformation ; Measurement ; Multilayers ; Offset printing ; Overlay ; Pattern registration ; Performance enhancement ; Plates (structural members) ; Printed electronics ; Printing ; Registration ; Simulation</subject><ispartof>Microelectronic engineering, 2017-08, Vol.180, p.8-14</ispartof><rights>2017 Elsevier B.V.</rights><rights>Copyright Elsevier BV Aug 5, 2017</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c444t-4605fce37f70c8694178e9b2eb42ea207aa1965ca0ff4a192cec3638721c7c8f3</citedby><cites>FETCH-LOGICAL-c444t-4605fce37f70c8694178e9b2eb42ea207aa1965ca0ff4a192cec3638721c7c8f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.mee.2017.05.046$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Lee, Eonseok</creatorcontrib><creatorcontrib>Choi, Young-Man</creatorcontrib><creatorcontrib>Lee, Seung-Hyun</creatorcontrib><creatorcontrib>Kwon, Sin</creatorcontrib><creatorcontrib>Lee, Taik-Min</creatorcontrib><creatorcontrib>Kang, Dongwoo</creatorcontrib><title>Enhancement of printing overlay accuracy by reducing the effects of mark deformations</title><title>Microelectronic engineering</title><description>The roll-based high-speed printing process has the two major advantages of high productivity and a simple process over the conventional electronic device manufacturing process. There have been several attempts to commercially apply the roll-based high-speed printing process to various electronic devices. While such attempts have sought to improve the performance of electronic devices, these devices require multi-layered structures to be printed with high overlay accuracy between each layer. Printed patterns always appear to be deformed compared to the designs on the master plate because the printing process is solution based. Given variations in ink transfer volume, the accuracy of the overlay measurement can be degraded by mark deformations. This means that these deformations caused by the printing mechanism should be taken into account. In this paper, we provide the details from a simulation study and experiment carried out using gravure offset printing to investigate the effects of mark deformations on overlay measurement accuracy. We analyzed and optimized the pattern registration algorithms and the type of overlay marks in order to improve the measurement accuracy of the positions of the printed patterns. As a result, the repeatability measuring the positions of the printed patterns can be reduced to 1.0μm and 2.0μm in the CD and MD directions in the gravure offset printing process, respectively.
[Display omitted]
•Printed shape changes of patterns are defined as “mark deformations.”•It is confirmed that the mark deformations affect measuring the printing positions.•Measurement methods are discussed to reduce the effects of mark deformations.•Combining grating marks with the area-based image registration is recommended.•Measurement repeatability can be reduced effectively using the recommended method.</description><subject>Computer simulation</subject><subject>Deformation effects</subject><subject>Deformation mechanisms</subject><subject>Electronic devices</subject><subject>Electronics</subject><subject>Experiments</subject><subject>Gravure</subject><subject>High speed</subject><subject>Mark deformation</subject><subject>Measurement</subject><subject>Multilayers</subject><subject>Offset printing</subject><subject>Overlay</subject><subject>Pattern registration</subject><subject>Performance enhancement</subject><subject>Plates (structural members)</subject><subject>Printed electronics</subject><subject>Printing</subject><subject>Registration</subject><subject>Simulation</subject><issn>0167-9317</issn><issn>1873-5568</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNp9UMtOwzAQtBBIlMIHcLPEOcF2HNsRJ1TxkipxoWfLddY0oYmLnVTK3-NQzpx2VzuzOzMI3VKSU0LFfZt3ADkjVOakzAkXZ2hBlSyyshTqHC0SRmZVQeUluoqxJWnmRC3Q5qnfmd5CB_2AvcOH0PRD039if4SwNxM21o7B2AlvJxygHu28HHaAwTmwQ5xJnQlfuAbnQ2eGxvfxGl04s49w81eXaPP89LF6zdbvL2-rx3VmOedDxgUpnYVCOkmsEhWnUkG1ZbDlDAwj0hhaidIa4hxPLbNgC1EoyaiVVrliie5Odw_Bf48QB936MfTppaYVZ1QpxkVC0RPKBh9jAKeTy6R50pToOT3d6pSentPTpNTkl_Nw4kCSf2wg6GgbSEHVTUi2de2bf9g_VXJ4IA</recordid><startdate>20170805</startdate><enddate>20170805</enddate><creator>Lee, Eonseok</creator><creator>Choi, Young-Man</creator><creator>Lee, Seung-Hyun</creator><creator>Kwon, Sin</creator><creator>Lee, Taik-Min</creator><creator>Kang, Dongwoo</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20170805</creationdate><title>Enhancement of printing overlay accuracy by reducing the effects of mark deformations</title><author>Lee, Eonseok ; Choi, Young-Man ; Lee, Seung-Hyun ; Kwon, Sin ; Lee, Taik-Min ; Kang, Dongwoo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c444t-4605fce37f70c8694178e9b2eb42ea207aa1965ca0ff4a192cec3638721c7c8f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Computer simulation</topic><topic>Deformation effects</topic><topic>Deformation mechanisms</topic><topic>Electronic devices</topic><topic>Electronics</topic><topic>Experiments</topic><topic>Gravure</topic><topic>High speed</topic><topic>Mark deformation</topic><topic>Measurement</topic><topic>Multilayers</topic><topic>Offset printing</topic><topic>Overlay</topic><topic>Pattern registration</topic><topic>Performance enhancement</topic><topic>Plates (structural members)</topic><topic>Printed electronics</topic><topic>Printing</topic><topic>Registration</topic><topic>Simulation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lee, Eonseok</creatorcontrib><creatorcontrib>Choi, Young-Man</creatorcontrib><creatorcontrib>Lee, Seung-Hyun</creatorcontrib><creatorcontrib>Kwon, Sin</creatorcontrib><creatorcontrib>Lee, Taik-Min</creatorcontrib><creatorcontrib>Kang, Dongwoo</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Microelectronic engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lee, Eonseok</au><au>Choi, Young-Man</au><au>Lee, Seung-Hyun</au><au>Kwon, Sin</au><au>Lee, Taik-Min</au><au>Kang, Dongwoo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Enhancement of printing overlay accuracy by reducing the effects of mark deformations</atitle><jtitle>Microelectronic engineering</jtitle><date>2017-08-05</date><risdate>2017</risdate><volume>180</volume><spage>8</spage><epage>14</epage><pages>8-14</pages><issn>0167-9317</issn><eissn>1873-5568</eissn><abstract>The roll-based high-speed printing process has the two major advantages of high productivity and a simple process over the conventional electronic device manufacturing process. There have been several attempts to commercially apply the roll-based high-speed printing process to various electronic devices. While such attempts have sought to improve the performance of electronic devices, these devices require multi-layered structures to be printed with high overlay accuracy between each layer. Printed patterns always appear to be deformed compared to the designs on the master plate because the printing process is solution based. Given variations in ink transfer volume, the accuracy of the overlay measurement can be degraded by mark deformations. This means that these deformations caused by the printing mechanism should be taken into account. In this paper, we provide the details from a simulation study and experiment carried out using gravure offset printing to investigate the effects of mark deformations on overlay measurement accuracy. We analyzed and optimized the pattern registration algorithms and the type of overlay marks in order to improve the measurement accuracy of the positions of the printed patterns. As a result, the repeatability measuring the positions of the printed patterns can be reduced to 1.0μm and 2.0μm in the CD and MD directions in the gravure offset printing process, respectively.
[Display omitted]
•Printed shape changes of patterns are defined as “mark deformations.”•It is confirmed that the mark deformations affect measuring the printing positions.•Measurement methods are discussed to reduce the effects of mark deformations.•Combining grating marks with the area-based image registration is recommended.•Measurement repeatability can be reduced effectively using the recommended method.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.mee.2017.05.046</doi><tpages>7</tpages></addata></record> |
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subjects | Computer simulation Deformation effects Deformation mechanisms Electronic devices Electronics Experiments Gravure High speed Mark deformation Measurement Multilayers Offset printing Overlay Pattern registration Performance enhancement Plates (structural members) Printed electronics Printing Registration Simulation |
title | Enhancement of printing overlay accuracy by reducing the effects of mark deformations |
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