Improvement of material removal rate of single-crystal diamond by polishing using H^sub 2^O^sub 2^ solution

In this study, we investigated the possibility of improving the material removal rate (MRR) of a single-crystal diamond (100) substrate by a polishing technique that utilizes a chemical reaction with H2O2 solution. To demonstrate the feasibility of improving the MRR of the diamond substrate, we inve...

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Veröffentlicht in:	Diamond and related materials 2016-11, Vol.70, p.39
Hauptverfasser:	Kubota, Akihisa, Nagae, Shin, Touge, Mutsumi
Format:	Artikel
Sprache:	eng
Schlagworte:	Austenitic stainless steels Chemical reactions Diamond polishing Diamonds Feeding Material removal rate (machining) Nickel Single crystals Temperature Tribology
Online-Zugang:	Volltext
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