A Gas Puff Plasma X-Ray Source

Employing a gas-puff-z-pinch plasma, a high brightness plasma x-ray source has been developed. The stable x-ray output is attained by using a fast-acting gas valve, capable of operating stably under gas plenum pressure below 300 Torr.. With this x-ray source, 1-1.4nm x-rays with 100J per pulse (300W...

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Veröffentlicht in:	Rēzā kenkyū 1990/11/29, Vol.18(11), pp.879-884
Hauptverfasser:	OKADA, Ikuo, ITABASHI, Seiich, SAITO, Yasunao, YOSHIHARA, Hideo
Format:	Artikel
Sprache:	eng
Schlagworte:	Gas-puff plasma Plasma x-ray source Z-pinchi plasma
Online-Zugang:	Volltext
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