Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A
ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociativ...
Gespeichert in:
| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2013/12/28, Vol.26(6), pp.745-750 |
|---|---|
| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 750 |
|---|---|
| container_issue | 6 |
| container_start_page | 745 |
| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 26 |
| creator | Hosaka, Yuji Oyama, Tomoko Gowa Oshima, Akihiro Enomoto, Satoshi Washio, Masakazu Tagawa, Seiichi |
| description | ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions. |
| doi_str_mv | 10.2494/photopolymer.26.745 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1494651830</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3206565911</sourcerecordid><originalsourceid>FETCH-LOGICAL-c535t-f363321a1aa291f67314710614c4e942a664af005308b0b9a0bfe8c7576867263</originalsourceid><addsrcrecordid>eNplkE1LAzEQQIMoWKu_wEvA89Z87-ZYSmuFgqXVi5eQbrPdlO1mTVJh_72RliJ4mst7M8MD4BGjEWGSPXe1i65zTX8wfkTEKGf8CgwwZTITlIprMEASs0wSxm7BXQh7hCjlXA7Ay_LYBANXemuTHmyA63jc9tC1UMO53dVND9emDTbabwMndeO8bXU0W7gyiY7wc7rkBI3vwU2l06aH8xyCj9n0fTLPFm8vr5PxIis55TGraPqHYI21JhJXIqeY5RgJzEpmJCNaCKYrhDhFxQZtpEabyhRlznNRiJwIOgRPp72dd19HE6Lau6Nv00mFUwnBcUFRouiJKr0LwZtKdd4etO8VRuq3mPpbTBGhUrFkzU7WPkS9MxdH-2jLxvxzxFm8AGWtvTIt_QGJ43sE</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1494651830</pqid></control><display><type>article</type><title>Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A</title><source>J-STAGE Free</source><source>EZB-FREE-00999 freely available EZB journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Hosaka, Yuji ; Oyama, Tomoko Gowa ; Oshima, Akihiro ; Enomoto, Satoshi ; Washio, Masakazu ; Tagawa, Seiichi</creator><creatorcontrib>Hosaka, Yuji ; Oyama, Tomoko Gowa ; Oshima, Akihiro ; Enomoto, Satoshi ; Washio, Masakazu ; Tagawa, Seiichi</creatorcontrib><description>ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.26.745</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>direct ionization ; electron beam resist ; pulse radiolysis ; ZEP520A</subject><ispartof>Journal of Photopolymer Science and Technology, 2013/12/28, Vol.26(6), pp.745-750</ispartof><rights>2013 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2013</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c535t-f363321a1aa291f67314710614c4e942a664af005308b0b9a0bfe8c7576867263</citedby><cites>FETCH-LOGICAL-c535t-f363321a1aa291f67314710614c4e942a664af005308b0b9a0bfe8c7576867263</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,1877,27901,27902</link.rule.ids></links><search><creatorcontrib>Hosaka, Yuji</creatorcontrib><creatorcontrib>Oyama, Tomoko Gowa</creatorcontrib><creatorcontrib>Oshima, Akihiro</creatorcontrib><creatorcontrib>Enomoto, Satoshi</creatorcontrib><creatorcontrib>Washio, Masakazu</creatorcontrib><creatorcontrib>Tagawa, Seiichi</creatorcontrib><title>Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.</description><subject>direct ionization</subject><subject>electron beam resist</subject><subject>pulse radiolysis</subject><subject>ZEP520A</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNplkE1LAzEQQIMoWKu_wEvA89Z87-ZYSmuFgqXVi5eQbrPdlO1mTVJh_72RliJ4mst7M8MD4BGjEWGSPXe1i65zTX8wfkTEKGf8CgwwZTITlIprMEASs0wSxm7BXQh7hCjlXA7Ay_LYBANXemuTHmyA63jc9tC1UMO53dVND9emDTbabwMndeO8bXU0W7gyiY7wc7rkBI3vwU2l06aH8xyCj9n0fTLPFm8vr5PxIis55TGraPqHYI21JhJXIqeY5RgJzEpmJCNaCKYrhDhFxQZtpEabyhRlznNRiJwIOgRPp72dd19HE6Lau6Nv00mFUwnBcUFRouiJKr0LwZtKdd4etO8VRuq3mPpbTBGhUrFkzU7WPkS9MxdH-2jLxvxzxFm8AGWtvTIt_QGJ43sE</recordid><startdate>20130101</startdate><enddate>20130101</enddate><creator>Hosaka, Yuji</creator><creator>Oyama, Tomoko Gowa</creator><creator>Oshima, Akihiro</creator><creator>Enomoto, Satoshi</creator><creator>Washio, Masakazu</creator><creator>Tagawa, Seiichi</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20130101</creationdate><title>Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A</title><author>Hosaka, Yuji ; Oyama, Tomoko Gowa ; Oshima, Akihiro ; Enomoto, Satoshi ; Washio, Masakazu ; Tagawa, Seiichi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c535t-f363321a1aa291f67314710614c4e942a664af005308b0b9a0bfe8c7576867263</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>direct ionization</topic><topic>electron beam resist</topic><topic>pulse radiolysis</topic><topic>ZEP520A</topic><toplevel>online_resources</toplevel><creatorcontrib>Hosaka, Yuji</creatorcontrib><creatorcontrib>Oyama, Tomoko Gowa</creatorcontrib><creatorcontrib>Oshima, Akihiro</creatorcontrib><creatorcontrib>Enomoto, Satoshi</creatorcontrib><creatorcontrib>Washio, Masakazu</creatorcontrib><creatorcontrib>Tagawa, Seiichi</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Hosaka, Yuji</au><au>Oyama, Tomoko Gowa</au><au>Oshima, Akihiro</au><au>Enomoto, Satoshi</au><au>Washio, Masakazu</au><au>Tagawa, Seiichi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2013-01-01</date><risdate>2013</risdate><volume>26</volume><issue>6</issue><spage>745</spage><epage>750</epage><pages>745-750</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.26.745</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2013/12/28, Vol.26(6), pp.745-750 |
| issn | 0914-9244 1349-6336 |
| language | eng |
| recordid | cdi_proquest_journals_1494651830 |
| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | direct ionization electron beam resist pulse radiolysis ZEP520A |
| title | Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T15%3A30%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Pulse%20Radiolysis%20Study%20on%20a%20Highly%20Sensitive%20Chlorinated%20Resist%20ZEP520A&rft.jtitle=Journal%20of%20Photopolymer%20Science%20and%20Technology&rft.au=Hosaka,%20Yuji&rft.date=2013-01-01&rft.volume=26&rft.issue=6&rft.spage=745&rft.epage=750&rft.pages=745-750&rft.issn=0914-9244&rft.eissn=1349-6336&rft_id=info:doi/10.2494/photopolymer.26.745&rft_dat=%3Cproquest_cross%3E3206565911%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1494651830&rft_id=info:pmid/&rfr_iscdi=true |