Preparation of Amorphous Ni-B Alloy Films by Electroplating

Preparation of Amorphous Ni-B Alloy Films by Electroplating

Amorphous Ni-B alloy films were prepared to electroplating from a bath containing (CH3)3NBH3 (trimethyla-mineborane TMAB). The films were lustrous. Boron codeposition in the films increased as the amount of TMAB in the bath was increased and as the current density was decreased. X-ray diffraction te...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Hyōmen gijutsu 1990/04/01, Vol.41(4), pp.388-391
Hauptverfasser: ONODA, Motonobu, TSUCHIYA, Takeshi, OGAWA, Katsuaki, WATANABE, Tohru
Format: Artikel
Sprache:eng
Schlagworte:
Amorphous
Electroplating
Ni-B Alloy
Structure
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 391
container_issue 4
container_start_page 388
container_title Hyōmen gijutsu
container_volume 41
creator ONODA, Motonobu
TSUCHIYA, Takeshi
OGAWA, Katsuaki
WATANABE, Tohru
description Amorphous Ni-B alloy films were prepared to electroplating from a bath containing (CH3)3NBH3 (trimethyla-mineborane TMAB). The films were lustrous. Boron codeposition in the films increased as the amount of TMAB in the bath was increased and as the current density was decreased. X-ray diffraction tests showed that films with boron codeposition of approximately 5wt% (equivalent to 22at%) or more were amorphous. This study showed the existence of a zone of pH values within which high boron codeposition is obtained. The maximum boron codeposition in the film prepared in this study was 6.24wt% (equivalent to 26.37at%).
doi_str_mv 10.4139/sfj.41.388
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1491090979</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3180610681</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2219-3570bd89b6b75447181c07fb72f2e3c990dcd02e9c1eb1d07e76c03227a3a0313</originalsourceid><addsrcrecordid>eNo90EFLwzAUB_AgCs7pxU9Q8CZ0vjRtk4enOTYVhnrQc0jTdGvpmpp0h357Myq75P3h_ZLAn5B7CouUMnzyVRPCgglxQWZUiDRmKeAlmQHSLKYix2ty430DwFiW8xl5_nKmV04Nte0iW0XLg3X93h599FHHL9Gybe0Yber24KNijNat0YOzfRt8t7slV5Vqvbn7n3Pys1l_r97i7efr-2q5jXWSUIxZxqEoBRZ5wbM05VRQDbwqeFIlhmlEKHUJiUFNTUFL4IbnGliScMUUMMrm5GF6t3f292j8IBt7dF34UtIUKSAgx6AeJ6Wd9d6ZSvauPig3SgryVI4M5YQgQzkBrybc-EHtzJkqN9S6NSdKUeCJp9MRbp23eq-cNB37A288bXc</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1491090979</pqid></control><display><type>article</type><title>Preparation of Amorphous Ni-B Alloy Films by Electroplating</title><source>Free E-Journal (出版社公開部分のみ）</source><creator>ONODA, Motonobu ; TSUCHIYA, Takeshi ; OGAWA, Katsuaki ; WATANABE, Tohru</creator><creatorcontrib>ONODA, Motonobu ; TSUCHIYA, Takeshi ; OGAWA, Katsuaki ; WATANABE, Tohru</creatorcontrib><description>Amorphous Ni-B alloy films were prepared to electroplating from a bath containing (CH3)3NBH3 (trimethyla-mineborane TMAB). The films were lustrous. Boron codeposition in the films increased as the amount of TMAB in the bath was increased and as the current density was decreased. X-ray diffraction tests showed that films with boron codeposition of approximately 5wt% (equivalent to 22at%) or more were amorphous. This study showed the existence of a zone of pH values within which high boron codeposition is obtained. The maximum boron codeposition in the film prepared in this study was 6.24wt% (equivalent to 26.37at%).</description><identifier>ISSN: 0915-1869</identifier><identifier>EISSN: 1884-3409</identifier><identifier>DOI: 10.4139/sfj.41.388</identifier><language>eng</language><publisher>Tokyo: The Surface Finishing Society of Japan</publisher><subject>Amorphous ; Electroplating ; Ni-B Alloy ; Structure</subject><ispartof>Journal of The Surface Finishing Society of Japan, 1990/04/01, Vol.41(4), pp.388-391</ispartof><rights>The Surface Finishing Society of Japan</rights><rights>Copyright Japan Science and Technology Agency 1990</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2219-3570bd89b6b75447181c07fb72f2e3c990dcd02e9c1eb1d07e76c03227a3a0313</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27903,27904</link.rule.ids></links><search><creatorcontrib>ONODA, Motonobu</creatorcontrib><creatorcontrib>TSUCHIYA, Takeshi</creatorcontrib><creatorcontrib>OGAWA, Katsuaki</creatorcontrib><creatorcontrib>WATANABE, Tohru</creatorcontrib><title>Preparation of Amorphous Ni-B Alloy Films by Electroplating</title><title>Hyōmen gijutsu</title><addtitle>Journal of The Surface Finishing Society of Japan</addtitle><description>Amorphous Ni-B alloy films were prepared to electroplating from a bath containing (CH3)3NBH3 (trimethyla-mineborane TMAB). The films were lustrous. Boron codeposition in the films increased as the amount of TMAB in the bath was increased and as the current density was decreased. X-ray diffraction tests showed that films with boron codeposition of approximately 5wt% (equivalent to 22at%) or more were amorphous. This study showed the existence of a zone of pH values within which high boron codeposition is obtained. The maximum boron codeposition in the film prepared in this study was 6.24wt% (equivalent to 26.37at%).</description><subject>Amorphous</subject><subject>Electroplating</subject><subject>Ni-B Alloy</subject><subject>Structure</subject><issn>0915-1869</issn><issn>1884-3409</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1990</creationdate><recordtype>article</recordtype><recordid>eNo90EFLwzAUB_AgCs7pxU9Q8CZ0vjRtk4enOTYVhnrQc0jTdGvpmpp0h357Myq75P3h_ZLAn5B7CouUMnzyVRPCgglxQWZUiDRmKeAlmQHSLKYix2ty430DwFiW8xl5_nKmV04Nte0iW0XLg3X93h599FHHL9Gybe0Yber24KNijNat0YOzfRt8t7slV5Vqvbn7n3Pys1l_r97i7efr-2q5jXWSUIxZxqEoBRZ5wbM05VRQDbwqeFIlhmlEKHUJiUFNTUFL4IbnGliScMUUMMrm5GF6t3f292j8IBt7dF34UtIUKSAgx6AeJ6Wd9d6ZSvauPig3SgryVI4M5YQgQzkBrybc-EHtzJkqN9S6NSdKUeCJp9MRbp23eq-cNB37A288bXc</recordid><startdate>19900401</startdate><enddate>19900401</enddate><creator>ONODA, Motonobu</creator><creator>TSUCHIYA, Takeshi</creator><creator>OGAWA, Katsuaki</creator><creator>WATANABE, Tohru</creator><general>The Surface Finishing Society of Japan</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19900401</creationdate><title>Preparation of Amorphous Ni-B Alloy Films by Electroplating</title><author>ONODA, Motonobu ; TSUCHIYA, Takeshi ; OGAWA, Katsuaki ; WATANABE, Tohru</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2219-3570bd89b6b75447181c07fb72f2e3c990dcd02e9c1eb1d07e76c03227a3a0313</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1990</creationdate><topic>Amorphous</topic><topic>Electroplating</topic><topic>Ni-B Alloy</topic><topic>Structure</topic><toplevel>online_resources</toplevel><creatorcontrib>ONODA, Motonobu</creatorcontrib><creatorcontrib>TSUCHIYA, Takeshi</creatorcontrib><creatorcontrib>OGAWA, Katsuaki</creatorcontrib><creatorcontrib>WATANABE, Tohru</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Hyōmen gijutsu</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>ONODA, Motonobu</au><au>TSUCHIYA, Takeshi</au><au>OGAWA, Katsuaki</au><au>WATANABE, Tohru</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Preparation of Amorphous Ni-B Alloy Films by Electroplating</atitle><jtitle>Hyōmen gijutsu</jtitle><addtitle>Journal of The Surface Finishing Society of Japan</addtitle><date>1990-04-01</date><risdate>1990</risdate><volume>41</volume><issue>4</issue><spage>388</spage><epage>391</epage><pages>388-391</pages><issn>0915-1869</issn><eissn>1884-3409</eissn><abstract>Amorphous Ni-B alloy films were prepared to electroplating from a bath containing (CH3)3NBH3 (trimethyla-mineborane TMAB). The films were lustrous. Boron codeposition in the films increased as the amount of TMAB in the bath was increased and as the current density was decreased. X-ray diffraction tests showed that films with boron codeposition of approximately 5wt% (equivalent to 22at%) or more were amorphous. This study showed the existence of a zone of pH values within which high boron codeposition is obtained. The maximum boron codeposition in the film prepared in this study was 6.24wt% (equivalent to 26.37at%).</abstract><cop>Tokyo</cop><pub>The Surface Finishing Society of Japan</pub><doi>10.4139/sfj.41.388</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0915-1869
ispartof Journal of The Surface Finishing Society of Japan, 1990/04/01, Vol.41(4), pp.388-391
issn 0915-1869
1884-3409
language eng
recordid cdi_proquest_journals_1491090979
source Free E-Journal (出版社公開部分のみ）
subjects Amorphous
Electroplating
Ni-B Alloy
Structure
title Preparation of Amorphous Ni-B Alloy Films by Electroplating
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T15%3A03%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Preparation%20of%20Amorphous%20Ni-B%20Alloy%20Films%20by%20Electroplating&rft.jtitle=Hy%C5%8Dmen%20gijutsu&rft.au=ONODA,%20Motonobu&rft.date=1990-04-01&rft.volume=41&rft.issue=4&rft.spage=388&rft.epage=391&rft.pages=388-391&rft.issn=0915-1869&rft.eissn=1884-3409&rft_id=info:doi/10.4139/sfj.41.388&rft_dat=%3Cproquest_cross%3E3180610681%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1491090979&rft_id=info:pmid/&rfr_iscdi=true