Annealing effects on Ga‐doped ZnO thin films grown by atmospheric spray pyrolysis using diethylzinc solution

Polycrystalline a‐axis oriented Ga‐doped ZnO thin film could be grown on glass substrate by a conventional atmospheric spray pyrolysis at 150 °C using diethylzinc‐based solution. The n‐type Ga‐doped ZnO thin film had a resistivity of 1.5 × 10−3 Ω cm, a carrier concentration of 2.0 × 1020 cm−3 and a...

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Veröffentlicht in:Physica status solidi. C 2017-06, Vol.14 (6), p.n/a
Hauptverfasser: Yoshino, Kenji, Tominaga, Himeka, Ide, Akiko, Nishioka, Kensuke, Naka, Toshio
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Tominaga, Himeka
Ide, Akiko
Nishioka, Kensuke
Naka, Toshio
description Polycrystalline a‐axis oriented Ga‐doped ZnO thin film could be grown on glass substrate by a conventional atmospheric spray pyrolysis at 150 °C using diethylzinc‐based solution. The n‐type Ga‐doped ZnO thin film had a resistivity of 1.5 × 10−3 Ω cm, a carrier concentration of 2.0 × 1020 cm−3 and a mobility of 20.0 cm2 (Vs)−1 at an optimal Ga content of 2 wt.% upon hydrogen annealing at 450 °C. It was assumed that an increase of the n‐type carrier concentration is due to increase oxygen vacancies by reacting hydrogen and oxygen in ZnO from X‐ray photoelectron spectroscopy.
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subjects Annealing
Carrier density
diethyl zinc
Glass substrates
Photoelectron spectroscopy
Photovoltaic cells
Spray pyrolysis
Thin films
Vacancies
Zinc oxide
ZnO
title Annealing effects on Ga‐doped ZnO thin films grown by atmospheric spray pyrolysis using diethylzinc solution
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