New Fluorinated Resins for 157 nm Lithography Application

As part of a new generation of more transparent 157 nm resist platforms we are developing, a novel resist system is described that has higher transparency and contrast than AZ®FXTM 1000P. Using a new protecting group strategy, encouraging results have been obtained with both poly(α,α-bis(trifluorome...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2003, Vol.16(4), pp.581-590
Hauptverfasser:	Houlihan, Francis, Romano, Andrew, Rentkiewicz, David, Sakamuri, Raj, Dammel, Ralph R., Conley, Will, Rich, Georgia, Miller, Daniel, Rhodes, Larry, McDaniels, Joe, Chang, Chun
Format:	Artikel
Sprache:	eng
Schlagworte:	157 nm high transparency resist
Online-Zugang:	Volltext
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