Disruptive bubble behaviour leading to microstructure damage in an ultrasonic field
Bubble oscillations play a crucial role in ultrasonic cleaning, a process by which micro- and nanoscale contaminant particles are removed from solid surfaces, such as semiconductor wafers, photomasks and membranes. Although it is well known that the ultrasonic cleaning may damage the functional patt...
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Veröffentlicht in: | Journal of fluid mechanics 2014-07, Vol.750, p.355-371 |
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Format: | Artikel |
Sprache: | eng |
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