Negative Tone Imaging Process and Materials for EUV Lithography

The advantages of NTI process in EUV is demonstrated by optical simulation method for 0.25NA and 0.33NA illumination system with view point of optical aerial image quality and photon density. The extendablity of NTI for higher NA system is considered for further tight pitch and small size contact ho...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2013/06/25, Vol.26(5), pp.599-604
Hauptverfasser:	Tarutani, Shinji, Nihashi, Wataru, Hirano, Shuuji, Yokokawa, Natsumi, Takizawa, Hiroo
Format:	Artikel
Sprache:	eng
Schlagworte:	EUV resist negative tone imaging
Online-Zugang:	Volltext
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