Fabrication of 3 THz Quasi-Optical NbN Hot Electron Bolometer Mixers
Hot electron bolometer mixers (HEBM) are expected to be used as low-noise heterodyne mixers in the terahertz frequency range. We are developing quasi-optical HEBMs for applications such as atmospheric remote sensing and radio astronomy in the terahertz frequency range. Therefore, we developed a fabr...
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Veröffentlicht in: | TEION KOGAKU (Journal of Cryogenics and Superconductivity Society of Japan) 2014/08/25, Vol.49(8), pp.433-438 |
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container_title | TEION KOGAKU (Journal of Cryogenics and Superconductivity Society of Japan) |
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creator | KAWAKAMI, Akira IRIMAJIRI, Yoshihisa TANAKA, Shukichi OCHIAI, Satoshi HOSAKO, Iwao |
description | Hot electron bolometer mixers (HEBM) are expected to be used as low-noise heterodyne mixers in the terahertz frequency range. We are developing quasi-optical HEBMs for applications such as atmospheric remote sensing and radio astronomy in the terahertz frequency range. Therefore, we developed a fabrication method using niobium nitride (NbN) ultrathin films deposited on a silicone (Si) substrate for terahertz applications. First, a magnesium oxide buffer layer 50 nm thick was deposited on a Si substrate at approximately 525 °C. After deposition of this layer, NbN ultrathin films were deposited at ambient temperature. Using the buffer layers, we found the transition temperature of the 3.5-nm-thick NbN thin films to be approximately 10 K. The same method was applied to fabricate NbN-HEBMs on a Si substrate. The fabricated quasi-optical mixers were designed to operate at 3.1 THz. The receiver noise temperature was found to be approximately 1930 K (DSB) at 3.1 THz. |
doi_str_mv | 10.2221/jcsj.49.433 |
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We are developing quasi-optical HEBMs for applications such as atmospheric remote sensing and radio astronomy in the terahertz frequency range. Therefore, we developed a fabrication method using niobium nitride (NbN) ultrathin films deposited on a silicone (Si) substrate for terahertz applications. First, a magnesium oxide buffer layer 50 nm thick was deposited on a Si substrate at approximately 525 °C. After deposition of this layer, NbN ultrathin films were deposited at ambient temperature. Using the buffer layers, we found the transition temperature of the 3.5-nm-thick NbN thin films to be approximately 10 K. The same method was applied to fabricate NbN-HEBMs on a Si substrate. The fabricated quasi-optical mixers were designed to operate at 3.1 THz. 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The receiver noise temperature was found to be approximately 1930 K (DSB) at 3.1 THz.</description><subject>HEBM</subject><subject>MgO buffer</subject><subject>NbN</subject><subject>QCL</subject><subject>Si substrate</subject><issn>0389-2441</issn><issn>1880-0408</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNo90MFKAzEQBuAgChbtyRcIeJStk810m70IWlsr1BahnkM2O6u7bJuabEF9elNaesphvsnP_IzdCBikaSruGxuaAeYDlPKM9YRSkACCOmc9kCpPUkRxyfoh1AUA5JkYZmmPPU9N4WtrutptuKu45KvZH3_fmVAny20XJy1fFAs-cx2ftGQ7H92Ta92aOvL8rf4hH67ZRWXaQP3je8U-ppPVeJbMly-v48d5YmOYTDISViKNUKnS5MKUQyyhQkADxQilAAUlQW6jHZmixKyyCGRIpCgKNRTyit0e_t16972j0OnG7fwmRuoYkOUC4qVR3R2U9S4ET5Xe-npt_K8WoPdN6X1TGnMdm4r64aCb0JlPOlnj4_Etnaw6LpwG9st4TRv5DwIOcIA</recordid><startdate>20140825</startdate><enddate>20140825</enddate><creator>KAWAKAMI, Akira</creator><creator>IRIMAJIRI, Yoshihisa</creator><creator>TANAKA, Shukichi</creator><creator>OCHIAI, Satoshi</creator><creator>HOSAKO, Iwao</creator><general>CRYOGENICS AND SUPERCONDUCTIVITY SOCIETY OF JAPAN</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>20140825</creationdate><title>Fabrication of 3 THz Quasi-Optical NbN Hot Electron Bolometer Mixers</title><author>KAWAKAMI, Akira ; IRIMAJIRI, Yoshihisa ; TANAKA, Shukichi ; OCHIAI, Satoshi ; HOSAKO, Iwao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c1563-6e1c34e7488da91ad54d0f404a0b7431080de09c5637abd46fc40eae1241b8513</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>HEBM</topic><topic>MgO buffer</topic><topic>NbN</topic><topic>QCL</topic><topic>Si substrate</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>KAWAKAMI, Akira</creatorcontrib><creatorcontrib>IRIMAJIRI, Yoshihisa</creatorcontrib><creatorcontrib>TANAKA, Shukichi</creatorcontrib><creatorcontrib>OCHIAI, Satoshi</creatorcontrib><creatorcontrib>HOSAKO, Iwao</creatorcontrib><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>TEION KOGAKU (Journal of Cryogenics and Superconductivity Society of Japan)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>KAWAKAMI, Akira</au><au>IRIMAJIRI, Yoshihisa</au><au>TANAKA, Shukichi</au><au>OCHIAI, Satoshi</au><au>HOSAKO, Iwao</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of 3 THz Quasi-Optical NbN Hot Electron Bolometer Mixers</atitle><jtitle>TEION KOGAKU (Journal of Cryogenics and Superconductivity Society of Japan)</jtitle><addtitle>TEION KOGAKU</addtitle><date>2014-08-25</date><risdate>2014</risdate><volume>49</volume><issue>8</issue><spage>433</spage><epage>438</epage><pages>433-438</pages><issn>0389-2441</issn><eissn>1880-0408</eissn><abstract>Hot electron bolometer mixers (HEBM) are expected to be used as low-noise heterodyne mixers in the terahertz frequency range. We are developing quasi-optical HEBMs for applications such as atmospheric remote sensing and radio astronomy in the terahertz frequency range. Therefore, we developed a fabrication method using niobium nitride (NbN) ultrathin films deposited on a silicone (Si) substrate for terahertz applications. First, a magnesium oxide buffer layer 50 nm thick was deposited on a Si substrate at approximately 525 °C. After deposition of this layer, NbN ultrathin films were deposited at ambient temperature. Using the buffer layers, we found the transition temperature of the 3.5-nm-thick NbN thin films to be approximately 10 K. The same method was applied to fabricate NbN-HEBMs on a Si substrate. The fabricated quasi-optical mixers were designed to operate at 3.1 THz. 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language | eng |
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source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals |
subjects | HEBM MgO buffer NbN QCL Si substrate |
title | Fabrication of 3 THz Quasi-Optical NbN Hot Electron Bolometer Mixers |
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