Conductive ZnO:Zn Composites for High-Rate Sputtering Deposition of ZnO Thin Films
We report an electrically conductive composite prepared by sintering ZnO and metallic Zn powders. Microstructure analysis combined with electrical conductivity studies indicated that when the proportion of metallic Zn reached a threshold (∼20 wt.%), a metal matrix was formed in accordance with perco...
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| Veröffentlicht in: | Journal of electronic materials 2015-02, Vol.44 (2), p.682-687 |
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| container_title | Journal of electronic materials |
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| creator | Zhou, Li Qin Dubey, Mukul Simões, Raul Fan, Qi Hua Neto, Victor |
| description | We report an electrically conductive composite prepared by sintering ZnO and metallic Zn powders. Microstructure analysis combined with electrical conductivity studies indicated that when the proportion of metallic Zn reached a threshold (∼20 wt.%), a metal matrix was formed in accordance with percolation theory. This composite has potential as a sputtering target for deposition of high-quality ZnO. Use of the ZnO:Zn composite completely eliminates target poisoning effects in reactive sputtering of the metal, and enables deposition of thin ZnO films at rates much higher than those obtained by sputtering of pure ZnO ceramic targets. The optical transmittance of the ZnO films prepared by use of this composite is comparable with that of films produced by radio frequency sputtering of pure ZnO ceramic targets. The sputtering characteristics of the conductive ZnO:Zn composite target are reported, and possible mechanisms of the high rate of deposition are also discussed. |
| doi_str_mv | 10.1007/s11664-014-3529-z |
| format | Article |
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Microstructure analysis combined with electrical conductivity studies indicated that when the proportion of metallic Zn reached a threshold (∼20 wt.%), a metal matrix was formed in accordance with percolation theory. This composite has potential as a sputtering target for deposition of high-quality ZnO. Use of the ZnO:Zn composite completely eliminates target poisoning effects in reactive sputtering of the metal, and enables deposition of thin ZnO films at rates much higher than those obtained by sputtering of pure ZnO ceramic targets. The optical transmittance of the ZnO films prepared by use of this composite is comparable with that of films produced by radio frequency sputtering of pure ZnO ceramic targets. The sputtering characteristics of the conductive ZnO:Zn composite target are reported, and possible mechanisms of the high rate of deposition are also discussed.</description><identifier>ISSN: 0361-5235</identifier><identifier>EISSN: 1543-186X</identifier><identifier>DOI: 10.1007/s11664-014-3529-z</identifier><identifier>CODEN: JECMA5</identifier><language>eng</language><publisher>Boston: Springer US</publisher><subject>Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Composite materials ; Electric currents ; Electronics and Microelectronics ; Instrumentation ; Materials Science ; Optical and Electronic Materials ; Sintering ; Solid State Physics ; Thin films</subject><ispartof>Journal of electronic materials, 2015-02, Vol.44 (2), p.682-687</ispartof><rights>The Minerals, Metals & Materials Society 2014</rights><rights>The Minerals, Metals & Materials Society 2015</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c386t-f33834ac2e663b55da52ec4305f8b998c29d5dc242998e0631ad048dffa468343</citedby><cites>FETCH-LOGICAL-c386t-f33834ac2e663b55da52ec4305f8b998c29d5dc242998e0631ad048dffa468343</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s11664-014-3529-z$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s11664-014-3529-z$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,41488,42557,51319</link.rule.ids></links><search><creatorcontrib>Zhou, Li Qin</creatorcontrib><creatorcontrib>Dubey, Mukul</creatorcontrib><creatorcontrib>Simões, Raul</creatorcontrib><creatorcontrib>Fan, Qi Hua</creatorcontrib><creatorcontrib>Neto, Victor</creatorcontrib><title>Conductive ZnO:Zn Composites for High-Rate Sputtering Deposition of ZnO Thin Films</title><title>Journal of electronic materials</title><addtitle>Journal of Elec Materi</addtitle><description>We report an electrically conductive composite prepared by sintering ZnO and metallic Zn powders. 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The sputtering characteristics of the conductive ZnO:Zn composite target are reported, and possible mechanisms of the high rate of deposition are also discussed.</description><subject>Characterization and Evaluation of Materials</subject><subject>Chemistry and Materials Science</subject><subject>Composite materials</subject><subject>Electric currents</subject><subject>Electronics and Microelectronics</subject><subject>Instrumentation</subject><subject>Materials Science</subject><subject>Optical and Electronic Materials</subject><subject>Sintering</subject><subject>Solid State Physics</subject><subject>Thin films</subject><issn>0361-5235</issn><issn>1543-186X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><sourceid>8G5</sourceid><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GNUQQ</sourceid><sourceid>GUQSH</sourceid><sourceid>M2O</sourceid><recordid>eNp1kM1KAzEURoMoWKsP4C7gOpp_M-5ktFYQCrWCdBOmM0mb0iZjMiPYp3fGceHG1eXCd77LPQBcEnxNML69SYRIyREmHDFBM3Q4AiMiOENEyfdjMMJMEiQoE6fgLKUtxkQQRUZgngdftWXjPg1c-tnd0sM87OuQXGMStCHCqVtv0LxoDHyt26Yx0fk1fDA_ERc8DLYH4WLjPJy43T6dgxNb7JK5-J1j8DZ5XORT9DJ7es7vX1DJlGyQZUwxXpTUSMlWQlSFoKbkDAurVlmmSppVoiopp91isGSkqDBXlbUFlx3JxuBq6K1j-GhNavQ2tNF3JzWRnDFJlWBdigypMoaUorG6jm5fxC9NsO7V6UGd7tTpXp0-dAwdmFT335r4p_lf6Bt1tHDh</recordid><startdate>20150201</startdate><enddate>20150201</enddate><creator>Zhou, Li Qin</creator><creator>Dubey, Mukul</creator><creator>Simões, Raul</creator><creator>Fan, Qi Hua</creator><creator>Neto, Victor</creator><general>Springer US</general><general>Springer Nature B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7XB</scope><scope>88I</scope><scope>8AF</scope><scope>8AO</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8G5</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>GUQSH</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M2O</scope><scope>M2P</scope><scope>M7S</scope><scope>MBDVC</scope><scope>P5Z</scope><scope>P62</scope><scope>PDBOC</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>Q9U</scope><scope>S0X</scope></search><sort><creationdate>20150201</creationdate><title>Conductive ZnO:Zn Composites for High-Rate Sputtering Deposition of ZnO Thin Films</title><author>Zhou, Li Qin ; 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| subjects | Characterization and Evaluation of Materials Chemistry and Materials Science Composite materials Electric currents Electronics and Microelectronics Instrumentation Materials Science Optical and Electronic Materials Sintering Solid State Physics Thin films |
| title | Conductive ZnO:Zn Composites for High-Rate Sputtering Deposition of ZnO Thin Films |
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