Optical signatures of silicon and oxygen related DX centers in AlN
Bulk AlN crystals typically contain high concentrations of oxygen, silicon, and carbon − as also state‐of‐the art epitaxial layers typically do, depending on the specific growth conditions. In optical spectroscopy, such crystals show broad bands in the region from 2–5 eV in absorption and emission....
Gespeichert in:
Veröffentlicht in: | Physica status solidi. A, Applications and materials science Applications and materials science, 2017-09, Vol.214 (9), p.1600749-n/a |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | n/a |
---|---|
container_issue | 9 |
container_start_page | 1600749 |
container_title | Physica status solidi. A, Applications and materials science |
container_volume | 214 |
creator | Thonke, Klaus Lamprecht, Matthias Collazo, Ramon Sitar, Zlatko |
description | Bulk AlN crystals typically contain high concentrations of oxygen, silicon, and carbon − as also state‐of‐the art epitaxial layers typically do, depending on the specific growth conditions. In optical spectroscopy, such crystals show broad bands in the region from 2–5 eV in absorption and emission. We investigated several emission bands in the range from 1.4 to 1.9 eV, especially those centred at 2.0 and 2.4 eV, which under below‐bandgap excitation with a 325 nm laser dominate the photoluminescence (PL) spectra both at low and at room temperature. We find clear indications that all these transitions occur between different states of the shallow donors Si or O, and deep acceptors. The donors undergo lattice relaxation and form DX centres. Depending on temperature, the initial state is either a long‐lived (S = 1) DX‐centre state of the donors, a shallow EMT‐like conventional donor state, or a free electron − with markedly different relaxation times for the optical transitions under below‐bandgap excitation. The acceptor involved in these PL bands is likely linked to aluminum vacancies. Based on our data, we develop configuration coordinate diagrams and a combined level scheme for multiple transitions in the range from 1.4 to 2.4 eV.
Tentative level scheme for PL bands observed in AlN in the range from 1.4 to 2.4 eV. |
doi_str_mv | 10.1002/pssa.201600749 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1936480407</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1936480407</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3839-6e09080f6a5561c7dafc697cf9c3475578e0540410afd4a380f1a22d9bf67e3</originalsourceid><addsrcrecordid>eNqFkE1LAzEQhoMoWKtXzwHPWyebbLI51voJxQr14C3E7KRsWbNrskX7791SqUdP8w487ww8hFwymDCA_LpLyU5yYBJACX1ERqyUeSY508eHDHBKzlJaA4hCKDYiN4uur51taKpXwfabiIm2ftia2rWB2lDR9nu7wkAjNrbHit6-UYehx5hoHei0eT4nJ942CS9-55gs7-9eZ4_ZfPHwNJvOM8dLrjOJoKEEL21RSOZUZb2TWjmvHReqKFSJUAgQDKyvhOUDymyeV_rdS4V8TK72V7vYfm4w9WbdbmIYHhqmuRQlCFADNdlTLrYpRfSmi_WHjVvDwOwsmZ0lc7A0FPS-8FU3uP2HNi_L5fSv-wPD_Gqs</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1936480407</pqid></control><display><type>article</type><title>Optical signatures of silicon and oxygen related DX centers in AlN</title><source>Wiley Online Library All Journals</source><creator>Thonke, Klaus ; Lamprecht, Matthias ; Collazo, Ramon ; Sitar, Zlatko</creator><creatorcontrib>Thonke, Klaus ; Lamprecht, Matthias ; Collazo, Ramon ; Sitar, Zlatko</creatorcontrib><description>Bulk AlN crystals typically contain high concentrations of oxygen, silicon, and carbon − as also state‐of‐the art epitaxial layers typically do, depending on the specific growth conditions. In optical spectroscopy, such crystals show broad bands in the region from 2–5 eV in absorption and emission. We investigated several emission bands in the range from 1.4 to 1.9 eV, especially those centred at 2.0 and 2.4 eV, which under below‐bandgap excitation with a 325 nm laser dominate the photoluminescence (PL) spectra both at low and at room temperature. We find clear indications that all these transitions occur between different states of the shallow donors Si or O, and deep acceptors. The donors undergo lattice relaxation and form DX centres. Depending on temperature, the initial state is either a long‐lived (S = 1) DX‐centre state of the donors, a shallow EMT‐like conventional donor state, or a free electron − with markedly different relaxation times for the optical transitions under below‐bandgap excitation. The acceptor involved in these PL bands is likely linked to aluminum vacancies. Based on our data, we develop configuration coordinate diagrams and a combined level scheme for multiple transitions in the range from 1.4 to 2.4 eV.
Tentative level scheme for PL bands observed in AlN in the range from 1.4 to 2.4 eV.</description><identifier>ISSN: 1862-6300</identifier><identifier>EISSN: 1862-6319</identifier><identifier>DOI: 10.1002/pssa.201600749</identifier><language>eng</language><publisher>Weinheim: Wiley Subscription Services, Inc</publisher><subject>AlN ; Aluminum ; Aluminum nitride ; DX centres ; Emission analysis ; Epitaxial growth ; Epitaxial layers ; Excitation ; Lattice vacancies ; Photoluminescence ; Silicon ; Spectrum analysis ; time‐resolved photoluminescence</subject><ispartof>Physica status solidi. A, Applications and materials science, 2017-09, Vol.214 (9), p.1600749-n/a</ispartof><rights>2017 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</rights><rights>2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3839-6e09080f6a5561c7dafc697cf9c3475578e0540410afd4a380f1a22d9bf67e3</citedby><cites>FETCH-LOGICAL-c3839-6e09080f6a5561c7dafc697cf9c3475578e0540410afd4a380f1a22d9bf67e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fpssa.201600749$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fpssa.201600749$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27923,27924,45573,45574</link.rule.ids></links><search><creatorcontrib>Thonke, Klaus</creatorcontrib><creatorcontrib>Lamprecht, Matthias</creatorcontrib><creatorcontrib>Collazo, Ramon</creatorcontrib><creatorcontrib>Sitar, Zlatko</creatorcontrib><title>Optical signatures of silicon and oxygen related DX centers in AlN</title><title>Physica status solidi. A, Applications and materials science</title><description>Bulk AlN crystals typically contain high concentrations of oxygen, silicon, and carbon − as also state‐of‐the art epitaxial layers typically do, depending on the specific growth conditions. In optical spectroscopy, such crystals show broad bands in the region from 2–5 eV in absorption and emission. We investigated several emission bands in the range from 1.4 to 1.9 eV, especially those centred at 2.0 and 2.4 eV, which under below‐bandgap excitation with a 325 nm laser dominate the photoluminescence (PL) spectra both at low and at room temperature. We find clear indications that all these transitions occur between different states of the shallow donors Si or O, and deep acceptors. The donors undergo lattice relaxation and form DX centres. Depending on temperature, the initial state is either a long‐lived (S = 1) DX‐centre state of the donors, a shallow EMT‐like conventional donor state, or a free electron − with markedly different relaxation times for the optical transitions under below‐bandgap excitation. The acceptor involved in these PL bands is likely linked to aluminum vacancies. Based on our data, we develop configuration coordinate diagrams and a combined level scheme for multiple transitions in the range from 1.4 to 2.4 eV.
Tentative level scheme for PL bands observed in AlN in the range from 1.4 to 2.4 eV.</description><subject>AlN</subject><subject>Aluminum</subject><subject>Aluminum nitride</subject><subject>DX centres</subject><subject>Emission analysis</subject><subject>Epitaxial growth</subject><subject>Epitaxial layers</subject><subject>Excitation</subject><subject>Lattice vacancies</subject><subject>Photoluminescence</subject><subject>Silicon</subject><subject>Spectrum analysis</subject><subject>time‐resolved photoluminescence</subject><issn>1862-6300</issn><issn>1862-6319</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LAzEQhoMoWKtXzwHPWyebbLI51voJxQr14C3E7KRsWbNrskX7791SqUdP8w487ww8hFwymDCA_LpLyU5yYBJACX1ERqyUeSY508eHDHBKzlJaA4hCKDYiN4uur51taKpXwfabiIm2ftia2rWB2lDR9nu7wkAjNrbHit6-UYehx5hoHei0eT4nJ942CS9-55gs7-9eZ4_ZfPHwNJvOM8dLrjOJoKEEL21RSOZUZb2TWjmvHReqKFSJUAgQDKyvhOUDymyeV_rdS4V8TK72V7vYfm4w9WbdbmIYHhqmuRQlCFADNdlTLrYpRfSmi_WHjVvDwOwsmZ0lc7A0FPS-8FU3uP2HNi_L5fSv-wPD_Gqs</recordid><startdate>201709</startdate><enddate>201709</enddate><creator>Thonke, Klaus</creator><creator>Lamprecht, Matthias</creator><creator>Collazo, Ramon</creator><creator>Sitar, Zlatko</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>201709</creationdate><title>Optical signatures of silicon and oxygen related DX centers in AlN</title><author>Thonke, Klaus ; Lamprecht, Matthias ; Collazo, Ramon ; Sitar, Zlatko</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3839-6e09080f6a5561c7dafc697cf9c3475578e0540410afd4a380f1a22d9bf67e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>AlN</topic><topic>Aluminum</topic><topic>Aluminum nitride</topic><topic>DX centres</topic><topic>Emission analysis</topic><topic>Epitaxial growth</topic><topic>Epitaxial layers</topic><topic>Excitation</topic><topic>Lattice vacancies</topic><topic>Photoluminescence</topic><topic>Silicon</topic><topic>Spectrum analysis</topic><topic>time‐resolved photoluminescence</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Thonke, Klaus</creatorcontrib><creatorcontrib>Lamprecht, Matthias</creatorcontrib><creatorcontrib>Collazo, Ramon</creatorcontrib><creatorcontrib>Sitar, Zlatko</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Physica status solidi. A, Applications and materials science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Thonke, Klaus</au><au>Lamprecht, Matthias</au><au>Collazo, Ramon</au><au>Sitar, Zlatko</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Optical signatures of silicon and oxygen related DX centers in AlN</atitle><jtitle>Physica status solidi. A, Applications and materials science</jtitle><date>2017-09</date><risdate>2017</risdate><volume>214</volume><issue>9</issue><spage>1600749</spage><epage>n/a</epage><pages>1600749-n/a</pages><issn>1862-6300</issn><eissn>1862-6319</eissn><abstract>Bulk AlN crystals typically contain high concentrations of oxygen, silicon, and carbon − as also state‐of‐the art epitaxial layers typically do, depending on the specific growth conditions. In optical spectroscopy, such crystals show broad bands in the region from 2–5 eV in absorption and emission. We investigated several emission bands in the range from 1.4 to 1.9 eV, especially those centred at 2.0 and 2.4 eV, which under below‐bandgap excitation with a 325 nm laser dominate the photoluminescence (PL) spectra both at low and at room temperature. We find clear indications that all these transitions occur between different states of the shallow donors Si or O, and deep acceptors. The donors undergo lattice relaxation and form DX centres. Depending on temperature, the initial state is either a long‐lived (S = 1) DX‐centre state of the donors, a shallow EMT‐like conventional donor state, or a free electron − with markedly different relaxation times for the optical transitions under below‐bandgap excitation. The acceptor involved in these PL bands is likely linked to aluminum vacancies. Based on our data, we develop configuration coordinate diagrams and a combined level scheme for multiple transitions in the range from 1.4 to 2.4 eV.
Tentative level scheme for PL bands observed in AlN in the range from 1.4 to 2.4 eV.</abstract><cop>Weinheim</cop><pub>Wiley Subscription Services, Inc</pub><doi>10.1002/pssa.201600749</doi><tpages>8</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1862-6300 |
ispartof | Physica status solidi. A, Applications and materials science, 2017-09, Vol.214 (9), p.1600749-n/a |
issn | 1862-6300 1862-6319 |
language | eng |
recordid | cdi_proquest_journals_1936480407 |
source | Wiley Online Library All Journals |
subjects | AlN Aluminum Aluminum nitride DX centres Emission analysis Epitaxial growth Epitaxial layers Excitation Lattice vacancies Photoluminescence Silicon Spectrum analysis time‐resolved photoluminescence |
title | Optical signatures of silicon and oxygen related DX centers in AlN |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T08%3A22%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Optical%20signatures%20of%20silicon%20and%20oxygen%20related%20DX%20centers%20in%20AlN&rft.jtitle=Physica%20status%20solidi.%20A,%20Applications%20and%20materials%20science&rft.au=Thonke,%20Klaus&rft.date=2017-09&rft.volume=214&rft.issue=9&rft.spage=1600749&rft.epage=n/a&rft.pages=1600749-n/a&rft.issn=1862-6300&rft.eissn=1862-6319&rft_id=info:doi/10.1002/pssa.201600749&rft_dat=%3Cproquest_cross%3E1936480407%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1936480407&rft_id=info:pmid/&rfr_iscdi=true |