Step and Flash Imprint Lithography Modeling and Process Development
Step and Flash Imprint Lithography (SFIL) is a low pressure, room temperature process capable of faithfully reproducing nanometer scale features. By eliminating expensive imaging optics, SFIL is able to realize this pattern transfer at low cost. Previous work has described the SFIL process in detail...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2004, Vol.17(3), pp.417-419 |
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| container_title | Journal of Photopolymer Science and Technology |
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| creator | Johnson, S. Burns, R. Kim, E. K. Schmid, G. Dicky, M. Meiring, J. Burns, S. Stacey, N. Wilson, C. G. Convey, D. Wei, Y. Fejes, P. Gehoski, K. Mancini, D. Nordquist, K. Dauksher, W. J. Resnick, D. J. |
| description | Step and Flash Imprint Lithography (SFIL) is a low pressure, room temperature process capable of faithfully reproducing nanometer scale features. By eliminating expensive imaging optics, SFIL is able to realize this pattern transfer at low cost. Previous work has described the SFIL process in detail including a general process description, etch transfer processes, initial defect studies, polymerization kinetics, and device demonstrations. This paper documents photopolymerization induced shrinkage of the etch barrier and its effect on pattern fidelity and line profile. Results from finite element and mesoscale models are compared to imprinted etch barriers of varying shrinkage. |
| doi_str_mv | 10.2494/photopolymer.17.417 |
| format | Article |
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K. ; Schmid, G. ; Dicky, M. ; Meiring, J. ; Burns, S. ; Stacey, N. ; Wilson, C. G. ; Convey, D. ; Wei, Y. ; Fejes, P. ; Gehoski, K. ; Mancini, D. ; Nordquist, K. ; Dauksher, W. J. ; Resnick, D. J.</creator><creatorcontrib>Johnson, S. ; Burns, R. ; Kim, E. K. ; Schmid, G. ; Dicky, M. ; Meiring, J. ; Burns, S. ; Stacey, N. ; Wilson, C. G. ; Convey, D. ; Wei, Y. ; Fejes, P. ; Gehoski, K. ; Mancini, D. ; Nordquist, K. ; Dauksher, W. J. ; Resnick, D. J.</creatorcontrib><description>Step and Flash Imprint Lithography (SFIL) is a low pressure, room temperature process capable of faithfully reproducing nanometer scale features. By eliminating expensive imaging optics, SFIL is able to realize this pattern transfer at low cost. Previous work has described the SFIL process in detail including a general process description, etch transfer processes, initial defect studies, polymerization kinetics, and device demonstrations. This paper documents photopolymerization induced shrinkage of the etch barrier and its effect on pattern fidelity and line profile. 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| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2004, Vol.17(3), pp.417-419 |
| issn | 0914-9244 1349-6336 |
| language | eng |
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| source | J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | acrylate imprint lithography nanoimprint step and flash |
| title | Step and Flash Imprint Lithography Modeling and Process Development |
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