High aspect ratio and low leakage current carbon nanosheets based high-k nanostructure for energy storage applications

Carbon nanosheets (CNS) are exploited to fabricate a high aspect ratio strontium titanate (STO) structure with very low leakage current density. CNS are grown by chemical vapor deposition (CVD) on 70nm layer of TiN coated Si wafers. Atomic layer deposition (ALD) is employed as a conformal deposition...

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Veröffentlicht in:	Microelectronic engineering 2017-02, Vol.169, p.1-8
Hauptverfasser:	Qaid, Mohammad, Alsalhi, M.S.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum oxide Area enhancement Atomic layer epitaxy Atomic structure Carbon nanosheets Chemical vapor deposition Current density EIS Electrochemical impedance spectroscopy Energy storage High aspect ratio High aspect ratio materials Insulators Leakage Leakage current Nanosheets Nanostructure Nanostructured materials Strontium Supercapacitors Thin films Three-dimensional struntium titanate
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