Substrate Effect on the Vertical Density Profile of Thin Photoresist Film

Vertical electron density (ED) profiles of photoresist film on three different substrates (bare, HMDS-primed, underlayer-coated Si wafer) were obtained using X-ray reflectivity analysis. Small amounts of density fluctuation at each depth of film were analyzed using distorted wave Born approximation...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2011/06/21, Vol.24(2), pp.159-164
Hauptverfasser:	Yoon, Jin Goo, Zin, Wang-Cheol, Kim, Jeongsik, Lee, Jae-Woo, Ahn, Sung Il, Kim, Jaehyun
Format:	Artikel
Sprache:	eng
Schlagworte:	density distribution interfacial energy PAG photoresist X-ray reflectivity
Online-Zugang:	Volltext
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