Tetrafluoroethylene-based Fluoropolymers for 157-nm Resist Materials

Tetrafluoroethylene-based copolymers with functional norbornenes were synthesized and their fundamental properties, such as transparency at 157 nm and solubility in a standard alkaline developer, were characterized. A high transparency, i.e., absorbance of less than 0.5 μm-1, was achieved by optimiz...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of Photopolymer Science and Technology 2003, Vol.16(4), pp.607-613
Hauptverfasser:	Toriumi, M., Ishikawa, T., Kodani, T., Koh, M., Moriya, T., Araki, T., Aoyama, H., Yamashita, T., Yamazaki, T., Furukawa, T., Itani, T.
Format:	Artikel
Sprache:	eng
Schlagworte:	157-nm lithography fluoropolymer norbornene quartz crystal microbalance resist tetrafluoroethylene
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!