Development of Anode Slime Free-System for Copper Plating Using Acid Copper Sulfate Bath
The behavior of Cu+ ions produced in the course of copper anode dissolution in an acid copper sulfate solution was investigated electrochemically using a rotating Pt disc electrode system. The Cu+ ion concentration of the solution was proven to be related to the natural potentials, Er, of the Pt ele...
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Veröffentlicht in: | Hyōmen gijutsu 2001/02/01, Vol.52(2), pp.212-216 |
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creator | YOKOI, Masayuki NAKADE, Takuo MORIKAWA, Tsutomu YUYA, Susumu |
description | The behavior of Cu+ ions produced in the course of copper anode dissolution in an acid copper sulfate solution was investigated electrochemically using a rotating Pt disc electrode system. The Cu+ ion concentration of the solution was proven to be related to the natural potentials, Er, of the Pt electrode. The amount of Cu+ ions produced by a phosphorous deoxidized copper anode was found to be much smaller than that from an electrolytic copper anode as noted by monitoring the Er of Pt electrode dipped in the solution. In addition, Cu+ ions accumulating in the solution were easily oxidized by air bubbling, resulting in suppression of copper slime generation. Therefore, an anode slime free-copper plating system was proposed. The system was equipped with double anodes, a copper anode and a dimensionally stable anode, in an anode compartment cell separated from the plating solution by a cation exchange membrane. No copper slime was observed in the anode compartment and the bath composition remained practically constant during a long period of plating operations. |
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The Cu+ ion concentration of the solution was proven to be related to the natural potentials, Er, of the Pt electrode. The amount of Cu+ ions produced by a phosphorous deoxidized copper anode was found to be much smaller than that from an electrolytic copper anode as noted by monitoring the Er of Pt electrode dipped in the solution. In addition, Cu+ ions accumulating in the solution were easily oxidized by air bubbling, resulting in suppression of copper slime generation. Therefore, an anode slime free-copper plating system was proposed. The system was equipped with double anodes, a copper anode and a dimensionally stable anode, in an anode compartment cell separated from the plating solution by a cation exchange membrane. No copper slime was observed in the anode compartment and the bath composition remained practically constant during a long period of plating operations.</description><identifier>ISSN: 0915-1869</identifier><identifier>EISSN: 1884-3409</identifier><identifier>DOI: 10.4139/sfj.52.212</identifier><language>eng</language><publisher>Tokyo: The Surface Finishing Society of Japan</publisher><subject>Anode Slime ; Cation Exchange Membrane ; Copper Plating ; Cuprous Ion</subject><ispartof>Journal of The Surface Finishing Society of Japan, 2001/02/01, Vol.52(2), pp.212-216</ispartof><rights>The Surface Finishing Society of Japan</rights><rights>Copyright Japan Science and Technology Agency 2001</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2572-cf192473299cb6c4c8a71bb0762ba1ba36067d18a89287ae72ebbf611f292d523</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids></links><search><creatorcontrib>YOKOI, Masayuki</creatorcontrib><creatorcontrib>NAKADE, Takuo</creatorcontrib><creatorcontrib>MORIKAWA, Tsutomu</creatorcontrib><creatorcontrib>YUYA, Susumu</creatorcontrib><title>Development of Anode Slime Free-System for Copper Plating Using Acid Copper Sulfate Bath</title><title>Hyōmen gijutsu</title><addtitle>Journal of The Surface Finishing Society of Japan</addtitle><description>The behavior of Cu+ ions produced in the course of copper anode dissolution in an acid copper sulfate solution was investigated electrochemically using a rotating Pt disc electrode system. The Cu+ ion concentration of the solution was proven to be related to the natural potentials, Er, of the Pt electrode. The amount of Cu+ ions produced by a phosphorous deoxidized copper anode was found to be much smaller than that from an electrolytic copper anode as noted by monitoring the Er of Pt electrode dipped in the solution. In addition, Cu+ ions accumulating in the solution were easily oxidized by air bubbling, resulting in suppression of copper slime generation. Therefore, an anode slime free-copper plating system was proposed. The system was equipped with double anodes, a copper anode and a dimensionally stable anode, in an anode compartment cell separated from the plating solution by a cation exchange membrane. No copper slime was observed in the anode compartment and the bath composition remained practically constant during a long period of plating operations.</description><subject>Anode Slime</subject><subject>Cation Exchange Membrane</subject><subject>Copper Plating</subject><subject>Cuprous Ion</subject><issn>0915-1869</issn><issn>1884-3409</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNo9kF1LwzAUhoMoOKc3_oKAd0JnPtq0uZzVqTBQmAPvQpqebC39MsmE_Xs7p9685-J9zjnwIHRNySymXN55W88SNmOUnaAJzbI44jGRp2hCJE0imgl5ji68rwnhPBHpBH08wBc0_dBCF3Bv8bzrS8CrpmoBLxxAtNr7AC22vcN5Pwzg8FujQ9Vt8Nofcm6q8q9Z7RqrA-B7HbaX6MzqxsPV75yi9eLxPX-Olq9PL_l8GRmWpCwylkoWp5xJaQphYpPplBYFSQUrNC00F0SkJc10JlmWakgZFIUVlFomWZkwPkU3x7uD6z934IOq-53rxpeKxpISSYggI3V7pIzrvXdg1eCqVru9okQdzKnRnEqYGs2NcH6Eax_0Bv5R7UJlGjigVGbyBz_GuPXfmq12Cjr-DeFUd4g</recordid><startdate>20010201</startdate><enddate>20010201</enddate><creator>YOKOI, Masayuki</creator><creator>NAKADE, Takuo</creator><creator>MORIKAWA, Tsutomu</creator><creator>YUYA, Susumu</creator><general>The Surface Finishing Society of Japan</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20010201</creationdate><title>Development of Anode Slime Free-System for Copper Plating Using Acid Copper Sulfate Bath</title><author>YOKOI, Masayuki ; NAKADE, Takuo ; MORIKAWA, Tsutomu ; YUYA, Susumu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2572-cf192473299cb6c4c8a71bb0762ba1ba36067d18a89287ae72ebbf611f292d523</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Anode Slime</topic><topic>Cation Exchange Membrane</topic><topic>Copper Plating</topic><topic>Cuprous Ion</topic><toplevel>online_resources</toplevel><creatorcontrib>YOKOI, Masayuki</creatorcontrib><creatorcontrib>NAKADE, Takuo</creatorcontrib><creatorcontrib>MORIKAWA, Tsutomu</creatorcontrib><creatorcontrib>YUYA, Susumu</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Hyōmen gijutsu</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>YOKOI, Masayuki</au><au>NAKADE, Takuo</au><au>MORIKAWA, Tsutomu</au><au>YUYA, Susumu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of Anode Slime Free-System for Copper Plating Using Acid Copper Sulfate Bath</atitle><jtitle>Hyōmen gijutsu</jtitle><addtitle>Journal of The Surface Finishing Society of Japan</addtitle><date>2001-02-01</date><risdate>2001</risdate><volume>52</volume><issue>2</issue><spage>212</spage><epage>216</epage><pages>212-216</pages><issn>0915-1869</issn><eissn>1884-3409</eissn><abstract>The behavior of Cu+ ions produced in the course of copper anode dissolution in an acid copper sulfate solution was investigated electrochemically using a rotating Pt disc electrode system. The Cu+ ion concentration of the solution was proven to be related to the natural potentials, Er, of the Pt electrode. The amount of Cu+ ions produced by a phosphorous deoxidized copper anode was found to be much smaller than that from an electrolytic copper anode as noted by monitoring the Er of Pt electrode dipped in the solution. In addition, Cu+ ions accumulating in the solution were easily oxidized by air bubbling, resulting in suppression of copper slime generation. Therefore, an anode slime free-copper plating system was proposed. The system was equipped with double anodes, a copper anode and a dimensionally stable anode, in an anode compartment cell separated from the plating solution by a cation exchange membrane. No copper slime was observed in the anode compartment and the bath composition remained practically constant during a long period of plating operations.</abstract><cop>Tokyo</cop><pub>The Surface Finishing Society of Japan</pub><doi>10.4139/sfj.52.212</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Anode Slime Cation Exchange Membrane Copper Plating Cuprous Ion |
title | Development of Anode Slime Free-System for Copper Plating Using Acid Copper Sulfate Bath |
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