EUVL Challenges towards 1x nm Generation

EUVL applicability to mass production in 2x nm generations has been proved by recent developments. For 1x nm generations, three major lithography candidates to be applied for mass productions are discussed, quadruple patterning, EUVL single patterning and EUVL double patterning. Three candidates are...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2011/06/21, Vol.24(1), pp.19-23
Hauptverfasser:	Kyoh, Suigen, Nakajima, Yumi, Watanabe, Shinya, Imamura, Tsubasa, Sasaki, Toshiyuki, Omura, Mitsuhiro, Tawarayama, Kazuo, Matsunaga, Kentaro
Format:	Artikel
Sprache:	eng
Schlagworte:	cost double patterning EUV quadruple patterning TAT
Online-Zugang:	Volltext
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