Preparation and Properties of TiO2/SiO2 Thin Films on Enamel Substrates
nanosize TiO2/SiO2 thin films were deposited by sol-gel dip-coating method on enamel substrates. Crystal structure, micro-structure, hydrophilic property, gloss property was investigated by X-ray diffract meter, scanning electron microscope, CCD camera, enamel gloss meter. The results show that the...
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Veröffentlicht in: | Materials science forum 2016-03, Vol.848, p.717-721 |
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description | nanosize TiO2/SiO2 thin films were deposited by sol-gel dip-coating method on enamel substrates. Crystal structure, micro-structure, hydrophilic property, gloss property was investigated by X-ray diffract meter, scanning electron microscope, CCD camera, enamel gloss meter. The results show that the hydrophilic property of the enamel was greatly increased by heating the enamel with coating TiO2/SiO2 film; the gloss property of the enamel surface greatly increased after the enamel coated with TiO2/SiO2 film. The main crystals in TiO2/SiO2 film on the enamel were anatase when the baking temperature was below the 700°C. |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1790013154</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>4061940801</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2107-86ea143f3e4b61396f947a0d548cde6a07d5db4f4a33e536f9f827c288fff6a43</originalsourceid><addsrcrecordid>eNqNkE9LAzEQxYMoWKvfISB4223-J3sRpdgqVFpoPYd0N6EpbXZNthS_vSkV9OhlBmbevMf8AHjAqGSIqNHxeCxT7W3ovfN1GWw_el9OSsVUKbG8AAMsBCkqycklGCDCecGZFNfgJqUtQhQrLAZguoi2M9H0vg3QhAYuYtvZ2HubYOvgys_JaJkLXG18gBO_2-d5gC_B7O0OLg_r1Odjm27BlTO7ZO9--hB8TF5W49diNp--jZ9nRU0wkoUS1mBGHbVsLTCthKuYNKjhTNWNFQbJhjdr5pih1HKa104RWROlnHPCMDoE92ffLrafB5t6vW0PMeRIjWWFEKaYn1SPZ1Ud25SidbqLfm_il8ZIn-DpDE__wtMZns7wdIanM7xs8HQ2yN-F1Nt68yfnfxbfOMt_8g</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1790013154</pqid></control><display><type>article</type><title>Preparation and Properties of TiO2/SiO2 Thin Films on Enamel Substrates</title><source>ProQuest Central Essentials</source><source>ProQuest Central (Alumni Edition)</source><source>ProQuest Central Student</source><source>Scientific.net Journals</source><creator>Chen, Li Yun ; Jiang, Wei Zhong ; Liu, Ai Li ; Liao, Xiao Ping ; Ye, Jia Yi ; Jin, Hui Le</creator><creatorcontrib>Chen, Li Yun ; Jiang, Wei Zhong ; Liu, Ai Li ; Liao, Xiao Ping ; Ye, Jia Yi ; Jin, Hui Le</creatorcontrib><description>nanosize TiO2/SiO2 thin films were deposited by sol-gel dip-coating method on enamel substrates. Crystal structure, micro-structure, hydrophilic property, gloss property was investigated by X-ray diffract meter, scanning electron microscope, CCD camera, enamel gloss meter. The results show that the hydrophilic property of the enamel was greatly increased by heating the enamel with coating TiO2/SiO2 film; the gloss property of the enamel surface greatly increased after the enamel coated with TiO2/SiO2 film. The main crystals in TiO2/SiO2 film on the enamel were anatase when the baking temperature was below the 700°C.</description><identifier>ISSN: 0255-5476</identifier><identifier>ISSN: 1662-9752</identifier><identifier>EISSN: 1662-9752</identifier><identifier>DOI: 10.4028/www.scientific.net/MSF.848.717</identifier><language>eng</language><publisher>Pfaffikon: Trans Tech Publications Ltd</publisher><ispartof>Materials science forum, 2016-03, Vol.848, p.717-721</ispartof><rights>2016 Trans Tech Publications Ltd</rights><rights>Copyright Trans Tech Publications Ltd. Mar 2016</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttps://www.scientific.net/Image/TitleCover/4326?width=600</thumbnail><linktohtml>$$Uhttps://www.proquest.com/docview/1790013154?pq-origsite=primo$$EHTML$$P50$$Gproquest$$H</linktohtml><link.rule.ids>314,780,784,21387,21388,23254,27922,27923,33528,33701,34312,43657,43785,44065</link.rule.ids></links><search><creatorcontrib>Chen, Li Yun</creatorcontrib><creatorcontrib>Jiang, Wei Zhong</creatorcontrib><creatorcontrib>Liu, Ai Li</creatorcontrib><creatorcontrib>Liao, Xiao Ping</creatorcontrib><creatorcontrib>Ye, Jia Yi</creatorcontrib><creatorcontrib>Jin, Hui Le</creatorcontrib><title>Preparation and Properties of TiO2/SiO2 Thin Films on Enamel Substrates</title><title>Materials science forum</title><description>nanosize TiO2/SiO2 thin films were deposited by sol-gel dip-coating method on enamel substrates. Crystal structure, micro-structure, hydrophilic property, gloss property was investigated by X-ray diffract meter, scanning electron microscope, CCD camera, enamel gloss meter. The results show that the hydrophilic property of the enamel was greatly increased by heating the enamel with coating TiO2/SiO2 film; the gloss property of the enamel surface greatly increased after the enamel coated with TiO2/SiO2 film. The main crystals in TiO2/SiO2 film on the enamel were anatase when the baking temperature was below the 700°C.</description><issn>0255-5476</issn><issn>1662-9752</issn><issn>1662-9752</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GNUQQ</sourceid><recordid>eNqNkE9LAzEQxYMoWKvfISB4223-J3sRpdgqVFpoPYd0N6EpbXZNthS_vSkV9OhlBmbevMf8AHjAqGSIqNHxeCxT7W3ovfN1GWw_el9OSsVUKbG8AAMsBCkqycklGCDCecGZFNfgJqUtQhQrLAZguoi2M9H0vg3QhAYuYtvZ2HubYOvgys_JaJkLXG18gBO_2-d5gC_B7O0OLg_r1Odjm27BlTO7ZO9--hB8TF5W49diNp--jZ9nRU0wkoUS1mBGHbVsLTCthKuYNKjhTNWNFQbJhjdr5pih1HKa104RWROlnHPCMDoE92ffLrafB5t6vW0PMeRIjWWFEKaYn1SPZ1Ud25SidbqLfm_il8ZIn-DpDE__wtMZns7wdIanM7xs8HQ2yN-F1Nt68yfnfxbfOMt_8g</recordid><startdate>20160301</startdate><enddate>20160301</enddate><creator>Chen, Li Yun</creator><creator>Jiang, Wei Zhong</creator><creator>Liu, Ai Li</creator><creator>Liao, Xiao Ping</creator><creator>Ye, Jia Yi</creator><creator>Jin, Hui Le</creator><general>Trans Tech Publications Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7SR</scope><scope>7XB</scope><scope>88I</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>M2P</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>Q9U</scope></search><sort><creationdate>20160301</creationdate><title>Preparation and Properties of TiO2/SiO2 Thin Films on Enamel Substrates</title><author>Chen, Li Yun ; Jiang, Wei Zhong ; Liu, Ai Li ; Liao, Xiao Ping ; Ye, Jia Yi ; Jin, Hui Le</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2107-86ea143f3e4b61396f947a0d548cde6a07d5db4f4a33e536f9f827c288fff6a43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chen, Li Yun</creatorcontrib><creatorcontrib>Jiang, Wei Zhong</creatorcontrib><creatorcontrib>Liu, Ai Li</creatorcontrib><creatorcontrib>Liao, Xiao Ping</creatorcontrib><creatorcontrib>Ye, Jia Yi</creatorcontrib><creatorcontrib>Jin, Hui Le</creatorcontrib><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>Engineered Materials Abstracts</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>Science Database (Alumni Edition)</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ProQuest Central Student</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Science Database</collection><collection>Materials Science Collection</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>ProQuest Central Basic</collection><jtitle>Materials science forum</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chen, Li Yun</au><au>Jiang, Wei Zhong</au><au>Liu, Ai Li</au><au>Liao, Xiao Ping</au><au>Ye, Jia Yi</au><au>Jin, Hui Le</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Preparation and Properties of TiO2/SiO2 Thin Films on Enamel Substrates</atitle><jtitle>Materials science forum</jtitle><date>2016-03-01</date><risdate>2016</risdate><volume>848</volume><spage>717</spage><epage>721</epage><pages>717-721</pages><issn>0255-5476</issn><issn>1662-9752</issn><eissn>1662-9752</eissn><abstract>nanosize TiO2/SiO2 thin films were deposited by sol-gel dip-coating method on enamel substrates. Crystal structure, micro-structure, hydrophilic property, gloss property was investigated by X-ray diffract meter, scanning electron microscope, CCD camera, enamel gloss meter. The results show that the hydrophilic property of the enamel was greatly increased by heating the enamel with coating TiO2/SiO2 film; the gloss property of the enamel surface greatly increased after the enamel coated with TiO2/SiO2 film. The main crystals in TiO2/SiO2 film on the enamel were anatase when the baking temperature was below the 700°C.</abstract><cop>Pfaffikon</cop><pub>Trans Tech Publications Ltd</pub><doi>10.4028/www.scientific.net/MSF.848.717</doi><tpages>5</tpages></addata></record> |
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title | Preparation and Properties of TiO2/SiO2 Thin Films on Enamel Substrates |
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