Further Studies on the Effect of SiNx Refractive Index and Emitter Sheet Resistance on Potential-Induced Degradation
We present the impacts of silicon nitride (SiNx) antireflection coating refractive index and emitter sheet resistance on potential-induced degradation of the shunting type (PID-s). Previously, it has been shown that the cell becomes more PID-s-susceptible as the refractive index decreases or the emi...
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Veröffentlicht in: | IEEE journal of photovoltaics 2017-03, Vol.7 (2), p.437-443 |
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Sprache: | eng |
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