Current Status of EUV Photoresists

The current status of EUV resists is reviewed based on performance studies of line edge roughness (LER), sensitivity, resolution and pattern transfer. A large variation in polymer molecular weight (2.9-33.5 K g/mol) is found to have little effect on LER. Dissolution properties such as unexposed film...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of Photopolymer Science and Technology 2003, Vol.16(3), pp.401-410
Hauptverfasser:	Brainard, Robert L., Cobb, Jonathan, Cutler, Charlotte A.
Format:	Artikel
Sprache:	eng
Schlagworte:	EUVL Extreme Ultraviolet Lithography line-edge roughness photoresist photospeed resolution
Online-Zugang:	Volltext
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