Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor
The emission of greenhouse gases, such as N 2 O and fluorinated gases, has been increasingly regulated in the semiconductor industry. Pressure effects on the abatement of N 2 O and CF 4 were investigated in a low-pressure plasma reactor by using Fourier transform infrared (FTIR) spectroscopy. The de...
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| Veröffentlicht in: | Plasma chemistry and plasma processing 2016-11, Vol.36 (6), p.1589-1601 |
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| container_title | Plasma chemistry and plasma processing |
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| creator | Hur, M. Lee, J. O. Lee, J. Y. Kang, W. S. Song, Y.-H. |
| description | The emission of greenhouse gases, such as N
2
O and fluorinated gases, has been increasingly regulated in the semiconductor industry. Pressure effects on the abatement of N
2
O and CF
4
were investigated in a low-pressure plasma reactor by using Fourier transform infrared (FTIR) spectroscopy. The destruction and removal efficiency (DRE) of N
2
O and CF
4
was significantly lowered below 0.2 Torr. When the pressure was increased, the DRE of CF
4
with H
2
O as the reactant gas increased continuously, but that with O
2
or without any reactant gas first increased and then decreased. A larger electrode length yielded a higher DRE of N
2
O and CF
4
, especially at lower pressures. To understand this phenomenon, the electrical waveforms for the discharge in N
2
O were analyzed in conjunction with its optical emission profiles, and the rotational temperatures for different electrode lengths were compared using the N
2
+
ion band (λ = 391.4 nm). They provided insights into the mechanism involved in terms of plasma property and gas residence time. |
| doi_str_mv | 10.1007/s11090-016-9744-z |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1880861800</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1880861800</sourcerecordid><originalsourceid>FETCH-LOGICAL-c305t-b8738a38c4a142dc2ced9d58ca6f397311904e24fc37688d71bec9b8add7db1b3</originalsourceid><addsrcrecordid>eNp1kE1LAzEURYMoWKs_wF3AdTRfnWSWpbQqDFpE1yGTvOkH7aQmU8T-elNHxI2rPMI99_EOQteM3jJK1V1ijJaUUFaQUklJDidowEaKE13q4hQNKM-zFFyeo4uU1pRmSqgBWk2bBlyXcGjwPEJK-wjYth5PN_k7Bg-4gnbRLXFocbcEPK5tB1touyPxxJ-_w5OZxKsWW1yFD_JbM9_YtLX4BazrQrxEZ43dJLj6eYfobTZ9nTyQ6vn-cTKuiBN01JFaK6Gt0E5aJrl33IEv_Ug7WzSiVIKxkkrgsnFCFVp7xWpwZa2t98rXrBZDdNP37mJ430PqzDrsY5tXGqY11QXT-fQhYn3KxZBShMbs4mpr46dh1ByNmt6oyUbN0ag5ZIb3TMrZdgHxT_O_0BdUWnh5</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1880861800</pqid></control><display><type>article</type><title>Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor</title><source>SpringerLink (Online service)</source><creator>Hur, M. ; Lee, J. O. ; Lee, J. Y. ; Kang, W. S. ; Song, Y.-H.</creator><creatorcontrib>Hur, M. ; Lee, J. O. ; Lee, J. Y. ; Kang, W. S. ; Song, Y.-H.</creatorcontrib><description>The emission of greenhouse gases, such as N
2
O and fluorinated gases, has been increasingly regulated in the semiconductor industry. Pressure effects on the abatement of N
2
O and CF
4
were investigated in a low-pressure plasma reactor by using Fourier transform infrared (FTIR) spectroscopy. The destruction and removal efficiency (DRE) of N
2
O and CF
4
was significantly lowered below 0.2 Torr. When the pressure was increased, the DRE of CF
4
with H
2
O as the reactant gas increased continuously, but that with O
2
or without any reactant gas first increased and then decreased. A larger electrode length yielded a higher DRE of N
2
O and CF
4
, especially at lower pressures. To understand this phenomenon, the electrical waveforms for the discharge in N
2
O were analyzed in conjunction with its optical emission profiles, and the rotational temperatures for different electrode lengths were compared using the N
2
+
ion band (λ = 391.4 nm). They provided insights into the mechanism involved in terms of plasma property and gas residence time.</description><identifier>ISSN: 0272-4324</identifier><identifier>EISSN: 1572-8986</identifier><identifier>DOI: 10.1007/s11090-016-9744-z</identifier><language>eng</language><publisher>New York: Springer US</publisher><subject>Characterization and Evaluation of Materials ; Chemistry ; Chemistry and Materials Science ; Classical Mechanics ; Electrodes ; Emission analysis ; Fourier transforms ; Gases ; Greenhouse gases ; Inorganic Chemistry ; Low pressure ; Mechanical Engineering ; Nitrogen plasma ; Nitrous oxide ; Optical properties ; Original Paper ; Pressure effects ; Semiconductors ; Waveforms</subject><ispartof>Plasma chemistry and plasma processing, 2016-11, Vol.36 (6), p.1589-1601</ispartof><rights>Springer Science+Business Media New York 2016</rights><rights>Copyright Springer Science & Business Media 2016</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c305t-b8738a38c4a142dc2ced9d58ca6f397311904e24fc37688d71bec9b8add7db1b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11090-016-9744-z$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11090-016-9744-z$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>315,781,785,27926,27927,41490,42559,51321</link.rule.ids></links><search><creatorcontrib>Hur, M.</creatorcontrib><creatorcontrib>Lee, J. O.</creatorcontrib><creatorcontrib>Lee, J. Y.</creatorcontrib><creatorcontrib>Kang, W. S.</creatorcontrib><creatorcontrib>Song, Y.-H.</creatorcontrib><title>Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor</title><title>Plasma chemistry and plasma processing</title><addtitle>Plasma Chem Plasma Process</addtitle><description>The emission of greenhouse gases, such as N
2
O and fluorinated gases, has been increasingly regulated in the semiconductor industry. Pressure effects on the abatement of N
2
O and CF
4
were investigated in a low-pressure plasma reactor by using Fourier transform infrared (FTIR) spectroscopy. The destruction and removal efficiency (DRE) of N
2
O and CF
4
was significantly lowered below 0.2 Torr. When the pressure was increased, the DRE of CF
4
with H
2
O as the reactant gas increased continuously, but that with O
2
or without any reactant gas first increased and then decreased. A larger electrode length yielded a higher DRE of N
2
O and CF
4
, especially at lower pressures. To understand this phenomenon, the electrical waveforms for the discharge in N
2
O were analyzed in conjunction with its optical emission profiles, and the rotational temperatures for different electrode lengths were compared using the N
2
+
ion band (λ = 391.4 nm). They provided insights into the mechanism involved in terms of plasma property and gas residence time.</description><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Classical Mechanics</subject><subject>Electrodes</subject><subject>Emission analysis</subject><subject>Fourier transforms</subject><subject>Gases</subject><subject>Greenhouse gases</subject><subject>Inorganic Chemistry</subject><subject>Low pressure</subject><subject>Mechanical Engineering</subject><subject>Nitrogen plasma</subject><subject>Nitrous oxide</subject><subject>Optical properties</subject><subject>Original Paper</subject><subject>Pressure effects</subject><subject>Semiconductors</subject><subject>Waveforms</subject><issn>0272-4324</issn><issn>1572-8986</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp1kE1LAzEURYMoWKs_wF3AdTRfnWSWpbQqDFpE1yGTvOkH7aQmU8T-elNHxI2rPMI99_EOQteM3jJK1V1ijJaUUFaQUklJDidowEaKE13q4hQNKM-zFFyeo4uU1pRmSqgBWk2bBlyXcGjwPEJK-wjYth5PN_k7Bg-4gnbRLXFocbcEPK5tB1touyPxxJ-_w5OZxKsWW1yFD_JbM9_YtLX4BazrQrxEZ43dJLj6eYfobTZ9nTyQ6vn-cTKuiBN01JFaK6Gt0E5aJrl33IEv_Ug7WzSiVIKxkkrgsnFCFVp7xWpwZa2t98rXrBZDdNP37mJ430PqzDrsY5tXGqY11QXT-fQhYn3KxZBShMbs4mpr46dh1ByNmt6oyUbN0ag5ZIb3TMrZdgHxT_O_0BdUWnh5</recordid><startdate>20161101</startdate><enddate>20161101</enddate><creator>Hur, M.</creator><creator>Lee, J. O.</creator><creator>Lee, J. Y.</creator><creator>Kang, W. S.</creator><creator>Song, Y.-H.</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20161101</creationdate><title>Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor</title><author>Hur, M. ; Lee, J. O. ; Lee, J. Y. ; Kang, W. S. ; Song, Y.-H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c305t-b8738a38c4a142dc2ced9d58ca6f397311904e24fc37688d71bec9b8add7db1b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Characterization and Evaluation of Materials</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Classical Mechanics</topic><topic>Electrodes</topic><topic>Emission analysis</topic><topic>Fourier transforms</topic><topic>Gases</topic><topic>Greenhouse gases</topic><topic>Inorganic Chemistry</topic><topic>Low pressure</topic><topic>Mechanical Engineering</topic><topic>Nitrogen plasma</topic><topic>Nitrous oxide</topic><topic>Optical properties</topic><topic>Original Paper</topic><topic>Pressure effects</topic><topic>Semiconductors</topic><topic>Waveforms</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Hur, M.</creatorcontrib><creatorcontrib>Lee, J. O.</creatorcontrib><creatorcontrib>Lee, J. Y.</creatorcontrib><creatorcontrib>Kang, W. S.</creatorcontrib><creatorcontrib>Song, Y.-H.</creatorcontrib><collection>CrossRef</collection><jtitle>Plasma chemistry and plasma processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hur, M.</au><au>Lee, J. O.</au><au>Lee, J. Y.</au><au>Kang, W. S.</au><au>Song, Y.-H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor</atitle><jtitle>Plasma chemistry and plasma processing</jtitle><stitle>Plasma Chem Plasma Process</stitle><date>2016-11-01</date><risdate>2016</risdate><volume>36</volume><issue>6</issue><spage>1589</spage><epage>1601</epage><pages>1589-1601</pages><issn>0272-4324</issn><eissn>1572-8986</eissn><abstract>The emission of greenhouse gases, such as N
2
O and fluorinated gases, has been increasingly regulated in the semiconductor industry. Pressure effects on the abatement of N
2
O and CF
4
were investigated in a low-pressure plasma reactor by using Fourier transform infrared (FTIR) spectroscopy. The destruction and removal efficiency (DRE) of N
2
O and CF
4
was significantly lowered below 0.2 Torr. When the pressure was increased, the DRE of CF
4
with H
2
O as the reactant gas increased continuously, but that with O
2
or without any reactant gas first increased and then decreased. A larger electrode length yielded a higher DRE of N
2
O and CF
4
, especially at lower pressures. To understand this phenomenon, the electrical waveforms for the discharge in N
2
O were analyzed in conjunction with its optical emission profiles, and the rotational temperatures for different electrode lengths were compared using the N
2
+
ion band (λ = 391.4 nm). They provided insights into the mechanism involved in terms of plasma property and gas residence time.</abstract><cop>New York</cop><pub>Springer US</pub><doi>10.1007/s11090-016-9744-z</doi><tpages>13</tpages></addata></record> |
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| language | eng |
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| subjects | Characterization and Evaluation of Materials Chemistry Chemistry and Materials Science Classical Mechanics Electrodes Emission analysis Fourier transforms Gases Greenhouse gases Inorganic Chemistry Low pressure Mechanical Engineering Nitrogen plasma Nitrous oxide Optical properties Original Paper Pressure effects Semiconductors Waveforms |
| title | Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor |
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