Total-Ionizing-Dose Effects on the Resistance Switching Characteristics of Chalcogenide Programmable Metallization Cells
Programmable metallization cells (PMCs) are emerging ReRAM devices exhibiting resistance switching due to cation transport in a solid-state electrolyte and redox reactions at the electrodes. Their non-volatility and low power requirements have led to increased interest in their development for non-v...
Gespeichert in:
Veröffentlicht in: | IEEE transactions on nuclear science 2013-12, Vol.60 (6), p.4563-4569 |
---|---|
Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 4569 |
---|---|
container_issue | 6 |
container_start_page | 4563 |
container_title | IEEE transactions on nuclear science |
container_volume | 60 |
creator | Gonzalez-Velo, Y. Barnaby, H. J. Kozicki, M. N. Dandamudi, P. Chandran, A. Holbert, K. E. Mitkova, M. Ailavajhala, M. |
description | Programmable metallization cells (PMCs) are emerging ReRAM devices exhibiting resistance switching due to cation transport in a solid-state electrolyte and redox reactions at the electrodes. Their non-volatility and low power requirements have led to increased interest in their development for non-volatile memory applications. Investigation of the total dose response of PMCs will contribute to our understanding of radiation induced effects in these novel memory devices as well as assess their suitability for use in ionizing radiation environments. This work investigates the impact of total ionizing dose on the switching characteristic of silver doped Ge 30 Se 70 PMC memory devices. The results obtained show that the resistance switching characteristic of these cells which use a solid state electrolyte based on Ge 30 Se 70 is not affected by a total dose exposure of up to 10 Mrad( Ge 30 Se 70 ). |
doi_str_mv | 10.1109/TNS.2013.2286318 |
format | Article |
fullrecord | <record><control><sourceid>proquest_RIE</sourceid><recordid>TN_cdi_proquest_journals_1469696312</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6678245</ieee_id><sourcerecordid>3161848981</sourcerecordid><originalsourceid>FETCH-LOGICAL-c324t-74cb8250e4d9db7c4ccf4287c177049ab1cd288116cf7065837e0165e8d6716b3</originalsourceid><addsrcrecordid>eNpdkU1rGzEQhkVJoG7Se6GXhV56WUej1dcei-smgXzRuGeh1c7aCutVKsk0ya-PjEMPYQ7DzDzzzsBLyBegcwDanq1u7ueMQjNnTMsG9AcyAyF0DULpIzKjFHTd8rb9SD6l9FBKLqiYkadVyHasL8PkX_y0rn-GhNVyGNDlVIWpyhusfmPyKdvJYXX_z2e3KWC12NhoXcZYRt4Vdti3RhfWOPkeq7sY1tFut7YbsbrGcmT0Lzb7ornAcUyn5HiwY8LPb_mE_Pm1XC0u6qvb88vFj6vaNYznWnHXaSYo8r7tO-W4cwNnWjlQivLWduB6pjWAdIOiUuhGIQUpUPdSgeyaE_L9oPsYw98dpmy2PrnygZ0w7JIBqYVSXGtV0G_v0Iewi1P5zgCXbYkGWKHogXIxpBRxMI_Rb218NkDN3gpTrDB7K8ybFWXl62HFI-J_XEqlGRfNKw6ZhZk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1469696312</pqid></control><display><type>article</type><title>Total-Ionizing-Dose Effects on the Resistance Switching Characteristics of Chalcogenide Programmable Metallization Cells</title><source>IEEE Electronic Library (IEL)</source><creator>Gonzalez-Velo, Y. ; Barnaby, H. J. ; Kozicki, M. N. ; Dandamudi, P. ; Chandran, A. ; Holbert, K. E. ; Mitkova, M. ; Ailavajhala, M.</creator><creatorcontrib>Gonzalez-Velo, Y. ; Barnaby, H. J. ; Kozicki, M. N. ; Dandamudi, P. ; Chandran, A. ; Holbert, K. E. ; Mitkova, M. ; Ailavajhala, M.</creatorcontrib><description>Programmable metallization cells (PMCs) are emerging ReRAM devices exhibiting resistance switching due to cation transport in a solid-state electrolyte and redox reactions at the electrodes. Their non-volatility and low power requirements have led to increased interest in their development for non-volatile memory applications. Investigation of the total dose response of PMCs will contribute to our understanding of radiation induced effects in these novel memory devices as well as assess their suitability for use in ionizing radiation environments. This work investigates the impact of total ionizing dose on the switching characteristic of silver doped Ge 30 Se 70 PMC memory devices. The results obtained show that the resistance switching characteristic of these cells which use a solid state electrolyte based on Ge 30 Se 70 is not affected by a total dose exposure of up to 10 Mrad( Ge 30 Se 70 ).</description><identifier>ISSN: 0018-9499</identifier><identifier>EISSN: 1558-1578</identifier><identifier>DOI: 10.1109/TNS.2013.2286318</identifier><identifier>CODEN: IETNAE</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Cation ; chalcogenide glass ; Data storage ; ECM ; electrochemical metallization ; Electrodes ; Electrolytes ; Electrolytic cells ; Germanium ; Memory devices ; Memristors ; Metallization ; Metallizing ; nanoionic memory ; Nonvolatile memory ; photo-diffusion ; photodoping ; PMC ; programmable metallization cell ; Radiation effects ; ReRAM ; Resistance ; resistive switching ; Switching ; total ionizing dose</subject><ispartof>IEEE transactions on nuclear science, 2013-12, Vol.60 (6), p.4563-4569</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) Dec 2013</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c324t-74cb8250e4d9db7c4ccf4287c177049ab1cd288116cf7065837e0165e8d6716b3</citedby><cites>FETCH-LOGICAL-c324t-74cb8250e4d9db7c4ccf4287c177049ab1cd288116cf7065837e0165e8d6716b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6678245$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/6678245$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Gonzalez-Velo, Y.</creatorcontrib><creatorcontrib>Barnaby, H. J.</creatorcontrib><creatorcontrib>Kozicki, M. N.</creatorcontrib><creatorcontrib>Dandamudi, P.</creatorcontrib><creatorcontrib>Chandran, A.</creatorcontrib><creatorcontrib>Holbert, K. E.</creatorcontrib><creatorcontrib>Mitkova, M.</creatorcontrib><creatorcontrib>Ailavajhala, M.</creatorcontrib><title>Total-Ionizing-Dose Effects on the Resistance Switching Characteristics of Chalcogenide Programmable Metallization Cells</title><title>IEEE transactions on nuclear science</title><addtitle>TNS</addtitle><description>Programmable metallization cells (PMCs) are emerging ReRAM devices exhibiting resistance switching due to cation transport in a solid-state electrolyte and redox reactions at the electrodes. Their non-volatility and low power requirements have led to increased interest in their development for non-volatile memory applications. Investigation of the total dose response of PMCs will contribute to our understanding of radiation induced effects in these novel memory devices as well as assess their suitability for use in ionizing radiation environments. This work investigates the impact of total ionizing dose on the switching characteristic of silver doped Ge 30 Se 70 PMC memory devices. The results obtained show that the resistance switching characteristic of these cells which use a solid state electrolyte based on Ge 30 Se 70 is not affected by a total dose exposure of up to 10 Mrad( Ge 30 Se 70 ).</description><subject>Cation</subject><subject>chalcogenide glass</subject><subject>Data storage</subject><subject>ECM</subject><subject>electrochemical metallization</subject><subject>Electrodes</subject><subject>Electrolytes</subject><subject>Electrolytic cells</subject><subject>Germanium</subject><subject>Memory devices</subject><subject>Memristors</subject><subject>Metallization</subject><subject>Metallizing</subject><subject>nanoionic memory</subject><subject>Nonvolatile memory</subject><subject>photo-diffusion</subject><subject>photodoping</subject><subject>PMC</subject><subject>programmable metallization cell</subject><subject>Radiation effects</subject><subject>ReRAM</subject><subject>Resistance</subject><subject>resistive switching</subject><subject>Switching</subject><subject>total ionizing dose</subject><issn>0018-9499</issn><issn>1558-1578</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNpdkU1rGzEQhkVJoG7Se6GXhV56WUej1dcei-smgXzRuGeh1c7aCutVKsk0ya-PjEMPYQ7DzDzzzsBLyBegcwDanq1u7ueMQjNnTMsG9AcyAyF0DULpIzKjFHTd8rb9SD6l9FBKLqiYkadVyHasL8PkX_y0rn-GhNVyGNDlVIWpyhusfmPyKdvJYXX_z2e3KWC12NhoXcZYRt4Vdti3RhfWOPkeq7sY1tFut7YbsbrGcmT0Lzb7ornAcUyn5HiwY8LPb_mE_Pm1XC0u6qvb88vFj6vaNYznWnHXaSYo8r7tO-W4cwNnWjlQivLWduB6pjWAdIOiUuhGIQUpUPdSgeyaE_L9oPsYw98dpmy2PrnygZ0w7JIBqYVSXGtV0G_v0Iewi1P5zgCXbYkGWKHogXIxpBRxMI_Rb218NkDN3gpTrDB7K8ybFWXl62HFI-J_XEqlGRfNKw6ZhZk</recordid><startdate>20131201</startdate><enddate>20131201</enddate><creator>Gonzalez-Velo, Y.</creator><creator>Barnaby, H. J.</creator><creator>Kozicki, M. N.</creator><creator>Dandamudi, P.</creator><creator>Chandran, A.</creator><creator>Holbert, K. E.</creator><creator>Mitkova, M.</creator><creator>Ailavajhala, M.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QL</scope><scope>7QQ</scope><scope>7SC</scope><scope>7SE</scope><scope>7SP</scope><scope>7SR</scope><scope>7T7</scope><scope>7TA</scope><scope>7TB</scope><scope>7U5</scope><scope>7U9</scope><scope>8BQ</scope><scope>8FD</scope><scope>C1K</scope><scope>F28</scope><scope>FR3</scope><scope>H8D</scope><scope>H94</scope><scope>JG9</scope><scope>JQ2</scope><scope>KR7</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope><scope>M7N</scope><scope>P64</scope></search><sort><creationdate>20131201</creationdate><title>Total-Ionizing-Dose Effects on the Resistance Switching Characteristics of Chalcogenide Programmable Metallization Cells</title><author>Gonzalez-Velo, Y. ; Barnaby, H. J. ; Kozicki, M. N. ; Dandamudi, P. ; Chandran, A. ; Holbert, K. E. ; Mitkova, M. ; Ailavajhala, M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c324t-74cb8250e4d9db7c4ccf4287c177049ab1cd288116cf7065837e0165e8d6716b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Cation</topic><topic>chalcogenide glass</topic><topic>Data storage</topic><topic>ECM</topic><topic>electrochemical metallization</topic><topic>Electrodes</topic><topic>Electrolytes</topic><topic>Electrolytic cells</topic><topic>Germanium</topic><topic>Memory devices</topic><topic>Memristors</topic><topic>Metallization</topic><topic>Metallizing</topic><topic>nanoionic memory</topic><topic>Nonvolatile memory</topic><topic>photo-diffusion</topic><topic>photodoping</topic><topic>PMC</topic><topic>programmable metallization cell</topic><topic>Radiation effects</topic><topic>ReRAM</topic><topic>Resistance</topic><topic>resistive switching</topic><topic>Switching</topic><topic>total ionizing dose</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gonzalez-Velo, Y.</creatorcontrib><creatorcontrib>Barnaby, H. J.</creatorcontrib><creatorcontrib>Kozicki, M. N.</creatorcontrib><creatorcontrib>Dandamudi, P.</creatorcontrib><creatorcontrib>Chandran, A.</creatorcontrib><creatorcontrib>Holbert, K. E.</creatorcontrib><creatorcontrib>Mitkova, M.</creatorcontrib><creatorcontrib>Ailavajhala, M.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005–Present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Bacteriology Abstracts (Microbiology B)</collection><collection>Ceramic Abstracts</collection><collection>Computer and Information Systems Abstracts</collection><collection>Corrosion Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Industrial and Applied Microbiology Abstracts (Microbiology A)</collection><collection>Materials Business File</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Virology and AIDS Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Environmental Sciences and Pollution Management</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Aerospace Database</collection><collection>AIDS and Cancer Research Abstracts</collection><collection>Materials Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><collection>Algology Mycology and Protozoology Abstracts (Microbiology C)</collection><collection>Biotechnology and BioEngineering Abstracts</collection><jtitle>IEEE transactions on nuclear science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Gonzalez-Velo, Y.</au><au>Barnaby, H. J.</au><au>Kozicki, M. N.</au><au>Dandamudi, P.</au><au>Chandran, A.</au><au>Holbert, K. E.</au><au>Mitkova, M.</au><au>Ailavajhala, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Total-Ionizing-Dose Effects on the Resistance Switching Characteristics of Chalcogenide Programmable Metallization Cells</atitle><jtitle>IEEE transactions on nuclear science</jtitle><stitle>TNS</stitle><date>2013-12-01</date><risdate>2013</risdate><volume>60</volume><issue>6</issue><spage>4563</spage><epage>4569</epage><pages>4563-4569</pages><issn>0018-9499</issn><eissn>1558-1578</eissn><coden>IETNAE</coden><abstract>Programmable metallization cells (PMCs) are emerging ReRAM devices exhibiting resistance switching due to cation transport in a solid-state electrolyte and redox reactions at the electrodes. Their non-volatility and low power requirements have led to increased interest in their development for non-volatile memory applications. Investigation of the total dose response of PMCs will contribute to our understanding of radiation induced effects in these novel memory devices as well as assess their suitability for use in ionizing radiation environments. This work investigates the impact of total ionizing dose on the switching characteristic of silver doped Ge 30 Se 70 PMC memory devices. The results obtained show that the resistance switching characteristic of these cells which use a solid state electrolyte based on Ge 30 Se 70 is not affected by a total dose exposure of up to 10 Mrad( Ge 30 Se 70 ).</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TNS.2013.2286318</doi><tpages>7</tpages></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | ISSN: 0018-9499 |
ispartof | IEEE transactions on nuclear science, 2013-12, Vol.60 (6), p.4563-4569 |
issn | 0018-9499 1558-1578 |
language | eng |
recordid | cdi_proquest_journals_1469696312 |
source | IEEE Electronic Library (IEL) |
subjects | Cation chalcogenide glass Data storage ECM electrochemical metallization Electrodes Electrolytes Electrolytic cells Germanium Memory devices Memristors Metallization Metallizing nanoionic memory Nonvolatile memory photo-diffusion photodoping PMC programmable metallization cell Radiation effects ReRAM Resistance resistive switching Switching total ionizing dose |
title | Total-Ionizing-Dose Effects on the Resistance Switching Characteristics of Chalcogenide Programmable Metallization Cells |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-21T21%3A42%3A03IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_RIE&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Total-Ionizing-Dose%20Effects%20on%20the%20Resistance%20Switching%20Characteristics%20of%20Chalcogenide%20Programmable%20Metallization%20Cells&rft.jtitle=IEEE%20transactions%20on%20nuclear%20science&rft.au=Gonzalez-Velo,%20Y.&rft.date=2013-12-01&rft.volume=60&rft.issue=6&rft.spage=4563&rft.epage=4569&rft.pages=4563-4569&rft.issn=0018-9499&rft.eissn=1558-1578&rft.coden=IETNAE&rft_id=info:doi/10.1109/TNS.2013.2286318&rft_dat=%3Cproquest_RIE%3E3161848981%3C/proquest_RIE%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1469696312&rft_id=info:pmid/&rft_ieee_id=6678245&rfr_iscdi=true |