Applications for Surface Engineering Using Atomic Layer Etching - Invited Paper

Over the course of the past few years, the semiconductor industry has continued to invent and innovate profoundly to adhere to Moore’s Law and Dennard scaling. At each of the technology nodes starting with 45nm, new materials and integration techniques, such as high-K & metal gates, double patte...

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Veröffentlicht in:	Solid state phenomena 2016-09, Vol.255, p.41-48
Hauptverfasser:	Marchack, Nathan, Joseph, Eric A., Papalia, John, Engelmann, Sebastian, Bruce, Robert, Miyazoe, Hiroyuki
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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