Six-layer lamination of a new dry film negative-tone photoresist for fabricating complex 3D microfluidic devices
We present a new epoxy-based negative-tone dry film photoresist (DFR) for fabricating multilayer microfluidic devices using a lamination process combined with a standard photolithography technology. As proof-of-concept, a complex 3D-hydrodynamic focusing device was produced via a six-layer laminatio...
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| Veröffentlicht in: | Microfluidics and nanofluidics 2017-03, Vol.21 (3), p.1, Article 41 |
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| container_title | Microfluidics and nanofluidics |
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| creator | El Hasni, Akram Pfirrmann, Stefan Kolander, Anett Yacoub-George, Erwin König, Martin Landesberger, Christof Voigt, Anja Grützner, Gabi Schnakenberg, Uwe |
| description | We present a new epoxy-based negative-tone dry film photoresist (DFR) for fabricating multilayer microfluidic devices using a lamination process combined with a standard photolithography technology. As proof-of-concept, a complex 3D-hydrodynamic focusing device was produced via a six-layer lamination process of 33 µm-thick DFR layers. The bonding strength of the new DFR was tested on silicon, glass, and titanium substrates, respectively. A maximum bonding strength of 37 MPa was obtained for the dry film photoresist laminated on glass. No leakage was found, and burst tests proved excellent robustness and sealing reliability of the microchannels. |
| doi_str_mv | 10.1007/s10404-017-1877-8 |
| format | Article |
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| subjects | Analytical Chemistry Biomedical Engineering and Bioengineering Engineering Engineering Fluid Dynamics Nanotechnology and Microengineering Research Paper |
| title | Six-layer lamination of a new dry film negative-tone photoresist for fabricating complex 3D microfluidic devices |
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