Nanoimprinted Tio2 sol-gel passivating diffraction gratings for solar cell applications
ABSTRACT We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25 cm2. Minority carrier lifetimes of up to 900 µs for imprinted samples under il...
Gespeichert in:
| Veröffentlicht in: | Progress in photovoltaics 2012-03, Vol.20 (2), p.143-148 |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 148 |
|---|---|
| container_issue | 2 |
| container_start_page | 143 |
| container_title | Progress in photovoltaics |
| container_volume | 20 |
| creator | Barbé, Jérémy Thomson, Andrew Francis Wang, Er-Chien McIntosh, Keith Catchpole, Kylie |
| description | ABSTRACT
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25 cm2. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells. Copyright © 2011 John Wiley & Sons, Ltd.
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells. |
| doi_str_mv | 10.1002/pip.1131 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_pasca</sourceid><recordid>TN_cdi_proquest_journals_1497000178</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3214978931</sourcerecordid><originalsourceid>FETCH-LOGICAL-g3261-d773c811da419a33f38102a23e0284a370a2266a54fef8ed667245024781d6423</originalsourceid><addsrcrecordid>eNpF0F1LwzAUBuAiCs4p-BMC4mVnvpo0l1J0DrY5cDLvwqFNS2bX1qRT9-9ttzGvTsh5SHjfILgleEQwpg-NbUaEMHIWDAhWKiSR-jjvz4KGUqnoMrjyfo0xkbESg2A1h6q2m8bZqjUZWtqaIl-XYWFK1ID39htaWxUos3nuIG1tXaHC7e88ymvXY3AoNWWJoGlKm0Jv_HVwkUPpzc1xDoP356dl8hJOX8eT5HEaFowKEmZSsjQmJANOFDCWs5hgCpQZTGMOTGKgVAiIeG7y2GRCSMojTLmMSSY4ZcPg7vBu4-qvrfGtXtdbV3VfasKVxPugnbo_KvAplF2SKrVed6k34HaaRlzFKmadCw_ux5Zmd9oTrPtuddet7rvVi8min__e-tb8njy4Ty0kk5Fezcd6xhf4LZolOmF_8tF72Q</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1497000178</pqid></control><display><type>article</type><title>Nanoimprinted Tio2 sol-gel passivating diffraction gratings for solar cell applications</title><source>Wiley Online Library All Journals</source><creator>Barbé, Jérémy ; Thomson, Andrew Francis ; Wang, Er-Chien ; McIntosh, Keith ; Catchpole, Kylie</creator><creatorcontrib>Barbé, Jérémy ; Thomson, Andrew Francis ; Wang, Er-Chien ; McIntosh, Keith ; Catchpole, Kylie</creatorcontrib><description>ABSTRACT
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25 cm2. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells. Copyright © 2011 John Wiley & Sons, Ltd.
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells.</description><identifier>ISSN: 1062-7995</identifier><identifier>EISSN: 1099-159X</identifier><identifier>DOI: 10.1002/pip.1131</identifier><identifier>CODEN: PPHOED</identifier><language>eng</language><publisher>Chichester, UK: John Wiley & Sons, Ltd</publisher><subject>Applied sciences ; diffraction grating ; Energy ; Exact sciences and technology ; nanoimprint ; Natural energy ; passivation ; Photovoltaic conversion ; solar cells ; Solar cells. Photoelectrochemical cells ; Solar energy ; TiO2 sol-gel ; transient photoconductance decay</subject><ispartof>Progress in photovoltaics, 2012-03, Vol.20 (2), p.143-148</ispartof><rights>Copyright © 2011 John Wiley & Sons, Ltd.</rights><rights>2015 INIST-CNRS</rights><rights>Copyright © 20112 John Wiley & Sons, Ltd.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fpip.1131$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fpip.1131$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1416,27923,27924,45573,45574</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=25498983$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Barbé, Jérémy</creatorcontrib><creatorcontrib>Thomson, Andrew Francis</creatorcontrib><creatorcontrib>Wang, Er-Chien</creatorcontrib><creatorcontrib>McIntosh, Keith</creatorcontrib><creatorcontrib>Catchpole, Kylie</creatorcontrib><title>Nanoimprinted Tio2 sol-gel passivating diffraction gratings for solar cell applications</title><title>Progress in photovoltaics</title><addtitle>Prog. Photovolt: Res. Appl</addtitle><description>ABSTRACT
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25 cm2. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells. Copyright © 2011 John Wiley & Sons, Ltd.
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells.</description><subject>Applied sciences</subject><subject>diffraction grating</subject><subject>Energy</subject><subject>Exact sciences and technology</subject><subject>nanoimprint</subject><subject>Natural energy</subject><subject>passivation</subject><subject>Photovoltaic conversion</subject><subject>solar cells</subject><subject>Solar cells. Photoelectrochemical cells</subject><subject>Solar energy</subject><subject>TiO2 sol-gel</subject><subject>transient photoconductance decay</subject><issn>1062-7995</issn><issn>1099-159X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNpF0F1LwzAUBuAiCs4p-BMC4mVnvpo0l1J0DrY5cDLvwqFNS2bX1qRT9-9ttzGvTsh5SHjfILgleEQwpg-NbUaEMHIWDAhWKiSR-jjvz4KGUqnoMrjyfo0xkbESg2A1h6q2m8bZqjUZWtqaIl-XYWFK1ID39htaWxUos3nuIG1tXaHC7e88ymvXY3AoNWWJoGlKm0Jv_HVwkUPpzc1xDoP356dl8hJOX8eT5HEaFowKEmZSsjQmJANOFDCWs5hgCpQZTGMOTGKgVAiIeG7y2GRCSMojTLmMSSY4ZcPg7vBu4-qvrfGtXtdbV3VfasKVxPugnbo_KvAplF2SKrVed6k34HaaRlzFKmadCw_ux5Zmd9oTrPtuddet7rvVi8min__e-tb8njy4Ty0kk5Fezcd6xhf4LZolOmF_8tF72Q</recordid><startdate>201203</startdate><enddate>201203</enddate><creator>Barbé, Jérémy</creator><creator>Thomson, Andrew Francis</creator><creator>Wang, Er-Chien</creator><creator>McIntosh, Keith</creator><creator>Catchpole, Kylie</creator><general>John Wiley & Sons, Ltd</general><general>Wiley</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>IQODW</scope><scope>7SP</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope></search><sort><creationdate>201203</creationdate><title>Nanoimprinted Tio2 sol-gel passivating diffraction gratings for solar cell applications</title><author>Barbé, Jérémy ; Thomson, Andrew Francis ; Wang, Er-Chien ; McIntosh, Keith ; Catchpole, Kylie</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-g3261-d773c811da419a33f38102a23e0284a370a2266a54fef8ed667245024781d6423</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Applied sciences</topic><topic>diffraction grating</topic><topic>Energy</topic><topic>Exact sciences and technology</topic><topic>nanoimprint</topic><topic>Natural energy</topic><topic>passivation</topic><topic>Photovoltaic conversion</topic><topic>solar cells</topic><topic>Solar cells. Photoelectrochemical cells</topic><topic>Solar energy</topic><topic>TiO2 sol-gel</topic><topic>transient photoconductance decay</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Barbé, Jérémy</creatorcontrib><creatorcontrib>Thomson, Andrew Francis</creatorcontrib><creatorcontrib>Wang, Er-Chien</creatorcontrib><creatorcontrib>McIntosh, Keith</creatorcontrib><creatorcontrib>Catchpole, Kylie</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>Electronics & Communications Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Progress in photovoltaics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Barbé, Jérémy</au><au>Thomson, Andrew Francis</au><au>Wang, Er-Chien</au><au>McIntosh, Keith</au><au>Catchpole, Kylie</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nanoimprinted Tio2 sol-gel passivating diffraction gratings for solar cell applications</atitle><jtitle>Progress in photovoltaics</jtitle><addtitle>Prog. Photovolt: Res. Appl</addtitle><date>2012-03</date><risdate>2012</risdate><volume>20</volume><issue>2</issue><spage>143</spage><epage>148</epage><pages>143-148</pages><issn>1062-7995</issn><eissn>1099-159X</eissn><coden>PPHOED</coden><abstract>ABSTRACT
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. The gratings are homogeneous and free of defects and cover an area of 25 cm2. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells. Copyright © 2011 John Wiley & Sons, Ltd.
We report the fabrication and characterization of TiO2 sol–gel diffraction gratings on silicon substrates by using nanoimprint lithography. Minority carrier lifetimes of up to 900 µs for imprinted samples under illumination are reported, which Kelvin probe measurements indicate is due to light‐generated negative charge in the films. The structures reported here are very promising as light‐trapping, passivating coatings for solar cells.</abstract><cop>Chichester, UK</cop><pub>John Wiley & Sons, Ltd</pub><doi>10.1002/pip.1131</doi><tpages>6</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1062-7995 |
| ispartof | Progress in photovoltaics, 2012-03, Vol.20 (2), p.143-148 |
| issn | 1062-7995 1099-159X |
| language | eng |
| recordid | cdi_proquest_journals_1497000178 |
| source | Wiley Online Library All Journals |
| subjects | Applied sciences diffraction grating Energy Exact sciences and technology nanoimprint Natural energy passivation Photovoltaic conversion solar cells Solar cells. Photoelectrochemical cells Solar energy TiO2 sol-gel transient photoconductance decay |
| title | Nanoimprinted Tio2 sol-gel passivating diffraction gratings for solar cell applications |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T10%3A00%3A24IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pasca&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Nanoimprinted%20Tio2%20sol-gel%20passivating%20diffraction%20gratings%20for%20solar%20cell%20applications&rft.jtitle=Progress%20in%20photovoltaics&rft.au=Barb%C3%A9,%20J%C3%A9r%C3%A9my&rft.date=2012-03&rft.volume=20&rft.issue=2&rft.spage=143&rft.epage=148&rft.pages=143-148&rft.issn=1062-7995&rft.eissn=1099-159X&rft.coden=PPHOED&rft_id=info:doi/10.1002/pip.1131&rft_dat=%3Cproquest_pasca%3E3214978931%3C/proquest_pasca%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1497000178&rft_id=info:pmid/&rfr_iscdi=true |