Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films
Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH 3 ) 2 ) 2 NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O 2...
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| Veröffentlicht in: | Journal of structural chemistry 2017, Vol.58 (1), p.119-125 |
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| container_title | Journal of structural chemistry |
| container_volume | 58 |
| creator | Fainer, N. I. Plekhanov, A. G. Golubenko, A. N. Rumyantsev, Yu. M. Maksimovskii, E. A. Shayapov, V. R. |
| description | Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH
3
)
2
)
2
NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O
2
+
x
N
2
), a method is developed to obtain SiC
x
N
y
O
z
:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The
in situ
composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy. |
| doi_str_mv | 10.1134/S0022476617010188 |
| format | Article |
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3
)
2
)
2
NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O
2
+
x
N
2
), a method is developed to obtain SiC
x
N
y
O
z
:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The
in situ
composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.</description><identifier>ISSN: 0022-4766</identifier><identifier>EISSN: 1573-8779</identifier><identifier>DOI: 10.1134/S0022476617010188</identifier><language>eng</language><publisher>Moscow: Pleiades Publishing</publisher><subject>Atomic ; Atomic/Molecular Structure and Spectra ; Chemical bonds ; Chemical composition ; Chemical vapor deposition ; Chemistry ; Chemistry and Materials Science ; Gas mixtures ; Inorganic Chemistry ; Molecular ; Nanocomposites ; Optical and Plasma Physics ; Optical emission spectroscopy ; Physical Chemistry ; Silicon ; Solid State Physics ; Vapor phases</subject><ispartof>Journal of structural chemistry, 2017, Vol.58 (1), p.119-125</ispartof><rights>Pleiades Publishing, Ltd. 2017</rights><rights>Copyright Springer Science & Business Media 2017</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-54c6cee58b987b12fc136c451ea24dc80635fcd5a752291b724f720597db1e173</citedby><cites>FETCH-LOGICAL-c316t-54c6cee58b987b12fc136c451ea24dc80635fcd5a752291b724f720597db1e173</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1134/S0022476617010188$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1134/S0022476617010188$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>315,781,785,27929,27930,41493,42562,51324</link.rule.ids></links><search><creatorcontrib>Fainer, N. I.</creatorcontrib><creatorcontrib>Plekhanov, A. G.</creatorcontrib><creatorcontrib>Golubenko, A. N.</creatorcontrib><creatorcontrib>Rumyantsev, Yu. M.</creatorcontrib><creatorcontrib>Maksimovskii, E. A.</creatorcontrib><creatorcontrib>Shayapov, V. R.</creatorcontrib><title>Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films</title><title>Journal of structural chemistry</title><addtitle>J Struct Chem</addtitle><description>Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH
3
)
2
)
2
NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O
2
+
x
N
2
), a method is developed to obtain SiC
x
N
y
O
z
:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The
in situ
composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.</description><subject>Atomic</subject><subject>Atomic/Molecular Structure and Spectra</subject><subject>Chemical bonds</subject><subject>Chemical composition</subject><subject>Chemical vapor deposition</subject><subject>Chemistry</subject><subject>Chemistry and Materials Science</subject><subject>Gas mixtures</subject><subject>Inorganic Chemistry</subject><subject>Molecular</subject><subject>Nanocomposites</subject><subject>Optical and Plasma Physics</subject><subject>Optical emission spectroscopy</subject><subject>Physical Chemistry</subject><subject>Silicon</subject><subject>Solid State Physics</subject><subject>Vapor phases</subject><issn>0022-4766</issn><issn>1573-8779</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNp1kE1LxDAURYMoOI7-AHcB19W8tGmapQx-wYCL0a0lTRPJ0CY1ScH597ZUQRBXb3HOvQ8uQpdArgHy4mZHCKUFL0vgBAhU1RFaAeN5VnEujtFqxtnMT9FZjHtCiKhEuUJvuxRGlcagsXQt1p3utUuyw8r3g482We-wNzgF6eIgwwSxk87_YI2j7ayapc-DkqHxzqZgW42N7fp4jk6M7KK--L5r9Hp_97J5zLbPD0-b222mcihTxgpVKq1Z1YiKN0CNgrxUBQMtadGqipQ5M6plkjNKBTScFoZTwgRvG9DA8zW6WnqH4D9GHVO992Nw08t62oLwIhdUTBYslgo-xqBNPQTby3CogdTzjPWfGacMXTJxct27Dr-a_w19AR3Ydcw</recordid><startdate>2017</startdate><enddate>2017</enddate><creator>Fainer, N. I.</creator><creator>Plekhanov, A. G.</creator><creator>Golubenko, A. N.</creator><creator>Rumyantsev, Yu. M.</creator><creator>Maksimovskii, E. A.</creator><creator>Shayapov, V. R.</creator><general>Pleiades Publishing</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2017</creationdate><title>Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films</title><author>Fainer, N. I. ; Plekhanov, A. G. ; Golubenko, A. N. ; Rumyantsev, Yu. M. ; Maksimovskii, E. A. ; Shayapov, V. R.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-54c6cee58b987b12fc136c451ea24dc80635fcd5a752291b724f720597db1e173</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Atomic</topic><topic>Atomic/Molecular Structure and Spectra</topic><topic>Chemical bonds</topic><topic>Chemical composition</topic><topic>Chemical vapor deposition</topic><topic>Chemistry</topic><topic>Chemistry and Materials Science</topic><topic>Gas mixtures</topic><topic>Inorganic Chemistry</topic><topic>Molecular</topic><topic>Nanocomposites</topic><topic>Optical and Plasma Physics</topic><topic>Optical emission spectroscopy</topic><topic>Physical Chemistry</topic><topic>Silicon</topic><topic>Solid State Physics</topic><topic>Vapor phases</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fainer, N. I.</creatorcontrib><creatorcontrib>Plekhanov, A. G.</creatorcontrib><creatorcontrib>Golubenko, A. N.</creatorcontrib><creatorcontrib>Rumyantsev, Yu. M.</creatorcontrib><creatorcontrib>Maksimovskii, E. A.</creatorcontrib><creatorcontrib>Shayapov, V. R.</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of structural chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fainer, N. I.</au><au>Plekhanov, A. G.</au><au>Golubenko, A. N.</au><au>Rumyantsev, Yu. M.</au><au>Maksimovskii, E. A.</au><au>Shayapov, V. R.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films</atitle><jtitle>Journal of structural chemistry</jtitle><stitle>J Struct Chem</stitle><date>2017</date><risdate>2017</risdate><volume>58</volume><issue>1</issue><spage>119</spage><epage>125</epage><pages>119-125</pages><issn>0022-4766</issn><eissn>1573-8779</eissn><abstract>Based on thermodynamic simulation on the deposition of condensed phases with the complex composition in the Si–C–N–O–H system in a wide temperature range, using initial gas mixtures of 1,1,3,3-tetramethyldisilazane (HSi(CH
3
)
2
)
2
NH (TMDS), TMDS with a variable mixture of oxygen and nitrogen (O
2
+
x
N
2
), a method is developed to obtain SiC
x
N
y
O
z
:H nanocomposite films by the plasma chemical decomposition of this gas mixture in the temperature range of 373-973 K. By FTIR and energy dispersive X-ray spectroscopy the structure of chemical bonds and the elemental composition of the obtained silicon oxycarbonitride films are studied. The
in situ
composition of the initial gas phase in PECVD processes is examined by optical emission spectroscopy.</abstract><cop>Moscow</cop><pub>Pleiades Publishing</pub><doi>10.1134/S0022476617010188</doi><tpages>7</tpages></addata></record> |
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| issn | 0022-4766 1573-8779 |
| language | eng |
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| source | SpringerNature Journals |
| subjects | Atomic Atomic/Molecular Structure and Spectra Chemical bonds Chemical composition Chemical vapor deposition Chemistry Chemistry and Materials Science Gas mixtures Inorganic Chemistry Molecular Nanocomposites Optical and Plasma Physics Optical emission spectroscopy Physical Chemistry Silicon Solid State Physics Vapor phases |
| title | Structure and elemental composition of transparent nanocomposite silicon oxycarbonitride films |
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