Cryogenic Characterization of FBK HD Near-UV Sensitive SiPMs

We report on the characterization of near-ultraviolet high-density silicon photomultiplier (SiPM) developed at Fondazione Bruno Kessler (FBK) at cryogenic temperature. A dedicated setup was built to measure the primary dark noise and correlated noise of the SiPMs between 40 and 300 K. Moreover, an a...

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Veröffentlicht in:IEEE transactions on electron devices 2017-02, Vol.64 (2), p.521-526
Hauptverfasser: Acerbi, Fabio, Davini, Stefano, Ferri, Alessandro, Galbiati, Cristiano, Giovanetti, Graham, Gola, Alberto, Korga, George, Mandarano, Andrea, Marcante, Marco, Paternoster, Giovanni, Piemonte, Claudio, Razeto, Alessandro, Regazzoni, Veronica, Sablone, Davide, Savarese, Claudio, Zappala, Gaetano, Zorzi, Nicola
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Sprache:eng
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