Effects of Protecting Group of Fluoroalcohol on Lithographic Performance
We have investigated effects of protecting group of fluoroalcohol as alkaline solubility on lithographic performance for the designing of chemical amplification positive-tone resist system. Preparing three different protecting groups (methoxymethyl: MOM, ethoxymethyl: EOM and fluoroethoxymethyl: FEO...
Gespeichert in:
| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2003, Vol.16(5), pp.707-712 |
|---|---|
| Hauptverfasser: | , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 712 |
|---|---|
| container_issue | 5 |
| container_start_page | 707 |
| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 16 |
| creator | Ogata, Toshiyuki Matsumaru, Shogo Hirayama, Taku Shiono, Daiju Iwai, Takeshi Hada, Hideo Shirai, Masamitsu |
| description | We have investigated effects of protecting group of fluoroalcohol as alkaline solubility on lithographic performance for the designing of chemical amplification positive-tone resist system. Preparing three different protecting groups (methoxymethyl: MOM, ethoxymethyl: EOM and fluoroethoxymethyl: FEOM) of norbornene hexafluoro-isopropanol (NBHFA) polymers and resists consisted of these polymers, we have evaluated optical properties, dissolution rates with developer, exposure sensitivities and resolution. These polymers showed a good pattern profile and high resolution. In addition, as compared with NBHFA-MOM and -EOM polymers, NBHFA-FEOM polymer displayed a good absorption coefficient at 157 nm. |
| doi_str_mv | 10.2494/photopolymer.16.707 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_1444627964</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3107831471</sourcerecordid><originalsourceid>FETCH-LOGICAL-c483t-f1512a2892d69bd2f03b8337b1d5a1cb1833307854dc1c544469fab84d05c50f3</originalsourceid><addsrcrecordid>eNplkM9LwzAUx4MoOKd_gZeC586kSdrmKGM_hIE76DmkabJ2dH01SQ_7782oDMHLey_h83kPvgg9E7zImGCvQwMBBujOJ-MWJF8UuLhBM0KZSHNK81s0w4KwVGSM3aMH748YU8q5mKHtylqjg0_AJnsHIc5tf0g2Dsbh8rfuRnCgOg0NdAn0ya4NDRycGppWJ3vjLLiT6rV5RHdWdd48_fY5-lqvPpfbdPexeV--7VLNShpSSzjJVFaKrM5FVWcW06qktKhIzRXRFYkPiouSs1oTzRljubCqKlmNuebY0jl6mfYODr5H44M8wuj6eFKSC50VImeRohOlHXjvjJWDa0_KnSXB8hKZ_BuZJLmMkUVrO1lHH9TBXB3lQqs788_hU4nqFdGNctL09AcIVn4D</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1444627964</pqid></control><display><type>article</type><title>Effects of Protecting Group of Fluoroalcohol on Lithographic Performance</title><source>J-STAGE Free</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Ogata, Toshiyuki ; Matsumaru, Shogo ; Hirayama, Taku ; Shiono, Daiju ; Iwai, Takeshi ; Hada, Hideo ; Shirai, Masamitsu</creator><creatorcontrib>Ogata, Toshiyuki ; Matsumaru, Shogo ; Hirayama, Taku ; Shiono, Daiju ; Iwai, Takeshi ; Hada, Hideo ; Shirai, Masamitsu</creatorcontrib><description>We have investigated effects of protecting group of fluoroalcohol as alkaline solubility on lithographic performance for the designing of chemical amplification positive-tone resist system. Preparing three different protecting groups (methoxymethyl: MOM, ethoxymethyl: EOM and fluoroethoxymethyl: FEOM) of norbornene hexafluoro-isopropanol (NBHFA) polymers and resists consisted of these polymers, we have evaluated optical properties, dissolution rates with developer, exposure sensitivities and resolution. These polymers showed a good pattern profile and high resolution. In addition, as compared with NBHFA-MOM and -EOM polymers, NBHFA-FEOM polymer displayed a good absorption coefficient at 157 nm.</description><identifier>ISSN: 0914-9244</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.16.707</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>chemical amplification positive-tone resist ; effect of protecting group</subject><ispartof>Journal of Photopolymer Science and Technology, 2003, Vol.16(5), pp.707-712</ispartof><rights>2003 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2003</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c483t-f1512a2892d69bd2f03b8337b1d5a1cb1833307854dc1c544469fab84d05c50f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,1877,27901,27902</link.rule.ids></links><search><creatorcontrib>Ogata, Toshiyuki</creatorcontrib><creatorcontrib>Matsumaru, Shogo</creatorcontrib><creatorcontrib>Hirayama, Taku</creatorcontrib><creatorcontrib>Shiono, Daiju</creatorcontrib><creatorcontrib>Iwai, Takeshi</creatorcontrib><creatorcontrib>Hada, Hideo</creatorcontrib><creatorcontrib>Shirai, Masamitsu</creatorcontrib><title>Effects of Protecting Group of Fluoroalcohol on Lithographic Performance</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>We have investigated effects of protecting group of fluoroalcohol as alkaline solubility on lithographic performance for the designing of chemical amplification positive-tone resist system. Preparing three different protecting groups (methoxymethyl: MOM, ethoxymethyl: EOM and fluoroethoxymethyl: FEOM) of norbornene hexafluoro-isopropanol (NBHFA) polymers and resists consisted of these polymers, we have evaluated optical properties, dissolution rates with developer, exposure sensitivities and resolution. These polymers showed a good pattern profile and high resolution. In addition, as compared with NBHFA-MOM and -EOM polymers, NBHFA-FEOM polymer displayed a good absorption coefficient at 157 nm.</description><subject>chemical amplification positive-tone resist</subject><subject>effect of protecting group</subject><issn>0914-9244</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNplkM9LwzAUx4MoOKd_gZeC586kSdrmKGM_hIE76DmkabJ2dH01SQ_7782oDMHLey_h83kPvgg9E7zImGCvQwMBBujOJ-MWJF8UuLhBM0KZSHNK81s0w4KwVGSM3aMH748YU8q5mKHtylqjg0_AJnsHIc5tf0g2Dsbh8rfuRnCgOg0NdAn0ya4NDRycGppWJ3vjLLiT6rV5RHdWdd48_fY5-lqvPpfbdPexeV--7VLNShpSSzjJVFaKrM5FVWcW06qktKhIzRXRFYkPiouSs1oTzRljubCqKlmNuebY0jl6mfYODr5H44M8wuj6eFKSC50VImeRohOlHXjvjJWDa0_KnSXB8hKZ_BuZJLmMkUVrO1lHH9TBXB3lQqs788_hU4nqFdGNctL09AcIVn4D</recordid><startdate>20030101</startdate><enddate>20030101</enddate><creator>Ogata, Toshiyuki</creator><creator>Matsumaru, Shogo</creator><creator>Hirayama, Taku</creator><creator>Shiono, Daiju</creator><creator>Iwai, Takeshi</creator><creator>Hada, Hideo</creator><creator>Shirai, Masamitsu</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20030101</creationdate><title>Effects of Protecting Group of Fluoroalcohol on Lithographic Performance</title><author>Ogata, Toshiyuki ; Matsumaru, Shogo ; Hirayama, Taku ; Shiono, Daiju ; Iwai, Takeshi ; Hada, Hideo ; Shirai, Masamitsu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c483t-f1512a2892d69bd2f03b8337b1d5a1cb1833307854dc1c544469fab84d05c50f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>chemical amplification positive-tone resist</topic><topic>effect of protecting group</topic><toplevel>online_resources</toplevel><creatorcontrib>Ogata, Toshiyuki</creatorcontrib><creatorcontrib>Matsumaru, Shogo</creatorcontrib><creatorcontrib>Hirayama, Taku</creatorcontrib><creatorcontrib>Shiono, Daiju</creatorcontrib><creatorcontrib>Iwai, Takeshi</creatorcontrib><creatorcontrib>Hada, Hideo</creatorcontrib><creatorcontrib>Shirai, Masamitsu</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ogata, Toshiyuki</au><au>Matsumaru, Shogo</au><au>Hirayama, Taku</au><au>Shiono, Daiju</au><au>Iwai, Takeshi</au><au>Hada, Hideo</au><au>Shirai, Masamitsu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of Protecting Group of Fluoroalcohol on Lithographic Performance</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2003-01-01</date><risdate>2003</risdate><volume>16</volume><issue>5</issue><spage>707</spage><epage>712</epage><pages>707-712</pages><issn>0914-9244</issn><eissn>1349-6336</eissn><abstract>We have investigated effects of protecting group of fluoroalcohol as alkaline solubility on lithographic performance for the designing of chemical amplification positive-tone resist system. Preparing three different protecting groups (methoxymethyl: MOM, ethoxymethyl: EOM and fluoroethoxymethyl: FEOM) of norbornene hexafluoro-isopropanol (NBHFA) polymers and resists consisted of these polymers, we have evaluated optical properties, dissolution rates with developer, exposure sensitivities and resolution. These polymers showed a good pattern profile and high resolution. In addition, as compared with NBHFA-MOM and -EOM polymers, NBHFA-FEOM polymer displayed a good absorption coefficient at 157 nm.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.16.707</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2003, Vol.16(5), pp.707-712 |
| issn | 0914-9244 1349-6336 |
| language | eng |
| recordid | cdi_proquest_journals_1444627964 |
| source | J-STAGE Free; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Free Full-Text Journals in Chemistry |
| subjects | chemical amplification positive-tone resist effect of protecting group |
| title | Effects of Protecting Group of Fluoroalcohol on Lithographic Performance |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T19%3A37%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effects%20of%20Protecting%20Group%20of%20Fluoroalcohol%20on%20Lithographic%20Performance&rft.jtitle=Journal%20of%20Photopolymer%20Science%20and%20Technology&rft.au=Ogata,%20Toshiyuki&rft.date=2003-01-01&rft.volume=16&rft.issue=5&rft.spage=707&rft.epage=712&rft.pages=707-712&rft.issn=0914-9244&rft.eissn=1349-6336&rft_id=info:doi/10.2494/photopolymer.16.707&rft_dat=%3Cproquest_cross%3E3107831471%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1444627964&rft_id=info:pmid/&rfr_iscdi=true |