Electrical investigation of TiO2 thin films coated on glass and silicon substrates—effect of UV and visible light illumination
The conducting nature of nanocrystalline TiO 2 thin film coated on glass and silicon (Si) substrates was studied in detail. The films were prepared through sol–gel spin-coating method with variation in coating parameters viz, the thickness of the film and the post annealing temperature. The thicknes...
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| Veröffentlicht in: | Applied nanoscience 2016-04, Vol.6 (4), p.591-598 |
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| container_title | Applied nanoscience |
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| creator | Amirtharajan, Saranya Jeyaprakash, Pandiarajan Natarajan, Jeyakumaran Natarajan, Prithivikumaran |
| description | The conducting nature of nanocrystalline TiO
2
thin film coated on glass and silicon (Si) substrates was studied in detail. The films were prepared through sol–gel spin-coating method with variation in coating parameters viz, the thickness of the film and the post annealing temperature. The thickness of the films was measured using Stylus profilometer. The resistivity of the film, as a function of film thickness, under the illumination of UV, visible light, and dark conditions was found using the four-probe method. The results show that the resistivity of the film decreases with increase in thickness of the film. The decrease in resistivity of the film is attributed to increase in cross-sectional area and rearrangement and removal of defects. Illumination of the samples under visible and UV light further decreases the resistivity of the film. The electrical resistivity of TiO
2
film coated on Si substrate was observed to be lesser than that of the glass substrate. |
| doi_str_mv | 10.1007/s13204-015-0464-0 |
| format | Article |
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2
thin film coated on glass and silicon (Si) substrates was studied in detail. The films were prepared through sol–gel spin-coating method with variation in coating parameters viz, the thickness of the film and the post annealing temperature. The thickness of the films was measured using Stylus profilometer. The resistivity of the film, as a function of film thickness, under the illumination of UV, visible light, and dark conditions was found using the four-probe method. The results show that the resistivity of the film decreases with increase in thickness of the film. The decrease in resistivity of the film is attributed to increase in cross-sectional area and rearrangement and removal of defects. Illumination of the samples under visible and UV light further decreases the resistivity of the film. The electrical resistivity of TiO
2
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2
thin film coated on glass and silicon (Si) substrates was studied in detail. The films were prepared through sol–gel spin-coating method with variation in coating parameters viz, the thickness of the film and the post annealing temperature. The thickness of the films was measured using Stylus profilometer. The resistivity of the film, as a function of film thickness, under the illumination of UV, visible light, and dark conditions was found using the four-probe method. The results show that the resistivity of the film decreases with increase in thickness of the film. The decrease in resistivity of the film is attributed to increase in cross-sectional area and rearrangement and removal of defects. Illumination of the samples under visible and UV light further decreases the resistivity of the film. The electrical resistivity of TiO
2
film coated on Si substrate was observed to be lesser than that of the glass substrate.</description><subject>Chemistry and Materials Science</subject><subject>Materials Science</subject><subject>Membrane Biology</subject><subject>Nanochemistry</subject><subject>Nanotechnology</subject><subject>Nanotechnology and Microengineering</subject><subject>Original Article</subject><issn>2190-5509</issn><issn>2190-5517</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><sourceid>C6C</sourceid><sourceid>AFKRA</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNp1UM1KAzEQDqJgqX0AbwHPq8kmaTZHKfUHCr20XkM2m2xT0t2a7Ba89SF8Qp_EtCvixbnMMPP9MB8AtxjdY4T4Q8QkRzRDmGWITtNwAUY5FihjDPPL3xmJazCJcYtSMcqnhI3Ace6N7oLTykPXHEzsXK061zawtXDlljnsNq6B1vldhLpVnalgOtZexQhVU8HovNNpE_sydiHd49fx01ibVE8S67cz6uCiK72B3tWbDjrv-51rzj434MoqH83kp4_B-mm-mr1ki-Xz6-xxkWnCRJdVZcWY5UIgo6wSlaFKYyoKQXNCsOBFZQhliuqy5FoRIghXRcExMaqidGrIGNwNuvvQvvfpT7lt-9AkS4k5p7ngTOQJhQeUDm2MwVi5D26nwofESJ6ylkPWMmUtT1lLlDj5wIkJ29Qm_FH-l_QN5JOD2g</recordid><startdate>20160401</startdate><enddate>20160401</enddate><creator>Amirtharajan, Saranya</creator><creator>Jeyaprakash, Pandiarajan</creator><creator>Natarajan, Jeyakumaran</creator><creator>Natarajan, Prithivikumaran</creator><general>Springer Berlin Heidelberg</general><general>Springer Nature B.V</general><scope>C6C</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>AFKRA</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>L6V</scope><scope>M7S</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope></search><sort><creationdate>20160401</creationdate><title>Electrical investigation of TiO2 thin films coated on glass and silicon substrates—effect of UV and visible light illumination</title><author>Amirtharajan, Saranya ; Jeyaprakash, Pandiarajan ; Natarajan, Jeyakumaran ; Natarajan, Prithivikumaran</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c359t-dbd55f7990eafa9de4ac1498942331978de345a4cbb7ca33937a88713ead446e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2016</creationdate><topic>Chemistry and Materials Science</topic><topic>Materials Science</topic><topic>Membrane Biology</topic><topic>Nanochemistry</topic><topic>Nanotechnology</topic><topic>Nanotechnology and Microengineering</topic><topic>Original Article</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Amirtharajan, Saranya</creatorcontrib><creatorcontrib>Jeyaprakash, Pandiarajan</creatorcontrib><creatorcontrib>Natarajan, Jeyakumaran</creatorcontrib><creatorcontrib>Natarajan, Prithivikumaran</creatorcontrib><collection>Springer Nature OA/Free Journals</collection><collection>CrossRef</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>ProQuest Engineering Collection</collection><collection>Engineering Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering Collection</collection><jtitle>Applied nanoscience</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Amirtharajan, Saranya</au><au>Jeyaprakash, Pandiarajan</au><au>Natarajan, Jeyakumaran</au><au>Natarajan, Prithivikumaran</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrical investigation of TiO2 thin films coated on glass and silicon substrates—effect of UV and visible light illumination</atitle><jtitle>Applied nanoscience</jtitle><stitle>Appl Nanosci</stitle><date>2016-04-01</date><risdate>2016</risdate><volume>6</volume><issue>4</issue><spage>591</spage><epage>598</epage><pages>591-598</pages><issn>2190-5509</issn><eissn>2190-5517</eissn><abstract>The conducting nature of nanocrystalline TiO
2
thin film coated on glass and silicon (Si) substrates was studied in detail. The films were prepared through sol–gel spin-coating method with variation in coating parameters viz, the thickness of the film and the post annealing temperature. The thickness of the films was measured using Stylus profilometer. The resistivity of the film, as a function of film thickness, under the illumination of UV, visible light, and dark conditions was found using the four-probe method. The results show that the resistivity of the film decreases with increase in thickness of the film. The decrease in resistivity of the film is attributed to increase in cross-sectional area and rearrangement and removal of defects. Illumination of the samples under visible and UV light further decreases the resistivity of the film. The electrical resistivity of TiO
2
film coated on Si substrate was observed to be lesser than that of the glass substrate.</abstract><cop>Berlin/Heidelberg</cop><pub>Springer Berlin Heidelberg</pub><doi>10.1007/s13204-015-0464-0</doi><tpages>8</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | Chemistry and Materials Science Materials Science Membrane Biology Nanochemistry Nanotechnology Nanotechnology and Microengineering Original Article |
| title | Electrical investigation of TiO2 thin films coated on glass and silicon substrates—effect of UV and visible light illumination |
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