Development of Anode Slime Free-System for Copper Plating Using Acid Copper Sulfate Bath

The behavior of Cu+ ions produced in the course of copper anode dissolution in an acid copper sulfate solution was investigated electrochemically using a rotating Pt disc electrode system. The Cu+ ion concentration of the solution was proven to be related to the natural potentials, Er, of the Pt ele...

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Veröffentlicht in:Hyōmen gijutsu 2001/02/01, Vol.52(2), pp.212-216
Hauptverfasser: YOKOI, Masayuki, NAKADE, Takuo, MORIKAWA, Tsutomu, YUYA, Susumu
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container_end_page 216
container_issue 2
container_start_page 212
container_title Hyōmen gijutsu
container_volume 52
creator YOKOI, Masayuki
NAKADE, Takuo
MORIKAWA, Tsutomu
YUYA, Susumu
description The behavior of Cu+ ions produced in the course of copper anode dissolution in an acid copper sulfate solution was investigated electrochemically using a rotating Pt disc electrode system. The Cu+ ion concentration of the solution was proven to be related to the natural potentials, Er, of the Pt electrode. The amount of Cu+ ions produced by a phosphorous deoxidized copper anode was found to be much smaller than that from an electrolytic copper anode as noted by monitoring the Er of Pt electrode dipped in the solution. In addition, Cu+ ions accumulating in the solution were easily oxidized by air bubbling, resulting in suppression of copper slime generation. Therefore, an anode slime free-copper plating system was proposed. The system was equipped with double anodes, a copper anode and a dimensionally stable anode, in an anode compartment cell separated from the plating solution by a cation exchange membrane. No copper slime was observed in the anode compartment and the bath composition remained practically constant during a long period of plating operations.
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subjects Anode Slime
Cation Exchange Membrane
Copper Plating
Cuprous Ion
title Development of Anode Slime Free-System for Copper Plating Using Acid Copper Sulfate Bath
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