Fluorinated Chemically Amplified Dissolution Inhibitors for 157 nm Nanolithography

We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results d...

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Veröffentlicht in:	Journal of Photopolymer Science and Technology 2003, Vol.16(1), pp.27-35
Hauptverfasser:	Fresco, Zachary M., Bensel, Nicolas, Suez, Itai, Backer, Scott A., Fréchet, Jean M.J., Conley, Will
Format:	Artikel
Sprache:	eng
Schlagworte:	157nm dissolution inhibitor hexafluoroalcohol QCM
Online-Zugang:	Volltext
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