Preparation of Thin Films of SnO2 Ultrafine Particles by the
Thin films composed of SnO2 ultrafine particles were prepared by RF-sputtering of a SnO2sintered target under the atmosphere of Ar, and their characteristics were examined by X-ray diffraction method and transmission electron microscopy. The pressure of Ar during the sputtering was a determining fac...
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| Veröffentlicht in: | Nippon Kagakukai shi (1972) 1984-06, Vol.1984 (6), p.831 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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