Permeation barrier properties of silicon oxide films deposited on polyethylene terephthalate (PET) substrate using roll-to-roll reactive magnetron sputtering system

Silicon oxide (SiOx) barrier films were deposited on polyethylene terephthalate (PET) substrate at 20°C using reactive dual magnetron sputtering system. The oxygen flow rate, input sputtering power and film thickness were changed to optimize the barrier properties of SiOx films. Details of sputterin...

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Veröffentlicht in:	Microelectronic engineering 2016-12, Vol.166, p.39-44
Hauptverfasser:	Bang, S.-H., Hwang, Nong-Moon, Kim, H.-L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Barriers Encapsulation Film density Film thickness Flow velocity Ion bombardment Magnetron sputtering Oxide coatings Polyethylene Polyethylene terephthalate Properties (attributes) Reactive sputtering Residual stress Silicon Silicon oxide Silicon substrates Surface roughness Water vapor
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