37‐2: Plane Source Evaporation Techniques for Super Ultra High Resolution Flexible AMOLED
The vacuum thermal evaporation (VTE) patterning technique using linear type evaporation sources has 3μm of minimum shadow distance so that the high resolution (577ppi, 2K QHD) AMOLED can be manufactured. However, there is a shadow limitation of the neighboring patterns overlapped when manufacturing...
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| Veröffentlicht in: | SID International Symposium Digest of technical papers 2017-05, Vol.48 (1), p.523-526 |
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| container_title | SID International Symposium Digest of technical papers |
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| creator | Hwang, Changhun Kim, Sung Su Lee, Hagwon Jo, Sung Min Chin, Byung Doo Kong, Do-Hoon Ju, Sung Hoo |
| description | The vacuum thermal evaporation (VTE) patterning technique using linear type evaporation sources has 3μm of minimum shadow distance so that the high resolution (577ppi, 2K QHD) AMOLED can be manufactured. However, there is a shadow limitation of the neighboring patterns overlapped when manufacturing the ultra‐high resolution (800ppi, 4K UHD) AMOLED. The plane source VTE shows recently of 1.1μm~1.3μm in shadow distance measurements and it verifies the possibility of manufacturing the ultra‐high resolution AMOLEDs with 1000~1500ppi. The shadow angle of 83° and shadow distance of 0.37μm have been predicted from the plane source AFM analysis and, therefore, it shows high possibility of manufacturing the super‐ultra‐high AMOLEDs with 3300ppi. The study of plane source evaporation and its evaporator need to be expanded for the AMOLED futures. |
| doi_str_mv | 10.1002/sdtp.11690 |
| format | Article |
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However, there is a shadow limitation of the neighboring patterns overlapped when manufacturing the ultra‐high resolution (800ppi, 4K UHD) AMOLED. The plane source VTE shows recently of 1.1μm~1.3μm in shadow distance measurements and it verifies the possibility of manufacturing the ultra‐high resolution AMOLEDs with 1000~1500ppi. The shadow angle of 83° and shadow distance of 0.37μm have been predicted from the plane source AFM analysis and, therefore, it shows high possibility of manufacturing the super‐ultra‐high AMOLEDs with 3300ppi. 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The study of plane source evaporation and its evaporator need to be expanded for the AMOLED futures.</description><subject>Evaporation</subject><subject>High resolution</subject><subject>Manufacturing</subject><subject>Patterning</subject><subject>Plane source</subject><subject>PPI</subject><subject>Shadow distance</subject><subject>Vacuum thermal evaporation</subject><subject>VTE</subject><issn>0097-966X</issn><issn>2168-0159</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNp90LtOwzAUBmALgUQpLDyBJTaklOPYdWy2qheKVNSKthISg5U4Dk0VkmAnQDcegWfkSUgbZqazfOf2I3RJoEcA_BsXV2WPEC7hCHV8woUHpC-PUQdABp7k_OkUnTm3BaCUMdlBzzT4-fr2b_EiC3ODl0VttcHj97AsbFilRY5XRm_y9K02DieFxcu6NBavs8qGeJq-bPCjcUVWH-gkM59plBk8eJjPxqNzdJKEmTMXf7WL1pPxajj1ZvO7--Fg5mnCOHgx4RAEItEypgZiP4pAA2hN-xERnDPCJI85iYAawUPmgxF96QupE5ZQXxjaRVft3NIW-zsrtW3eyJuVikhggQiIEI26bpW2hXPWJKq06Wtod4qA2oen9uGpQ3gNJi3-SDOz-0eq5Wi1aHt-AfmkcOo</recordid><startdate>201705</startdate><enddate>201705</enddate><creator>Hwang, Changhun</creator><creator>Kim, Sung Su</creator><creator>Lee, Hagwon</creator><creator>Jo, Sung Min</creator><creator>Chin, Byung Doo</creator><creator>Kong, Do-Hoon</creator><creator>Ju, Sung Hoo</creator><general>Wiley Subscription Services, Inc</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SC</scope><scope>7SP</scope><scope>8FD</scope><scope>JQ2</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope></search><sort><creationdate>201705</creationdate><title>37‐2: Plane Source Evaporation Techniques for Super Ultra High Resolution Flexible AMOLED</title><author>Hwang, Changhun ; Kim, Sung Su ; Lee, Hagwon ; Jo, Sung Min ; Chin, Byung Doo ; Kong, Do-Hoon ; Ju, Sung Hoo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1460-d160778fc9d3e0d2bb0c00cc35b186641496d61b03e86a420e859289cf4f328e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Evaporation</topic><topic>High resolution</topic><topic>Manufacturing</topic><topic>Patterning</topic><topic>Plane source</topic><topic>PPI</topic><topic>Shadow distance</topic><topic>Vacuum thermal evaporation</topic><topic>VTE</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hwang, Changhun</creatorcontrib><creatorcontrib>Kim, Sung Su</creatorcontrib><creatorcontrib>Lee, Hagwon</creatorcontrib><creatorcontrib>Jo, Sung Min</creatorcontrib><creatorcontrib>Chin, Byung Doo</creatorcontrib><creatorcontrib>Kong, Do-Hoon</creatorcontrib><creatorcontrib>Ju, Sung Hoo</creatorcontrib><collection>CrossRef</collection><collection>Computer and Information Systems Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><jtitle>SID International Symposium Digest of technical papers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hwang, Changhun</au><au>Kim, Sung Su</au><au>Lee, Hagwon</au><au>Jo, Sung Min</au><au>Chin, Byung Doo</au><au>Kong, Do-Hoon</au><au>Ju, Sung Hoo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>37‐2: Plane Source Evaporation Techniques for Super Ultra High Resolution Flexible AMOLED</atitle><jtitle>SID International Symposium Digest of technical papers</jtitle><date>2017-05</date><risdate>2017</risdate><volume>48</volume><issue>1</issue><spage>523</spage><epage>526</epage><pages>523-526</pages><issn>0097-966X</issn><eissn>2168-0159</eissn><abstract>The vacuum thermal evaporation (VTE) patterning technique using linear type evaporation sources has 3μm of minimum shadow distance so that the high resolution (577ppi, 2K QHD) AMOLED can be manufactured. 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| language | eng |
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| subjects | Evaporation High resolution Manufacturing Patterning Plane source PPI Shadow distance Vacuum thermal evaporation VTE |
| title | 37‐2: Plane Source Evaporation Techniques for Super Ultra High Resolution Flexible AMOLED |
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