Scanning probe-based high-accuracy overlay alignment concept for lithography applications

Overlay alignment is a concern for nanolithography applications, in particular, for those using step and repeat techniques targeting next-generation lithographic applications. In this context, a new method and a proof of concept (POC) setup for accurately aligning a mask with a semiconductor wafer i...

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Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2017, Vol.123 (1), p.1-12, Article 89
Hauptverfasser:	Ishchuk, Valentyn, Guliyev, Elshad, Aydogan, Cemal, Buliev, Ivan, Kaestner, Marcus, Ivanov, Tzvetan, Ahmad, Ahmad, Reum, Alexander, Lenk, Steve, Lenk, Claudia, Nikolov, Nikolay, Glinsner, Thomas, Rangelow, Ivo W.
Format:	Artikel
Sprache:	eng
Schlagworte:	Accuracy Alignment Applied physics Atomic force microscopes Atomic force microscopy Characterization and Evaluation of Materials Condensed Matter Physics Ion beams Lithography Machines Manufacturing Materials science Microscopes Nanotechnology Optical and Electronic Materials Photolithography Physics Physics and Astronomy Processes Scanning Surfaces and Interfaces Temperature compensation Thin Films
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