In Situ Microfabrication and Measurements of Bi2Se3 Ultrathin Films in a Multichamber System with a Focused Ion Beam, Molecular Beam Epitaxy, and Four-Tip Scanning Tunneling Microscope

Ultrathin films of Bi2Se3 grown on Si(111) substrate were etched into submicron-width wires by using a focused ion beam (FIB), and their electrical resistance was measured using the four-probe method with a four-tip scanning tunneling microscope. All of the procedures were performed in situ in ultra...

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Veröffentlicht in:	E-journal of surface science and nanotechnology 2014/10/11, Vol.12, pp.423-430
Hauptverfasser:	Fukui, Naoya, Hobara, Rei, Hirahara, Toru, Hasegawa, Shuji, Miyatake, Yutaka, Mizuno, Hiroyuki, Sasaki, Toru, Nagamura, Toshihiko
Format:	Artikel
Sprache:	eng
Schlagworte:	Electrical transport measurements Focused ion beam Ion etching Multiprobe method Scanning Tunneling Microscopy
Online-Zugang:	Volltext
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