Further Studies on the Effect of SiNx Refractive Index and Emitter Sheet Resistance on Potential-Induced Degradation

We present the impacts of silicon nitride (SiNx) antireflection coating refractive index and emitter sheet resistance on potential-induced degradation of the shunting type (PID-s). Previously, it has been shown that the cell becomes more PID-s-susceptible as the refractive index decreases or the emi...

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Veröffentlicht in:IEEE journal of photovoltaics 2017-03, Vol.7 (2), p.437-443
Hauptverfasser: Jaewon Oh, Dauksher, Bill, Bowden, Stuart, Tamizhmani, Govindasamy, Hacke, Peter, D'Amico, John
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Sprache:eng
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